公开(公告)号：US20040101625A1

公开(公告)日：2004-05-27

申请号：US10640934

申请日：2003-08-14

Inventor： Mrinal Kanti Das ,  Adam William Saxler

IPC: B05D003/04

CPC classification number: H01L21/049 ,  H01L21/3143 ,  H01L21/3145

Abstract: A nitrided oxide layer on a silicon carbide layer is processed by annealing the nitrided oxide layer in a substantially oxygen-free nitrogen containing ambient. The anneal may be carried out at a temperature of greater than about 900null C., for example, a temperature of about 1100null C., a temperature of about 1200null C. or a temperature of about 1300null C. Annealing the nitrided oxide layer may be carried out at a pressure of less than about 1 atmosphere, for example, at a pressure of from about 0.01 to about 1 atm or, in particular, at a pressure of about 0.2 atm. The nitrided oxide layer may be an oxide layer that is grown in a N2O and/or NO containing ambient, that is annealed in a N2O and/or NO containing ambient or that is grown and annealed in a N2O and/or NO containing ambient.

Abstract translation: 通过在基本上无氧的含氮环境中退火氮化氧化物层来处理碳化硅层上的氮化氧化物层。 退火可以在大于约900℃的温度下进行，例如约1100℃的温度，约1200℃的温度或约1300℃的温度。退火氮化 氧化物层可以在小于约1大气压的压力下进行，例如在约0.01至约1atm的压力下，或特别是约0.2atm的压力下进行。 氮化氧化物层可以是在N 2 O和/或含NO的环境中生长的氧化物层，其在N 2 O和/或含NO的环境中退火或者在N 2 O和/或含NO的环境中生长和退火。

公开(公告)号：US20040096707A1

公开(公告)日：2004-05-20

申请号：US10453470

申请日：2003-06-03

Inventor： Sankar Sambasivan ,  Scott A. Barnett ,  Ilwon Kim ,  John W. Rechner

IPC: B05D003/04 ,  B05D003/02 ,  B32B009/00

CPC classification number: H01L39/2461 ,  C23C8/02 ,  C30B23/02 ,  C30B29/22 ,  C30B29/225 ,  C30B29/38 ,  C30B33/005

Abstract: The present invention relates to oxides on suitable substrates, as converted from nitride precursors.

Abstract translation: 本发明涉及从氮化物前体转化的合适基底上的氧化物。

公开(公告)号：US20040086647A1

公开(公告)日：2004-05-06

申请号：US10690942

申请日：2003-10-22

Applicant: Xerox Corporation

Inventor： Joseph A. Swift ,  Donald Stanton

IPC: B05D003/04 ,  B05D003/02

CPC classification number: G03G15/162 ,  G03G2215/1685 ,  Y10T428/31663 ,  Y10T428/31667 ,  Y10T442/2041 ,  Y10T442/2057 ,  Y10T442/2787 ,  Y10T442/2803

Abstract: Process for preparing durable, re-usable intermediate toner image-transfer belts or electrostatic transfuse belts. The present belts have a continuous elastomer-impregnated fibrous fabric support and at least one outer smooth release layer of a cured elastomer polymer. The invention is characterized by the application of a thin primer layer of a hydrolyzable polyfunctional silicone composition between the elastomer-coated surface of the fabric support and the outer elastomer polymer layer. The polyfunctional silicone chemically-bonds to the elastomer of the fabric support during hydrolysis and chemically-bonds to the outer elastomer layer during its cure, to form a durable, heat-resistant transfuse belt. The layers maybe applied to the fabric support by spray application as dilute solutions.

公开(公告)号：US20040058080A1

公开(公告)日：2004-03-25

申请号：US10470060

申请日：2003-07-24

Inventor： Masahiro Kawasaki

IPC: B05D003/04 ,  B05D001/36

CPC classification number: G02B6/132 ,  C23C16/24 ,  C23C16/56 ,  C30B33/005

Abstract: There is provided a method of forming a silicon dioxide film, which comprises repeating a step of depositing a silicon layer on a silicon substrate to forma silicon dioxide film of a predetermined thickness, and which makes it possible to suitably select the surface roughness of the silicon dioxide film that is formed and the rate of growth of the silicon film that is deposited. According to the method of forming the silicon dioxide film that is proposed above, it comprises a step of depositing any one of polysilicon, epitaxial silicon or amorphous silicon on the silicon substrate or on the silicon dioxide film formed on the silicon substrate by the thermal oxidation treatment to form a silicon film, and a step of thermally oxidizing the silicon film to convert it into a silicon dioxide film, the step of deposition and the step of thermal oxidation being repeated a plural number of times.

