公开(公告)号：DE2410924A1

公开(公告)日：1974-09-26

申请号：DE2410924

申请日：1974-03-05

Applicant: PERKIN ELMER CORP

Inventor： HEMSTREET HAROLD S ,  MARKLE DAVID A ,  NEWELL WILLIAM H ,  OFFNER ABE

IPC: H01L21/30 ,  B23Q1/36 ,  G02B17/06 ,  G02B27/18 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/32 ,  G02B17/02

公开(公告)号：CA1253021A

公开(公告)日：1989-04-25

申请号：CA437145

申请日：1983-09-20

Applicant: PERKIN ELMER CORP

Inventor： MARKLE DAVID A

IPC: H01L21/30 ,  G02B7/28 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G02B27/00

Abstract: The present invention is directed to an improvement in an alignment system for a scanning mask aligner employing a pattern on the mask or the wafer or both in the scribe lines that run in the direction of scanning, the improvement comprising a viewing system having optical grids, a system for moving the patterns across the optical grids in the viewing system, the grids corresponding to the directions and spacings of the patterns so that light transmitted through the grid is strongly modulated, and circuitry for comparing the phase modulation from the mask and wafer alignment targets to obtain alignment error signals; further according to the invention, the same system used to measure alignment can also be used to measure how well the mask is focused on the wafer. In this case two images of the mask pattern are arranged so that one is slightly inside of focus and the other is slightly outside of focus, and by comparing the amount of modulation on the two channels it is possible to deduce which of the two is closer to focus and therefore how to shift the focus so that they are equal.

公开(公告)号：DE3173046D1

公开(公告)日：1986-01-09

申请号：DE3173046

申请日：1981-03-26

Applicant: PERKIN ELMER CORP

Inventor： MARKLE DAVID A ,  GABRIEL FRED C

IPC: H01L21/30 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G05D3/20

公开(公告)号：CA1143192A

公开(公告)日：1983-03-22

申请号：CA355971

申请日：1980-07-11

Applicant: PERKIN ELMER CORP

Inventor： OFFNER ABE ,  MARKLE DAVID A

IPC: G02B27/02 ,  G02B13/24 ,  G02B27/10 ,  G02B27/18 ,  G02B27/40 ,  G03F7/20 ,  G03G15/04 ,  H01L21/027 ,  H01L21/30 ,  H02G1/00 ,  G02B13/00

Abstract: EO-2397 An optical system for insertion into projection apparatus to permit viewing an image projected on an image plane without affecting its quality, size or position, including a beam-splitting element disposed in the optical path before the image plane which will transmit the radiation to the image plane and reflect a portion of the radiation reflect a from the image plane in a direction which permits viewing, optical elements disposed in the optical path to correct for image displacement and aberrations caused by the beam-splitting element, said optical system being of unit power; according to one aspect of the invention the system is a focal so that it will remain at unit power when it is shifted longitudinally and the image position is insensitive to longitudinal displacement; and according to another aspect of the invention each element of the system is afocal so that the system remains at unit power and insensitive to changes in spacing between the elements.

公开(公告)号：DE3006578A1

公开(公告)日：1980-09-25

申请号：DE3006578

申请日：1980-02-21

Applicant: PERKIN ELMER CORP

Inventor： BERRY DANIEL HERBERT ,  MARKLE DAVID A

IPC: H01L21/30 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/68

公开(公告)号：DE2742488A1

公开(公告)日：1978-03-23

申请号：DE2742488

申请日：1977-09-21

Applicant: PERKIN ELMER CORP

Inventor： MARKLE DAVID A ,  OFFNER ABE

IPC: G02B17/00 ,  F21S2/00 ,  G02B17/08 ,  G02B19/00 ,  G02B27/00 ,  G03B27/54 ,  G03F7/20 ,  G03B21/20