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公开(公告)号：JP2005030783A
公开(公告)日：2005-02-03
申请号：JP2003193064
申请日：2003-07-07
Applicant: SONY CORP
Inventor： NAKAO ISAMU , MAMINE TAKAYOSHI , YAMAMOTO MASANOBU , TAKEDA MINORU , FURUKI MOTOHIRO
IPC: G01N33/53 , C12M1/00 , C12Q1/68 , G01N33/543 , G01N33/553 , G01N33/566 , G01N37/00
Abstract: PROBLEM TO BE SOLVED: To provide a biochemical reaction apparatus capable of performing a biochemical reaction by using a substrate, the substrate for the biochemical reaction such as a DNA (deoxyribonucleic acid) chip, a hybridization method of hybridizing a nucleotide chain, and a biochemical reaction apparatus capable of performing hybridization at a high speed relative to a substrate manufacturing method for the hybridization wherein the nucleotide chain for a probe is immobilized. SOLUTION: As for the substrate 1 for bioassay, the main surface similar to an optical disk such as a CD has an annular flat shape. The substrate 1 is driven rotatively around a center hole 2, and the substrate 1 has the surface 1a on which a plurality of wells 8 are formed, which are fields for a hybridization reaction between a probe DNA (a nucleotide chain for detection) and a sample DNA (a target nucleotide chain). A transparent electrode film 4 is formed on the lower layer of the wells 8 on the substrate 1. At the hybridization time, an external electrode 18 is brought close from the upper surface 1a side of the substrate 1, and an alternating-current power is applied between the transparent electrode film 4 and the external electrode 18, to thereby give an alternating-current field in the vertical direction to the substrate 1. COPYRIGHT: (C)2005,JPO&NCIPI
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公开(公告)号：JP2004334939A
公开(公告)日：2004-11-25
申请号：JP2003126328
申请日：2003-05-01
Inventor： TAKEDA MINORU
IPC: G11B7/26
Abstract: PROBLEM TO BE SOLVED: To prevent formation of defects caused by pit drop-off when a stamper is manufactured by peeling off an Ni peel film from an Si substrate in a method for manufacturing the stamper for a high-density optical disk.
SOLUTION: A thin film 102 is formed on a substrate 101. An electron beam resist film is formed on the thin film 102, the resist film is irradiated with an electron beam and the resist film is exposed, and the resist film is developed by developer. Using the developed resist film as a mask, the thin film 102 is subjected to reactive ion etching to form an irregular pattern on the thin film 102. A peel film 104 made of a material whose expansion rate is larger than that of the thin film 102 is formed on the thin film 102. The thin film 102 and the peel film 104 are cooled with a coolant such as liquid nitrogen or liquid helium, and the peel film 104 is peeled off from the substrate 101 to manufacture a stamper.
COPYRIGHT: (C)2005,JPO&NCIPI-
公开(公告)号：JP2004288284A
公开(公告)日：2004-10-14
申请号：JP2003078446
申请日：2003-03-20
Inventor： TAKEDA MINORU
Abstract: PROBLEM TO BE SOLVED: To prevent omission of the convex part of a stamper of a fine pattern when molding in mass production of optical disks.
SOLUTION: In a manufacturing method of a stamper for optical disks, a negative electron beam photosensitive resist layer is applied and formed on a semiconductor substrate 1, a concave part of an irregular pattern of an optical disk obtained finally by electron beam irradiation plotting and phenomenon of a pattern corresponding to the irregular pattern formed on the optical disk obtained finally, for example, the resist layer in which a forming part of information pit is convex is patterned. a semiconductor substrate surface is etched by plasma etching making this resist pattern as a mask, and the resist pattern is eliminated. First plating forming a Ni plating layer is performed for the semiconductor substrate surface on which the irregular pattern is formed, this plating layer is peeled off from the semiconductor substrate surface, and a first stamper 41, that is, a mother stamper is manufactured. At the time, in the semiconductor substrate 1, as the pit forming part is convex, a concave part forming the convex part of the pit forming part in the formed stamper of the optical disk of the mother pattern is not in a state in which it encroaches to the semiconductor substrate 1, peeled off easily and good, omission is prevented.
