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    Solar-stimulated fluorescent radiation detection method and apparatus
    1.
    发明授权
    Solar-stimulated fluorescent radiation detection method and apparatus 失效
    太阳激光荧光检测方法和装置

    公开(公告)号：US3641344A

    公开(公告)日：1972-02-08

    申请号：US3641344D

    申请日：1969-04-01

    Applicant: PERKIN ELMER CORP

    Inventor： MARKLE DAVID A

    IPC: G01J3/44 ,  G01J3/457 ,  G01N21/64 ,  G01N21/34

    CPC classification number: G01J3/457 ,  G01J3/4406 ,  G01N21/6456 ,  G01N2021/1793 ,  G01N2201/0616

    Abstract: A method and apparatus for determining the presence, location and relative concentration of certain fluorescent materials in a scene that is illuminated by sunlight. The particular fluorescent materials are characterized in that they fluoresce at wavelengths coincident with one or more Fraunhofer absorption bands. Two images are formed from light collected from the scene. One of the images consists mainly of light from the scene having a spectral band-pass inside a Fraunhofer absorption band and the other image consists mainly of light from the scene having a spectral bandpass in the continuum near the same Fraunhofer absorption band. The two images are normalized so that intensities on corresponding portions of each image due to reflected solar radiation are equal. The ''''continuum'''' image is then subtracted from the ''''Fraunhofer'''' image. The resulting difference image consists primarily of fluorescent radiation derived from the fluorescent materials or objects in the scene and provides a direct visual indication of their presence, location and relative concentration.

    Abstract translation: 一种用于确定由阳光照射的场景中某些荧光材料的存在，位置和相对浓度的方法和装置。 特定的荧光材料的特征在于它们在与一个或多个Fraunhofer吸收带一致的波长处发荧光。 从场景收集的光形成两个图像。 其中一幅图像主要由来自Fraunhofer吸收带内具有光谱带通的场景的光组成，另一幅图像主要由来自相同弗劳恩霍夫吸收带附近的连续谱中具有光谱带通的场景的光组成。 两个图像被归一化，使得由于反射的太阳辐射引起的每个图像的对应部分上的强度相等。 然后从“Fraunhofer”图像中减去“连续体”图像。 所得到的差异图像主要由来自场景中的荧光材料或物体的荧光辐射组成，并提供其存在，位置和相对浓度的直接视觉指示。

    Method and apparatus for sensing fluorescent substances
    3.
    发明授权
    Method and apparatus for sensing fluorescent substances 失效
    用于感应荧光物质的方法和装置

    公开(公告)号：US3598994A

    公开(公告)日：1971-08-10

    申请号：US3598994D

    申请日：1968-09-19

    Applicant: PERKIN ELMER CORP

    Inventor： MARKLE DAVID A

    IPC: G01N21/64 ,  G01N21/22

    CPC classification number: G01N21/645 ,  G01N2021/6426 ,  G01N2201/0616

    Abstract: A method and apparatus for sensing fluorescent radiation emitted by a sample material using sunlight as the source of exciting radiation. A bundle of direct sunlight is encoded and split into beams each of which is combined with similar portions of a bundle of light containing solar reflected and solar-excited fluorescent energy components from the sample material. The sample bundle is encoded differently from the direct sunlight or reference bundle so that it may be distinguished subsequently. The two beams (each of which contain reference and sample components) are passed through two spectral filters and detected photoelectrically. One of the spectral filters is centered on a Fraunhofer absorption line. The other filter is centered a few Angstroms away in the solar continuum. The four signals corresponding to the intensity of the sample and reference beam components passing through each of the two spectral filters are separated electronically and combined in an analogue computer to yield a signal proportional to the fluorescivity of the sample material.

    SYSTEM FOR ILLUMINATING AN ANNULAR FIELD
    4.
    发明专利
    SYSTEM FOR ILLUMINATING AN ANNULAR FIELD 未知

    公开(公告)号：CA1110890A

    公开(公告)日：1981-10-20

    申请号：CA354214

    申请日：1980-06-17

    Applicant: PERKIN ELMER CORP

    Inventor： MARKLE DAVID A ,  OFFNER ABE

    IPC: G02B17/08

    Abstract: This invention relates to a system for illuminating an annular field disposed about an axis characterized by an annular field imaging system including a field element having a reflective concave toroidal surface with an axis of symmetry coincident with said axis for forming an image of an arcuate source on the annular field.

    METHOD FOR AUTOMATIC MASK ALIGNMENT
    5.
    发明专利
    METHOD FOR AUTOMATIC MASK ALIGNMENT 未知

    公开(公告)号：CA1159579A

    公开(公告)日：1983-12-27

    申请号：CA416531

    申请日：1982-11-26

    Applicant: PERKIN ELMER CORP

    Inventor： BERRY DANIEL H ,  MARKLE DAVID A

    IPC: G03F9/00 ,  H01L21/70

    Abstract: METHOD FOR AUTOMATIC MASK ALIGNMENT A method for aligning a mask with a microcircuit wafer, using a first target which is of a size that can be printed on a microcircuit chip without interfering with the lines thereon, and consisting only of lines vertically or diagonally disposed with respect to the image transducer. This target is exposed on at least two positions of the wafer, and the microcircuit is processed to include the first targets. A second mask to be exposed after the first mask has a diamond shaped target of a second size on at least two positions, and the first and second targets are centered one within the other prior to exposing the second mask.

    AUTOMATIC WAFER FOCUSING AND FLATTENING SYSTEM
    6.
    发明专利
    AUTOMATIC WAFER FOCUSING AND FLATTENING SYSTEM 未知

    公开(公告)号：CA1157128A

    公开(公告)日：1983-11-15

    申请号：CA373754

    申请日：1981-03-24

    Applicant: PERKIN ELMER CORP

    Inventor： GABRIEL FRED C ,  MARKLE DAVID A

    IPC: H01L21/30 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G01S15/88 ,  G05D3/14

    Abstract: EO-2627 AUTOMATIC WAFER FOCUSING AND FLATTENING SYSTEM An automatic focusing system for positioning silicon or other wafer within the focal plane of a photolithographic mask projection system. The position of the wafer is measured at a plurality of points and compared to the position of an optical flat located in the focal plane to provide signals for positioning the wafer at the focal plane of the projection system. The system also includes means for changing the contours of the wafer to cause it to lie in a known plane.

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