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公开(公告)号:US20150298165A1
公开(公告)日:2015-10-22
申请号:US14381616
申请日:2013-03-26
Applicant: SILCOTEK CORP.
Inventor: David A. SMITH
IPC: B05D1/00
Abstract: A coated article and a chemical vapor deposition process are disclosed. The coated article includes a functionalized layer applied to the coated article by chemical vapor deposition. The functionalized layer is a layer selected from the group consisting of an oxidized-then-functionalized layer, an organofluoro treated layer, a fluorosilane treated layer, a trimethylsilane treated surface, an organofluorotrialkoxysilanes treated layer, an organofluorosilylhydrides-treated layer, an organofluoro silyl treated layer, a tridecafluoro 1,1,2,2-tetrahydrooctylsilane treated layer, an organofluoro alcohol treated layer, a pentafluoropropanol treated layer, an allylheptafluoroisopropyl ether treated layer, a (perfluorobutyl) ethylene treated layer, a (perfluorooctyl) ethylene treated layer, and combinations thereof. The process includes applying the functionalized layer.
Abstract translation: 公开了涂覆制品和化学气相沉积工艺。 涂覆制品包括通过化学气相沉积施加到涂覆制品上的官能化层。 官能化层是选自氧化官能化层,有机氟处理层,氟硅烷处理层,三甲基硅烷处理表面,有机氟代三烷氧基硅烷处理层,有机氟代硅烷化处理层,有机氟甲硅烷基处理层 三氟代1,1,2,2-四氢辛基硅烷处理层,有机氟醇处理层,五氟丙醇处理层,烯丙基三氟异丙醚处理层,(全氟丁基)乙烯处理层,(全氟辛基)乙烯处理层,和 其组合。 该方法包括应用官能化层。
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公开(公告)号:US20240117495A1
公开(公告)日:2024-04-11
申请号:US17768249
申请日:2020-10-13
Applicant: SILCOTEK CORP.
Inventor: Geoffrey K. WHITE , Nicholas P. DESKEVICH , James B. MATTZELA , Gary A. BARONE , David A. SMITH , Pierre A. LECLAIR , Min YUAN , Jesse BISCHOF
IPC: C23C16/52 , C23C16/44 , C23C16/455 , C23C16/46
CPC classification number: C23C16/52 , C23C16/4404 , C23C16/45523 , C23C16/46
Abstract: Cold thermal chemical vapor deposition coatings, articles, and processes are disclosed. Specifically, a cold thermal chemical vapor deposition process includes positioning an article, heating a precursor gas to at least a decomposition temperature of the precursor gas to produce a deposition gas, introducing the deposition gas to a coating vessel, and depositing a coating from the deposition gas onto the article within the coating vessel. The article remains at a temperature below the decomposition temperature throughout the introducing and depositing of the deposition gas. The coating on the article has a gradient formed by the depositing of the coating having no flow for a period of time. The coated article includes a thermally-sensitive substrate (the thermally-sensitive substrate capable of being modified by a temperature of 300 degrees Celsius) and a coating the thermally-sensitive substrate.
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公开(公告)号:US20230383126A1
公开(公告)日:2023-11-30
申请号:US18331647
申请日:2023-06-08
Applicant: SILCOTEK CORP.
Inventor: David A. SMITH , James B. MATTZELA , Paul H. SILVIS , Gary A. BARONE , Martin E. HIGGINS
CPC classification number: C09D5/00 , C23C16/30 , C23C16/56 , C23C16/401 , Y10T428/31612 , C23C16/0272 , C23C16/18 , Y10T428/265 , Y10T428/31663 , C23C30/00
Abstract: Amorphous coatings and coated articles having amorphous coatings are disclosed. The amorphous coating comprises a first layer and a second layer, the first layer being proximal to a metal substate compared to the second layer, the second layer being distal from the metal substrate compared to the first layer. The first layer and the second layer comprise carbon, hydrogen, and silicon. The first layer further comprises oxygen.
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公开(公告)号:US20190309414A1
公开(公告)日:2019-10-10
申请号:US16379236
申请日:2019-04-09
Applicant: SILCOTEK CORP.
Inventor: Thomas F. VEZZA , James B. MATTZELA , Gary A. BARONE , Jesse BISCHOF , David A. SMITH
IPC: C23C16/44
Abstract: Chemical vapor deposition processes and coated articles are disclosed. The process includes a first introducing of a first amount of silane to the enclosed chamber, the first amount of the silane remaining within the enclosed chamber for a first period of time, a first decomposing of the first amount of the silane during at least a portion of the first period of time, a second introducing of a second amount of the silane to the enclosed chamber, the second amount of the silane remaining within the enclosed chamber for a second period of time, and a second decomposing of the second amount of the silane during at least a portion of the second period of time. The process is devoid of inert gas purging between the first decomposing and the second introducing and/or produces a chemical vapor deposition coating devoid of hydrogen bubbles.
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公开(公告)号:US20190169750A1
公开(公告)日:2019-06-06
申请号:US15895566
申请日:2018-02-13
Applicant: SILCOTEK CORP.
Inventor: Min YUAN , David A. SMITH , Paul H. SILVIS , James B. MATTZELA
Abstract: Coated articles are disclosed. One embodiment of a coated article includes a substrate capable of being subjected to corrosion and a deposited coating on the substrate. The deposited coating has silicon with the substrate resisting corrosion with the deposited coating on the substrate when exposed to 15% NaClO by a rate of at least 5% greater than the corrosion rate of a coating applied with the same process but without introducing the deposition gas at the sub-decomposition temperature and/or the substrate with the deposited coating having a 15% NaClO corrosion rate of between 0 and 3 mils per year.