COPYRIGHT: (C)2005,JPO&NCIPI-
公开(公告)号：JP2004281141A
公开(公告)日：2004-10-07
申请号：JP2003068771
申请日：2003-03-13
Inventor： MUTO KOICHI , AKI YUICHI , TAKAYAMA MASATO , HATTORI TADASHI , OKAWACHI HIROKI , TAKEDA MINORU
Abstract: PROBLEM TO BE SOLVED: To maintain a right posture and high vacuum even if a local vacuum pad is separated from a specimen when an outermost circumference of the specimen is measured.
SOLUTION: An electron beam irradiation device is provided with an arrangement means by which a flat satellite stage 17 installed at a circumference or at a part of the circumference of a workpiece 3 with its height equalized to that of the surface of the workpiece, and a sealing means to seal a gap between the satellite stage 17 and the workpiece 3 in close contact. By this, in a partial vacuum device, working can be carried out up to the outer peripheral part of the workpiece 3 with a posture of a static pressure floating pad maintained while the vacuum state of the static pressure floating pad is maintained.
COPYRIGHT: (C)2005,JPO&NCIPI-
公开(公告)号：JP2004039046A
公开(公告)日：2004-02-05
申请号：JP2002192058
申请日：2002-07-01
Inventor： TAKEDA MINORU , SHINODA MASATAKA , IMANISHI SHINGO
IPC: G11B7/135
CPC classification number: G11B7/1387 , G11B7/1374 , G11B2007/13727
Abstract: PROBLEM TO BE SOLVED: To provide a recording and reproducing device that can record and reproduce information signals on a high-density and large-capacity optical recording medium. SOLUTION: Information recording or reproducing on an optical recording medium 20 is carried out by using a laser light source 11 emitting a short wavelength recording/reproducing laser beam L of 220nm to 280nm in the ultraviolet ray range. The recording/reproducing laser beam L is condensed on the optical recording medium 20 by using a condenser lens 12 which is composed of SIL12a made from high reflectance and transmissivity diamond or hafnium oxide and has an effective NA of 1 or larger. COPYRIGHT: (C)2004,JPO
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Patent Agency Ranking
公开(公告)号：JP2000156405A
公开(公告)日：2000-06-06
申请号：JP35333799
申请日：1999-12-13
Applicant: SONY CORP
Inventor： TAKEDA MINORU
IPC: H01L21/302 , H01L21/3065 , H01L21/316 , H01L21/76
Abstract: PROBLEM TO BE SOLVED: To improve shape controllability between regions and to prevent isolation capability between regions from decreasing by setting the isolation between the elements of a semiconductor substrate to the isolation region between regions by providing an interval between a region that is made only by trench isolation and a region that is made only by selective oxidation. SOLUTION: An insulation film (SiO2) for burying a trench is formed at a trench 4 closest to a peripheral circuit out of trenches for isolation between the elements of the memory cell array region of a semiconductor substrate 1, and a selective oxide film 7 is the closest to the side of the memory cell array among the selective oxide films in the peripheral circuit. Then, the isolation region 11 between regions that are as wide as several μm is provided at a region where no circuit element is provided between a region that is made only by trench isolation and a region that is made only by selective isolation, thus eliminating a risk where the trench 4 that becomes a recess approaches the selective oxide film 7 that becomes a projecting part for causing a radial level difference, achieving improved shape controllability, and increasing the isolation capability between regions.
