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    GLASS/QUARTZ COMPOSITE SURFACE
    22.
    发明公开
    GLASS/QUARTZ COMPOSITE SURFACE 审中-公开

    公开(公告)号：US20240067556A1

    公开(公告)日：2024-02-29

    申请号：US18498729

    申请日：2023-10-31

    Applicant: Stone Composite Surfaces, Inc.

    Inventor： Alexander Luis Alvarez

    IPC: C03C3/06 ,  C03B19/09

    CPC classification number: C03C3/06 ,  C03B19/09 ,  C03C2201/60

    Abstract: A glass/quartz composite structure may comprise aggregate including glass grit, nano-glass crystals, and/or amorphous silica that may be produced from crystalline quartz. The aggregate may be in an amount greater than any other single material by weight of the composite structure, which may further include quartz powder and/or alumina as well as a binding resin. The glass/quartz composite structure may be devoid of crystalline silica. The structure may be formed into a 1.2-1.5 cm thick slab for countertops using standard cabinet perimeter support. The slab may be made by mixing the aggregate, the quartz powder and/or alumina, and the binding resin, pouring the mixture in a mold, and compacting the mixture in the mold. Specific natural mineral components, decorative chips, and/or wet mixture pieces may be added to the composite structure to provide aesthetics of specific natural stones.

    Fixation by anion exchange of toxic materials in a glass matrix
    25.
    发明授权
    Fixation by anion exchange of toxic materials in a glass matrix 失效
    通过玻璃基质中有毒物质的阴离子交换固定

    公开(公告)号：US4544499A

    公开(公告)日：1985-10-01

    申请号：US386215

    申请日：1982-06-07

    Applicant: Danh C. Tran ,  Pedro B. Macedo ,  Joseph H. Simmons ,  Catherine J. Simmons ,  Nicholas Lagakos

    Inventor： Danh C. Tran ,  Pedro B. Macedo ,  Joseph H. Simmons ,  Catherine J. Simmons ,  Nicholas Lagakos

    IPC: G21F9/30 ,  G21F9/36 ,  G21F9/16

    CPC classification number: C03C11/005 ,  C03C1/002 ,  C03C1/026 ,  C03C21/001 ,  C03C23/0095 ,  C03C3/06 ,  C03C3/061 ,  C03C3/089 ,  G21F9/305 ,  G21F9/36 ,  C03C2201/10 ,  C03C2201/20 ,  C03C2201/23 ,  C03C2201/3411 ,  C03C2201/3423 ,  C03C2201/3429 ,  C03C2201/40 ,  C03C2201/54 ,  C03C2201/60

    Abstract: This invention relates to the immobilization of toxic, e.g., radioactive materials, internally in a silicate glass or silica gel matrix for extremely long periods of time. Toxic materials, such as radioactive wastes containing radioactive anions, and in some cases cations, which may be in the form of liquids, or solids dissolved or dispersed in liquids or gases, are internally incorporated into a glass matrix, having hydrous organofunctionalsiloxy groups, e.g., hydrous aminoalkylsiloxy or carboxyorganosiloxy, bonded to silicon atoms of said glass and/or hydrous polyvalent metals bonded to silicon atoms of said glass through divalent oxygen linkages or otherwise immobilized therein, by a process which involves the ion exchange of said toxic, radioactive anions with hydroxyl groups attached to said organofunctionalsiloxy groups or with hydroxyl groups attached to the hydrous polyvalent metal. Thereafter, the resulting glass now characterized by a distribution of internally bonded or immobilized, toxic, radioactive anions can be packaged in suitable containers, and disposed of as by burial, and/or they can be sintered to collapse the pores thereof to disposal or for producing useful radiation sources. The porous glass or a porous silica gel having said silicon-bonded organofunctionalsiloxy groups and/or said hydrous polyvalent metal oxy groups, the pores of said glass or silica gel remaining open and uncollapsed, can be used advantageously as a backfill for an underground radioactive waste burial site and as overpack in the waste disposal container. Also included is a novel method for bonding the polyvalent metal to the porous silica glass or gel by substituting the protons of the silicon-bonded hydroxyl groups thereof with an alkali metal or ammonium cation followed by displacement of said cation with the non-radioactive polyvalent metal cation.

    Abstract translation: 本发明涉及在硅酸盐玻璃或硅胶基质中内部有毒的例如放射性物质固定极长时间。 含有放射性阴离子的放射性废物，以及在某些情况下，可能是液体形式的阳离子或溶解或分散在液体或气体中的固体的有毒材料内部加入到具有含水官能团的甲硅烷氧基的玻璃基质中，例如 ，含水氨基烷基甲硅烷氧基或羧基有机基甲硅烷氧基，通过涉及将所述有毒放射性阴离子与所述有机放射性阴离子的离子交换的方法，通过二价氧键键合到所述玻璃的硅原子和/或与所述玻璃的硅原子键合的含水多价金属， 连接到所述有机电致甲硅烷氧基基团的羟基或与水合多价金属连接的羟基的羟基。 此后，所得玻璃的特征在于内部结合或固定的，有毒的放射性阴离子的分布可以包装在合适的容器中，并通过埋置进行处理，和/或它们可以烧结以将其孔隙塌缩以处理或用于 生产有用的辐射源。 所述多孔玻璃或多孔硅胶具有所述与硅键合的有机铁氧基甲硅烷氧基和/或所述含水多价金属氧基，所述玻璃或硅胶的孔保持开放和未破裂，可有利地用作地下放射性废物的回填 垃圾处理容器内的包装物， 还包括一种通过用碱金属或铵阳离子取代与硅键合的羟基的质子，然后用非放射性多价金属置换所述阳离子来将多价金属键合到多孔石英玻璃或凝胶上的新方法 阳离子。

    플라즈마 디스플레이 패널용 유전체 및 그 제조방법
    27.
    发明公开
    플라즈마 디스플레이 패널용 유전체 및 그 제조방법 失效
    用于等离子体显示面板的电介质材料及其制备方法

    公开(公告)号：KR1020040013816A

    公开(公告)日：2004-02-14

    申请号：KR1020020046902

    申请日：2002-08-08

    Applicant: 한국과학기술원

    Inventor： 배병수 ,  이태호 ,  강은석

    IPC: C03C17/30

    CPC classification number: C03C3/12 ,  C03C2201/60 ,  C03C2203/27 ,  H01B3/087 ,  H01J11/38

    Abstract: PURPOSE: Provided is a dielectric material for a plasma display panel, which has dielectric properties similar to a conventional glass paste dielectric layer and forms a dielectric layer through a simple process by various coating techniques. CONSTITUTION: The dielectric material for a plasma display panel is prepared by a sol-gel method and comprises an organosilicon compound having a net structure crosslinked by an oxygen atom bonded to a silicon atom or a crosslinkable organic monomer. The plasma display panel is obtained by forming a dielectric layer from the dielectric material using a conventional coating method and firing the dielectric layer by heat or ultraviolet rays.

    Abstract translation: 目的：提供一种用于等离子体显示面板的介电材料，其具有类似于传统玻璃浆介电层的介电特性，并通过各种涂覆技术通过简单的工艺形成电介质层。 构成：用于等离子体显示面板的电介质材料通过溶胶 - 凝胶法制备，并且包含具有通过与硅原子键合的氧原子交联的网状结构的有机硅化合物或可交联有机单体。 等离子体显示面板通过使用常规的涂布方法从电介质材料形成电介质层并通过热或紫外线烧制电介质层而获得。

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