公开(公告)号：US20040055869A1

公开(公告)日：2004-03-25

申请号：US10645587

申请日：2003-08-22

Inventor： Robert R. Moore

IPC: B01J019/08

CPC classification number: H01L21/6719 ,  B01D53/323 ,  B01D53/75 ,  B01D2259/818 ,  B01J6/008 ,  B01J10/02 ,  B01J19/088 ,  B01J2219/00013 ,  B01J2219/0002 ,  B01J2219/0875 ,  B01J2219/0879 ,  B01J2219/0884 ,  B01J2219/0894 ,  C10B53/00 ,  F23G2204/201 ,  F23G2209/14 ,  F23J15/006 ,  H01J37/32009 ,  H01J37/32348 ,  H01J37/32532 ,  H01L21/6708 ,  H01L21/67196 ,  H05H1/2406 ,  H05H2001/2412 ,  H05H2001/245

Abstract: A falling film plasma reactor (FFPR) provides a number of benefits for the treatment of process gases. The falling film plasma reactor uses high voltage alternating current or pulsed direct current which is applied to radially separated electrodes to thereby create a dielectric breakdown of the process gas that is flowing within the large radial gap between the two electrodes. Typical plasma reactors often utilize fixed dielectric construction which can result in potential failure of the device by arcing between the electrodes as portions of the dielectric fail. Such failures are prevented by using a dielectric liquid that constantly flows over the electrodes, or over a fixed dielectric barrier over the electrodes.

Abstract translation: 降膜等离子体反应器（FFPR）为处理工艺气体提供了许多益处。 降膜等离子体反应器使用施加到径向分离的电极的高压交流电或脉冲直流电，从而产生在两个电极之间的大径向间隙内流动的工艺气体的电介质击穿。 典型的等离子体反应器通常采用固定的介电结构，这可能导致器件在电介质之间的电弧失效的电弧故障。 通过使用不断地流过电极的电介质液体，或在电极上方的固定电介质阻挡层上，可以防止这种故障。

公开(公告)号：US20040050684A1

公开(公告)日：2004-03-18

申请号：US10407141

申请日：2003-04-02

Applicant: Plasmasol Corporation

Inventor： Sergei Babko-Malyi ,  Richard Crowe

IPC: B01J019/08

CPC classification number: A61L2/206 ,  A61L2/14

Abstract: A system and method for the injection of an organic based reagent into weakly ionized gas to generate chemically active species. The organic based reagent may be a combination of an organic additive (e.g., an alcohol or ethylene) mixed with an oxidizer (e.g., oxygen) prior to being introduced in the weakly ionized gas. Alternatively, the organic based reagent may be the injection of an organic additive alone in the weakly ionized gas while in the presence of air (non vacuum chamber) that inherently contains oxygen and serves as the oxidizer. Also, the organic based reagent may comprise an organic additive that itself includes an oxidizing component such as EO. In this situation the oxidizing component of the organic component when injected into the weakly ionized gas forms hydroxyl radicals that may be a sufficient oxidizer to eliminate the need for a supplemental oxidizer. Regardless of the organic based reagent used, the organic additive reacts with the oxidizer while in the presence of weakly ionized gas to initiate the production of chemically active species. This system and method may be used for sterilization whereby the increased concentrations of generated chemically active species accelerate and improve overall destruction rates of undesirable chemical and/or biological contaminants on surfaces and/or in fluid streams.

Abstract translation: 一种用于将有机基试剂注入弱电离气体以产生化学活性物质的系统和方法。 在引入弱电离气体之前，有机基试剂可以是与氧化剂（例如氧）混合的有机添加剂（例如醇或乙烯）的组合。 或者，有机基试剂可以是在存在空气（非真空室）的情况下，在弱离子化气体中单独注入有机添加剂，其固有地含有氧并用作氧化剂。 此外，有机基试剂可以包含本身包含氧化组分如EO的有机添加剂。 在这种情况下，当注入弱电离气体时，有机组分的氧化组分形成羟基，其可以是足够的氧化剂以消除对补充氧化剂的需要。 不管使用的有机基试剂，有机添加剂在弱电离气体的存在下与氧化剂反应，开始生产化学活性物质。 该系统和方法可用于灭菌，由此增加的生成的化学活性物质的浓度加速并改善表面和/或流体物流中不期望的化学和/或生物污染物的总体破坏率。