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公开(公告)号：JPH11288528A
公开(公告)日：1999-10-19
申请号：JP8737198
申请日：1998-03-31
Applicant: SONY CORP
Inventor： FURUKI MOTOHIRO , TAKEDA MINORU , YAMATSU HISAYUKI
IPC: G11B7/26
Abstract: PROBLEM TO BE SOLVED: To produce a recording medium capable of dealing with a higher recording density and higher recording capacity by using an exposure source which permits higher resolution and regulating process conditions of resist adaptive thereto. SOLUTION: This process has a resist coating application stage 2 for applying the resist on a glass substrate, a heat treatment stage 3 for heat treating the glass substrate coated with the resist, an exposure stage 4 for exposing the resist on the glass substrate subjected to the heat treatment by using any among a laser beam, electron rays, X-ray and ion rays, a developing stage 5 for forming patterns indicating information by developing the exposed resist by using a developer, a metallic film deposition stage for depositing a metallic film on the surface of the glass substrate formed with the patterns, a peeling stage 8 for peeling the metallic film from the glass substrate, a washing stage for washing the org. matter sticking to the peeled metallic film by a solvent and a UV irradiation stage 10 for decomposing and removing the org. matter remaining on the metallic film by irradiating the washed metallic film with UV rays.
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28.发明专利
公开(公告)号：JPH11203732A
公开(公告)日：1999-07-30
申请号：JP797398
申请日：1998-01-19
Applicant: SONY CORP
Inventor： TAKEDA MINORU
Abstract: PROBLEM TO BE SOLVED: To provide an exposure method which reduces the size of an optical recording medium and increases the capacity thereof and an exposure device using the same as well as a master disk and the optical recording medium. SOLUTION: A reduction projection lens 4 is disposed between a photomask 3 formed with a mask pattern 3a and a master disk 5 formed with a photoresist film 5a. The master disk 5 is moved in a direction parallel with the mask pattern 3a forming surface of the photomask 3. The photoresist film 5a is subjected to plural times of simultaneous transfer of m/n times patterns (where, n, m are integers and n>m) of the mask pattern 3a, by which plural pieces of m/n times pattern are formed on the photoresist film 5a. A plurality of, for example, the simultaneous transferred 1/4 times patterns of the spiral pits or grooves formed on the mask pattern 3a are formed on the photoresist film 5a on the master disk 5.
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公开(公告)号：JPH10154351A
公开(公告)日：1998-06-09
申请号：JP2938997
申请日：1997-02-13
Applicant: SONY CORP
Inventor： YASUDA KOICHI , FURUKI MOTOHIRO , TAKEDA MINORU , KASHIWAGI TOSHIYUKI , ARAKAWA NORIYUKI
IPC: G11B7/24
Abstract: PROBLEM TO BE SOLVED: To obtain an optical recording medium ensuring high recording density and rigidity by laminating an information recording layer having a fine rugged structure on a substrate having a specified modulus of bending elasticity and forming a light transmitting layer having a specified thickness on the recording layer. SOLUTION: An information recording layer 15 having a fine rugged structure is laminate on a substrate 20 having >=7×10 Pa (7GPa) modulus of bending elasticity and a light transmitting layer 100 reading information and having sufficiently high transmissivity to laser beam for recording and
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公开(公告)号：JPH09306040A
公开(公告)日：1997-11-28
申请号：JP12484496
申请日：1996-05-20
Applicant: SONY CORP
Inventor： KUROUSU ASAO , TAKEDA MINORU
IPC: G11B7/26
Abstract: PROBLEM TO BE SOLVED: To improve the quality of an optical recording medium and to improve the durability of a device by averting the adhesion of a liquid photo-curing adhesive splashed by rotation onto substrates and a rotary base plate in a stage for spreading the liquid photo-curing adhesive. SOLUTION: The first substrate 1 for the optical recording medium and the second substrate 2 for the optical recording medium are superposed on each other and are placed on the rotary base plate 52 via the liquid photo-curing adhesive 3. A protective cover body 60 is arranged on the second substrate 2 for the optical recording medium. The rotary base plate 52 is rotated at a high speed in this state to spread the liquid photo-curing adhesive 3 between the first and second substrates 1 and 2 for the optical recording medium.
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