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公开(公告)号:US20190100282A1
公开(公告)日:2019-04-04
申请号:US16148567
申请日:2018-10-01
Applicant: SILCOTEK CORP.
Inventor: Pierre A. LECLAIR , David A. SMITH , Geoffrey K. WHITE , Travis HALL
Abstract: Articles having a hydrophobically-coated region and processes of using such articles are disclosed. The article includes a substrate material and a hydrophobically-coated region on the substrate material, the hydrophobically-coated region being contacted or configured for contact with a fluid. The hydrophobically-coated region is configured to repulse the fluid from the article while the article is moving through the fluid. The process includes using the article by moving the article through the fluid wherein the hydrophobically-coated region repulses the fluid from the article.
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27.
公开(公告)号:US20170130334A1
公开(公告)日:2017-05-11
申请号:US14933295
申请日:2015-11-05
Applicant: SILCOTEK CORP.
Inventor: Min YUAN , Paul H. SILVIS , David A. SMITH , James B. MATTZELA
IPC: C23C16/455 , C04B41/52 , C04B41/45 , C23C16/56
CPC classification number: C23C16/45557 , C04B41/456 , C04B41/524 , C23C16/24 , C23C16/30 , C23C16/401 , C23C16/56
Abstract: Thermal chemical vapor deposition split-functionalizing processes, coatings, and products are disclosed. The thermal chemical vapor deposition split-functionalizing process includes positioning an article within an enclosed chamber, functionalizing the article within a first temperature range for a first period of time, and then further functionalizing the article within a second temperature range for a second period of time. The thermal chemical vapor deposition split-functionalized product includes a functionalization formed by functionalizing within a first temperature range for a first period of time and a further functionalization formed by further functionalizing within a second temperature range for a second period of time.
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公开(公告)号:US20170088947A1
公开(公告)日:2017-03-30
申请号:US15276043
申请日:2016-09-26
Applicant: SILCOTEK CORP.
Inventor: David A. SMITH
Abstract: Thermal chemical vapor deposition functionalization processes, thermal chemical vapor deposition functionalizations, and thermal chemical vapor deposition functionalized articles are disclosed. The thermal chemical vapor deposition functionalization process includes modifying a surface by thermally reacting a gas to form a thermal chemical vapor deposition functionalization on the surface. The gas is selected from the group consisting of methyltrimethoxysilane, methyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, trimethylmethoxysilane, trimethylethoxysilane, and combinations thereof. The thermal chemical vapor deposition functionalization and the thermal chemical vapor deposition functionalized article are produced by the thermal chemical vapor deposition process.
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公开(公告)号:US20160059260A1
公开(公告)日:2016-03-03
申请号:US14784731
申请日:2014-05-14
Applicant: SILCOTEK CORP.
Inventor: David A. SMITH , Paul H. SILVIS
Abstract: Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor de position functionalization is not of a refrigerator shelf or a windshield.
Abstract translation: 化学气相沉积制品和方法包括在材料上的化学气相沉积功能化,所述材料包括碳的sp3排列。 化学气相沉积功能化被定位成与工艺流体,烃,分析物,排气或其组合接触。 另外或替代地,化学气相脱除官能化不是冰箱架或挡风玻璃。
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公开(公告)号:US20150064376A1
公开(公告)日:2015-03-05
申请号:US14538021
申请日:2014-11-11
Applicant: SILCOTEK CORP.
Inventor: David A. SMITH , Paul H. SILVIS
IPC: B05D1/00
CPC classification number: B05D1/60 , B05D5/083 , B05D2201/02 , B05D2202/00 , B05D2203/35 , C23C16/00 , C23C16/56 , Y10T428/13 , Y10T428/218 , Y10T428/24025 , Y10T428/2933 , Y10T428/2962 , Y10T428/31612 , Y10T428/31663
Abstract: According to an embodiment of the present disclosure, a coated automotive article includes a functionalized layer applied to at least one surface of the automotive article by chemical deposition, wherein the functionalized layer is selected from a fluoro functional group. The functionalized layer is a layer selected from the group consisting of an oxidized-then-functionalized layer, an organofluoro treated layer, a fluorosilane treated layer, an organofluorotrialkoxysilanes treated layer, an organofluorosilylhydrides-treated layer, an organofluoro silyl treated layer, a tridecafluoro 1,1,2,2-tetrahydrooctylsilane treated layer, an organofluoro alcohol treated layer, a pentafluoropropanol treated layer, an allylheptafluoroisopropyl ether treated layer, a (perfluorobutyl) ethylene treated layer, a (perfluorooctyl) ethylene treated layer, a (perfluoroalkyl) ethylene treated layer, and combinations thereof.
Abstract translation: 根据本公开的实施例,涂覆的汽车制品包括通过化学沉积施加到汽车制品的至少一个表面的官能化层,其中所述官能化层选自氟官能团。 官能化层是选自氧化官能化层,有机氟处理层,氟硅烷处理层,有机氟三烷氧基硅烷处理层,有机氟代硅烷化处理层,有机氟代甲硅烷基处理层,十三氟1 ,1,2,2-四氢辛基硅烷处理层,有机氟醇处理层,五氟丙醇处理层,烯丙基三氟异丙醚处理层,(全氟丁基)乙烯处理层,(全氟辛基)乙烯处理层,(全氟烷基)乙烯处理层 层及其组合。
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