半導体レーザ構造体
    22.
    发明专利
    半導体レーザ構造体 审中-公开
    半导体激光器结构

    公开(公告)号:JP2014207476A

    公开(公告)日:2014-10-30

    申请号:JP2014138631

    申请日:2014-07-04

    CPC classification number: B82Y20/00 H01S5/0421 H01S5/3095 H01S5/34333

    Abstract: 【課題】 p型半導体層の数を減らした窒化物系半導体レーザ構造体の提供。【解決手段】 p型半導体層216とn型半導体層218との間のp−nトンネル接合220は、エッジ発光型窒化物系半導体レーザ構造200のための電流注入を提供する。このp−nトンネル接合220により、窒化物系半導体レーザ構造200におけるp型半導体層の数が減り、それによって分散損失が低減され、閾値電流密度が低下し、全体的な直列抵抗が低下すると共に、より高い成長温度が可能となることによってレーザの構造的な品質が向上する。【選択図】図1

    Abstract translation: 要解决的问题:提供具有减少数量的p型半导体层的氮化物基半导体激光器结构。解决方案:p型半导体层216和n型半导体层218之间的pn隧道结220提供电流注入 用于边缘发射氮化物基半导体激光器结构200.pn隧道结220减少氮化物基半导体激光器结构200中的p型半导体层的数量,这降低了分布损耗,降低了阈值电流密度,降低了整体 串联电阻,并通过允许更高的生长温度来提高激光器的结构质量。

    SEMICONDUCTOR LASER STRUCTURE BODY
    23.
    发明专利

    公开(公告)号:JP2003198045A

    公开(公告)日:2003-07-11

    申请号:JP2002371704

    申请日:2002-12-24

    Applicant: XEROX CORP

    Abstract: PROBLEM TO BE SOLVED: To provide a nitride-based semiconductor laser structure where the number of p-type semiconductor layers is reduced. SOLUTION: A p-n tunnel junction 220 between a p-type semiconductor layer 216 and an n-type semiconductor layer 218 provides current injection for an edge light emitting nitride-based semiconductor laser structure 200. By the p-n tunnel junction 220, the number of p-type semiconductor layers in the nitride- based semiconductor laser structure is reduced. As a result, dispersion loss is reduced, threshold current density decreases, entire series resistance lowers, at the same time, a higher growth temperature is enabled, and the structural quality of a laser is improved. COPYRIGHT: (C)2003,JPO

    DUAL III-V NITRIDE LASER STRUCTURE IN WHICH THERMAL CROSSTALK IS REDUCED

    公开(公告)号:JP2003158342A

    公开(公告)日:2003-05-30

    申请号:JP2002330348

    申请日:2002-11-14

    Applicant: XEROX CORP

    Abstract: PROBLEM TO BE SOLVED: To provide a dual III-V nitride laser structure in which thermal crosstalk is reduced. SOLUTION: This dual semiconductor laser structure is provided with a substrate 102, III-V nitride semiconductor current diffusion layers 202, 302 formed on the substrate, and a plurality of III-V nitride semiconductor layers formed on the current diffusion layers. At least one out of the plurality of III-V nitride semiconductor layers is provided with III-V nitride semiconductor layers 206, 306 forming active layers, and a trench 116 which penetrates the plurality of III-V nitride semiconductor layers, is stretched penetrating a part of the current diffusion layers and forms a first laser 200 and a second laser 300 from the plurality of III-V nitride semiconductor layers. Thermal crosstalk between the first and the second lasers is reduced by depth of the trench and thickness of the current diffusion layers.