公开(公告)号：US20040045806A1

公开(公告)日：2004-03-11

申请号：US10432167

申请日：2003-08-14

Inventor： Willi Neff ,  Franz-Josef Trompeter ,  Oliver Franken ,  Klaus Pochner

IPC: B01J019/08

CPC classification number: H01J37/32431 ,  A61L2/10 ,  A61L2/14 ,  B01J19/088 ,  B01J19/123 ,  B01J2219/0813 ,  B01J2219/082 ,  B01J2219/0835 ,  B01J2219/0841 ,  B01J2219/0879 ,  B01J2219/0894 ,  B08B7/0035 ,  H05H1/2406 ,  H05H2001/2412

Abstract: The present invention relates to a method and a device for treating the surface of objects, in particular strip material or deep-drawn material, in which the to-be-treated surface (2) of the object (1) is subjected to a barrier discharge which is generated between a first planar electrode (4) and a second planar electrode (5) in a discharge region (3) which is filled with a first gas or gas mixture, with a plasma-excited second gas or gas mixture which emits UV radiation being utilized as the second electrode (5). A surface treatment of greater efficiency and less duration including complete sterilization at low temperatures are achieved with the present method and the corresponding device.

Abstract translation: 本发明涉及一种用于处理物体表面的方法和装置，特别是带材或深拉材料，其中待处理的物体（1）的表面（2）经受阻挡层 在填充有第一气体或气体混合物的放电区域（3）中在第一平面电极（4）和第二平面电极（5）之间产生的放电与等离子体激发的第二气体或气体混合物发射 UV辐射被用作第二电极（5）。 使用本方法和相应的装置实现更高效率和更少持续时间的表面处理，包括在低温下的完全灭菌。

公开(公告)号：US20040040833A1

公开(公告)日：2004-03-04

申请号：US10064888

申请日：2002-08-27

Applicant: General Electric Company

Inventor： Marc Schaepkens ,  Charles Dominic Iacovangelo ,  James Neil Johnson ,  William Arthur Morrison

IPC: B01J019/08

CPC classification number: H01J37/32357

Abstract: An apparatus that generates at least one plasma that is stable and adjustable in real time. In one embodiment, the apparatus includes multiple plasma sources that can either be nulltunednull in real time to generate plasmas that are similar to each other or, conversely, nulldetunednull to generate dissimilar plasmas. The apparatus may be sued to provide plasma treatmentnullsuch as, but not limited to, coating, etching and activation for an article. The invention also provides a plasma source in which operating parameters are adjustable in real time. Methods of providing such plasmas and treating an article using such plasmas are also disclosed.

Abstract translation: 产生稳定且可实时调节的至少一个等离子体的装置。 在一个实施例中，该装置包括多个等离子体源，其可以被实时“调谐”以产生彼此相似的等离子体，或相反地“失谐”以产生不相似的等离子体。 可以提出该装置以提供等离子体处理，例如但不限于用于制品的涂覆，蚀刻和激活。 本发明还提供一种其中操作参数可实时调节的等离子体源。 还公开了提供这种等离子体并使用这种等离子体处理制品的方法。

公开(公告)号：US20040026231A1

公开(公告)日：2004-02-12

申请号：US10419052

申请日：2003-04-17

Inventor： Patrick A. Pribyl

IPC: B01J019/08

CPC classification number: H01J37/32522 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32128 ,  H01J37/32174 ,  H01Q7/00 ,  H01Q21/205 ,  H05H1/46

Abstract: An RF driver circuit and an orthogonal antenna assembly/configuration, are disclosed as part of a method and system for generating high density plasma. The antenna assembly is an orthogonal antenna system that may be driven by any RF generator/circuitry with suitable impedance matching to present a low impedance. The disclosed RF driver circuit uses switching type amplifier elements and presents a low output impedance. The disclosed low-output impedance RF driver circuits eliminate the need for a matching circuit for interfacing with the inherent impedance variations associated with plasmas. Also disclosed is the choice for capacitance or an inductance value to provide tuning for the RF plasma source. There is also provided a method for rapidly switching the plasma between two or more power levels at a frequencies of about tens of Hz to as high as hundreds of KHz.

