SUPERLATTICE ELECTRO-OPTIC DEVICE INCLUDING RECONFIGURABLE OPTICAL ELEMENTS

    公开(公告)号:US20240255782A1

    公开(公告)日:2024-08-01

    申请号:US18601291

    申请日:2024-03-11

    CPC classification number: G02F1/017 G02F2203/11 G02F2203/52

    Abstract: A method is provided for operating one or more one solid-state electro-optic device to provide an electrically switching shutter. The method includes forming an alternating stack of first semiconductor layers having a first dopant and second semiconductor layers having a second dopant to form at least one superlattice semiconductor device. The method further includes applying to the at least one superlattice semiconductor device a first voltage to induce a transparent state of the alternating stack such that light is transmitted through the alternating stack, and applying to the at least one superlattice semiconductor device a second voltage different from the first voltage to induce an opaque state of the alternating stack such that light is inhibited from passing through the alternating stack.

    Scalable unit cell device for large two-dimensional arrays with integrated phase control

    公开(公告)号:US11886095B2

    公开(公告)日:2024-01-30

    申请号:US17721884

    申请日:2022-04-15

    CPC classification number: G02F1/2955

    Abstract: A scalable independent unit cell device architecture may include a phase-shifting element and a phase shift driver both integrated within the unit cell device. The phase shift driver may be coupled to the phase-shifting element and the phase shift driver may independently control the phase-shifting element to produce an optical beam having a desired phase. The unit cell device may further include an optical antenna that outputs the beam having the desired phase. The unit cell device may be formed as an opto-electronic hybrid optimized to leverage direct bond hybridization (DBH) to attach an electronic integrated circuit wafer to a side of a photonic integrated circuit wafer. The resulting unit cell device (i.e., 24 microns) may tightly integrate individual element-level phase control, which may be implemented within large-scale two-dimensional photonic arrays with hemispherical beam steering.

    SCALABLE UNIT CELL DEVICE FOR LARGE TWO-DIMENSIONAL ARRAYS WITH INTEGRATED PHASE CONTROL

    公开(公告)号:US20230333442A1

    公开(公告)日:2023-10-19

    申请号:US17721884

    申请日:2022-04-15

    CPC classification number: G02F1/2955

    Abstract: A scalable independent unit cell device architecture may include a phase-shifting element and a phase shift driver both integrated within the unit cell device. The phase shift driver may be coupled to the phase-shifting element and the phase shift driver may independently control the phase-shifting element to produce an optical beam having a desired phase. The unit cell device may further include an optical antenna that outputs the beam having the desired phase. The unit cell device may be formed as an opto-electronic hybrid optimized to leverage direct bond hybridization (DBH) to attach an electronic integrated circuit wafer to a side of a photonic integrated circuit wafer. The resulting unit cell device (i.e., 24 microns) may tightly integrate individual element-level phase control, which may be implemented within large-scale two-dimensional photonic arrays with hemispherical beam steering.

    Pin diode structure having surface charge suppression
    30.
    发明授权
    Pin diode structure having surface charge suppression 有权
    具有表面电荷抑制的二极管结构

    公开(公告)号:US09224768B2

    公开(公告)日:2015-12-29

    申请号:US13959081

    申请日:2013-08-05

    Abstract: A semiconductor structure having: a silicon structure; and a plurality of laterally spaced PiN diodes formed in the silicon structure; and a surface of the silicon structure configured to reduce reverse bias leakage current through the PiN diodes. In one embodiment, a gate electrode structures is disposed on a surface of the silicon structure, the gate electrode structure having portions disposed between adjacent pairs of the diodes, the gate structure being biased to prevent leakage current through the diodes.

    Abstract translation: 一种半导体结构,具有:硅结构; 以及形成在所述硅结构中的多个横向间隔开的PiN二极管; 并且所述硅结构的表面被配置为减少穿过所述PiN二极管的反向偏置漏电流。 在一个实施例中,栅极电极结构设置在硅结构的表面上,栅极电极结构具有设置在相邻的二极管对之间的部分,栅极结构被偏置以防止通过二极管的漏电流。

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