    Structure of semiconductor laser
    26.
    发明专利
    Structure of semiconductor laser 审中-公开
    半导体激光器结构

    公开(公告)号:JP2010251804A

    公开(公告)日:2010-11-04

    申请号:JP2010174425

    申请日:2010-08-03

    CPC classification number: B82Y20/00 H01S5/0421 H01S5/3095 H01S5/34333

    Abstract: PROBLEM TO BE SOLVED: To provide a nitride based semiconductor laser structure which is decreased in number of p-type semiconductor layers.
    SOLUTION: A p-n tunnel junction 220 between a p-type semiconductor layer 216 and an n-type semiconductor layer 218 provides current injection for an edge-emitting nitride based semiconductor laser structure 200. The number of p-type semiconductor layers in the nitride based semiconductor laser structure 200 is decreased by the p-n tunnel junction 220 to reduce dispersion loss, threshold current density thereby decreases to lower total series resistance, and higher growth temperature is obtained to improve structural quality of a laser.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题:提供减少p型半导体层数量的氮化物基半导体激光器结构。 解决方案:p型半导体层216和n型半导体层218之间的pn隧道结220为边缘发射氮化物基半导体激光器结构200提供电流注入.P型半导体层的数量 通过pn隧道结220减少氮化物基半导体激光器结构200以减小色散损耗,从而降低阈值电流密度以降低总串联电阻,并且获得更高的生长温度以改善激光器的结构质量。 版权所有(C)2011,JPO&INPIT

    Laser diode structure and manufacturing method thereof
    28.
    发明专利
    Laser diode structure and manufacturing method thereof 审中-公开
    激光二极管结构及其制造方法

    公开(公告)号:JP2004289157A

    公开(公告)日:2004-10-14

    申请号:JP2004079581

    申请日:2004-03-19

    Abstract: PROBLEM TO BE SOLVED: To provide a laser diode structure where an enhanced coefficient of transverse optical confinement and a low series resistance are realized, and whose absorption loss due to a p-electrode can be controlled.
    SOLUTION: An InGaN laser diode structure 100 is equipped with an upper waveguide layer 170 above an MQW(multi-quantum well) region 150, and above this, is equipped with an upper cladding structure 180 composed of a metal oxide of ITO(indum tin oxide). An SiO
    2 isolation structure 185, whose refractive index is lower than that of the ITO clad structure 180, is formed so as to face each other, sandwiching the ITO upper cladding structure 180.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题:提供一种激光二极管结构,其中实现了增强的横向光限制系数和低串联电阻,并且其可以控制由p电极引起的吸收损耗。 解决方案:InGaN激光二极管结构100在MQW(多量子阱)区域150上方设置有上波导层170,并且在其上方配备有由ITO的金属氧化物构成的上包层结构180 (氧化锡)。 折射率低于ITO包层结构180的SiO 2 隔离结构185形成为彼此面对,夹持ITO上包层结构180.版权所有: (C)2005,JPO&NCIPI

    SEMICONDUCTOR LASER STRUCTURE
    29.
    发明专利

    公开(公告)号:JP2003158334A

    公开(公告)日:2003-05-30

    申请号:JP2002289449

    申请日:2002-10-02

    Applicant: XEROX CORP

    Abstract: PROBLEM TO BE SOLVED: To provide a blue color laser in which variations of output power due to transient heating are reduced. SOLUTION: A blue color laser diode comprising III-V group nitride in the short periodic table includes an amplification region 116 and a modulation region 118. The amplification region 116 allows a constant current to flow therethrough, and hereby the region is kept near a lasing threshold. The modulation region 118 has a variable small forward current or back bias voltage for controlling an optical output of the laser. Since consumed electric power of the two region blue color laser diode is very sharply reduced, compared with that of a direct modulation type laser, transient heating and attenuation of the optical output are reduced.

    SUBSTRATE FOR SEMICONDUCTOR STRUCTURE HAVING HIGH THERMAL CONDUCTIVITY

    公开(公告)号:JP2003124407A

    公开(公告)日:2003-04-25

    申请号:JP2002288232

    申请日:2002-10-01

    Applicant: XEROX CORP

    Abstract: PROBLEM TO BE SOLVED: To obtain a substrate having a high thermal conductivity and a structural integrality with a thick board, related to a semiconductor device. SOLUTION: The substrate 100 includes a body 11 having an upper surface 114 and a bottom surface 112 opposite to the upper surface 114 and having the first thermal conductivity, a cavity 116 defined by an inner surface 113 of the body 110 and opened at least on the bottom surface 112, and at least one material 120 disposed in the cavity 116 having the second thermal conductivity higher than the first thermal conductivity and coming into contact with at least a part of the inner surface 113.

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