FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR

    公开(公告)号:CA2338879C

    公开(公告)日:2005-08-09

    申请号:CA2338879

    申请日:2000-05-26

    Abstract: A cleaning apparatus (10) for a radiation source assembly (35) in a fluid treatment system is described. The cleaning apparatus comprises cleaning chamber (20) and a second chamber (25,30) independent of the cleaning chamber which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treated. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation sourc e when it becomes fouled.

    22.
    发明专利
    未知

    公开(公告)号:NO20020632D0

    公开(公告)日:2002-02-08

    申请号:NO20020632

    申请日:2002-02-08

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR

    公开(公告)号:CA2381307A1

    公开(公告)日:2001-02-22

    申请号:CA2381307

    申请日:2000-08-11

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiati on source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatmen t device comprise the cleaning apparatus is also described.

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