Abstract translation: 作为用于产生高密度等离子体的方法和系统的一部分，公开了RF驱动电路和正交天线组件/配置。 天线组件是正交天线系统，其可以由具有适当阻抗匹配的任何RF发生器/电路驱动以呈现低阻抗。 所公开的RF驱动器电路使用开关型放大器元件并呈现低输出阻抗。 所公开的低输出阻抗RF驱动器电路消除了与用于与等离子体相关联的固有阻抗变化进行接口的匹配电路的需要。 还公开了为RF等离子体源提供调谐的电容或电感值的选择。 还提供了一种用于在等于几十赫兹至高达数百赫兹的频率的两个或多个功率电平之间快速切换等离子体的方法。

公开(公告)号：US20040018125A1

公开(公告)日：2004-01-29

申请号：US10200170

申请日：2002-07-23

Inventor： Chien Ou Yang ,  Wei Ou Yang

IPC: B01J019/08

CPC classification number: A61L9/205 ,  F24F3/166 ,  F24F2003/1667

Abstract: A sterilizing photo catalyst device of air conditioner, wherein one or more ultraviolet (UV) light-emitting diodes (LEDs) are installed at the passageway mouth, the intake, or the outlet of an air conditioner. The UV LEDs can thus be placed at one side of a filter net and a photo catalyst attached together to save a holder for supporting the photo catalyst net, hence simplifying the whole structure. Simultaneously, the UV LEDs are connected in parallel. When one of the UV LEDs malfunctions, the rest of UV LEDs still can work and partly function properly. Moreover, because no ICs are required in the whole circuit, the cost is lower.

Abstract translation: 一种空调器的杀菌光催化剂装置，其中一个或多个紫外线（UV）发光二极管（LED）安装在空调的通道口，进气口或出口处。 因此，UV LED可以放置在滤网的一侧和附着在一起的光催化剂，以节省用于支撑光催化剂网的保持器，从而简化整个结构。 同时，UV LED并联连接。 当其中一个UV LED发生故障时，其余的UV LED仍然可以工作并部分正常工作。 此外，由于在整个电路中不需要IC，所以成本较低。

公开(公告)号：US20030230477A1

公开(公告)日：2003-12-18

申请号：US10064154

申请日：2002-06-14

Inventor： Ronald G. Fink ,  Walter Ellis ,  Charles Pearsall

IPC: B01J019/08 ,  C01B003/00

CPC classification number: C01B13/10 ,  A61L9/015 ,  A61L9/20 ,  B01D53/007 ,  F24F2003/1667 ,  Y02A50/22 ,  Y02A50/235

Abstract: The present invention is a high volume, wall-mountable air sanitation apparatus for disinfecting and removing VOCs from air with high energy UV light and ozone. The apparatus has a powerful fan and an elongated UV light source and target for use with the movement of a large volume of air. The target includes a mesh and a secondary target both comprising a target compound which creates hydro-peroxides, super oxide ions and hydroxyl radicals in the presence of water also for removing pollutants in the air.

Abstract translation: 本发明是一种高容量，壁挂式空气卫生设备，用于对具有高能量UV光和臭氧的空气进行消毒和除去VOC。 该设备具有强大的风扇和细长的UV光源和目标，可用于大量空气的运动。 目标包括网格和次要目标物，它们都包含在水存在下产生加氢过氧化物，超氧化物离子和羟基的目标化合物，也用于除去空气中的污染物。

公开(公告)号：US20030215373A1

公开(公告)日：2003-11-20

申请号：US10151425

申请日：2002-05-20

Inventor： Leonid E. Reyzelman ,  John E. Sortor

IPC: B01J019/08

CPC classification number: H01J37/32174 ,  H01J37/32082 ,  H05H1/46

Abstract: A radio frequency (RF) generator apparatus for a plasma processing system that is resistant to nonlinear load mismatch conditions is provided. The apparatus includes an RF oscillator configured to generate an RF signal, an RF amplifier responsive to the RF signal to produce a VHF RF signal having sufficient power to drive a plasma chamber load, and a VHF-band circulatorcoupled to the amplifier and configured to isolate nonlinearities of the plasma chamber load from the amplifier.

Abstract translation: 提供了一种耐非线性负载失配条件的等离子体处理系统的射频（RF）发生器装置。 该装置包括被配置为产生RF信号的RF振荡器，响应于RF信号的RF放大器以产生具有足够功率以驱动等离子体室负载的VHF RF信号，以及耦合到放大器并被配置为隔离的VHF频带循环器 来自放大器的等离子体室负载的非线性。

公开(公告)号：US20030206840A1

公开(公告)日：2003-11-06

申请号：US10074347

申请日：2002-02-12

Inventor： Charles E. Taylor ,  Shek Fai Lau ,  Andrew J. Parker ,  Tristan M. Christianson ,  Gregory S. Snyder ,  Edward C. McKinney JR.

IPC: B01J019/08

CPC classification number: A61L9/015 ,  A61L9/20 ,  A61L9/22 ,  B01D53/32 ,  B03C3/12 ,  B03C3/743 ,  B03C2201/14 ,  B60H3/0071 ,  C01B13/11 ,  C01B13/115 ,  C01B2201/12 ,  C01B2201/20 ,  C01B2201/22 ,  F24F2003/1667 ,  F24F2003/1682 ,  F24F2003/1685 ,  H01T23/00

Abstract: An electro-kinetic air conditioner for removing particulates from the air creates an airflow using no moving parts. The airflow is subjected to UV radiation from a germicidal lamp within the device. The conditioner includes an ion generator that has an electrode assembly including a first array of emitter electrodes, a second array of collector electrodes, and a high voltage generator. The device can also include a third or leading or focus electrode located upstream of the first array of emitter electrodes, and/or a trailing electrode located downstream of the second array of collector electrodes, and/or an interstitial electrode located between collector electrodes, and/or an enhanced emitter electrode with an enhanced length in order to increase emissivity.

Abstract translation: 用于从空气中去除微粒的电动空调器产生不使用移动部件的气流。 气流经受设备内杀菌灯的紫外线辐射。 该护发素包括具有电极组件的离子发生器，该电极组件包括第一发射极阵列，第二集电极阵列和高压发生器。 该器件还可以包括位于第一阵列发射极电极上游的第三或前置或聚焦电极，和/或位于第二集电极阵列下游的尾电极和/或位于集电极之间的间隙电极，以及 /或具有增强的长度的增强发射极，以增加发射率。

公开(公告)号：US20030183503A1

公开(公告)日：2003-10-02

申请号：US10401631

申请日：2003-03-31

Applicant: EBARA CORPORATION

Inventor： Toshiaki Fujii

IPC: B01J019/08 ,  B01J019/12

CPC classification number: B01D53/66 ,  B01D53/007 ,  B01D53/8668 ,  B01D2255/802 ,  B01D2257/106 ,  B01D2258/0216 ,  B01D2259/804

Abstract: A method and an apparatus for purifying a gas containing contaminants are disclosed. The gas is irradiated with an ultraviolet ray and/or a radiation ray so as to produce microparticles of the contaminants. The resultant microparticles of the contaminants are contacted with a photocatalyst. Then, the photocatalyst is irradiated with light so as to decompose the contaminants held in contact with the photocatalyst. Organic compounds, organosilicon compounds, basic gas and the like can be decomposed by the action of the photocatalyst. Even when these species are present at a low concentration, they can be concentrated locally by transforming into microparticles, and hence can be removed.