Abstract translation: 提供一种形成二氧化硅膜的方法，其包括重复在硅衬底上沉积硅层以形成预定厚度的二氧化硅膜的步骤，并且使得可以适当地选择硅的表面粗糙度 形成的二氧化硅膜和沉积的硅膜的生长速率。 根据以上提出的形成二氧化硅膜的方法，其包括通过热氧化在硅衬底或硅衬底上形成的二氧化硅膜上沉积多晶硅，外延硅或非晶硅中的任何一种的步骤 处理以形成硅膜，以及热氧化硅膜以将其转化为二氧化硅膜的步骤，沉积步骤和热氧化步骤重复多次。

公开(公告)号：US20030203153A1

公开(公告)日：2003-10-30

申请号：US10133449

申请日：2002-04-29

Inventor： Dennis J. Jones JR.

IPC: B32B033/00 ,  D05C017/02 ,  B05D001/00 ,  B05D003/04 ,  B05D007/00 ,  B05D001/38

CPC classification number: B32B33/00 ,  B32B2037/243 ,  B32B2307/7265 ,  B32B2471/02 ,  D06N7/0073 ,  D06N2201/02 ,  D06N2201/0254 ,  D06N2201/0263 ,  D06N2205/04 ,  D06N2209/128 ,  D06N2209/146 ,  D06N2209/147 ,  Y10T428/23979 ,  Y10T428/23986

Abstract: To improve the liquid barrier properties of a carpet, a repellency compound, such as a fluorochemical, is applied to the backstitch side or underside of the primary backing layer of a carpet.

Abstract translation: 为了改善地毯的液体屏障性能，将排斥性化合物如含氟化合物施加到地毯的主衬里层的背面侧面或下侧。

公开(公告)号：US20030157253A1

公开(公告)日：2003-08-21

申请号：US10219137

申请日：2002-08-15

Inventor： James Horwitz ,  Douglas B. Chrisey ,  Adrian Carter ,  Manfred Kahn

IPC: B05D003/04 ,  B05D003/02

CPC classification number: C23C14/5806 ,  C04B35/016 ,  C04B35/4682 ,  C04B35/47 ,  C04B35/491 ,  C04B35/495 ,  C04B2235/3201 ,  C04B2235/3213 ,  C04B2235/3215 ,  C04B2235/3227 ,  C04B2235/3251 ,  C04B2235/6587 ,  C23C14/088

Abstract: A multicomponent film on a substrate can be annealed at higher temperatures in oxygen by using a specifically designed annealing vessel. The vessel is formed of a multicomponent material which has at least all of the components of the first multicomponent material of the film or, in the case where there are nonvolatile components, then the vessel is formed of a second multicomponent material which has at least the same composition of relatively volatile components as the first multicomponent film. As the multicomponent film is annealed for a sufficient time within the vessel the multicomponent film remains in contact with a vapor of the first multicomponent material and the vessel material. This process called bomb annealing prevents loss of volatile components from the film and roughening of the film surface and leads to films with lower dielectric loss. Preferred thin film materials are ferroelectric materials although any material could be used. The annealing can be done in oxygen at temperatures higher than 900null C.

公开(公告)号：US20030148193A1

公开(公告)日：2003-08-07

申请号：US10216925

申请日：2002-08-13

Inventor： In-Kyun Shin ,  Jung-Min Sohn ,  Hee-Sun Yoon ,  Seong-Woon Choi

IPC: G03F009/00 ,  G03C005/00 ,  B05D003/04 ,  B05D003/10

CPC classification number: G03F7/70125 ,  G03F1/34 ,  G03F1/50

Abstract: A photomask that is capable of implementing off-axis illumination (OAI), and a method of fabricating the same, are provided. The photomask includes a transparent substrate, a plurality of opaque patterns formed on the front surface of the transparent substrate, for defining a floodlighting portion for forming patterns, and a plurality of phase gratings formed on the back surface of the transparent substrate, allowing off-axis illumination (OAI) of an incident light source beyond the OAI limit of exposure equipment, allowing use in the outmost region of an aperture, and allowing modified illumination having a shape suitable for the layout of the opaque patterns.

Abstract translation: 提供能够实现离轴照明（OAI）的光掩模及其制造方法。 光掩模包括透明基板，形成在透明基板的前表面上的多个不透明图案，用于限定用于形成图案的泛光部分，以及形成在透明基板的背面上的多个相位光栅， 入射光源的轴向照明（OAI）超过曝光设备的OAI限制，允许在孔的最外部区域使用，并允许具有适于布局不透明图案的形状的改进的照明。

公开(公告)号：US20030134041A1

公开(公告)日：2003-07-17

申请号：US10239389

申请日：2002-11-18

Inventor： Joon-Won Park ,  Hong-Jin Kim

IPC: B05D003/04 ,  B05D003/10

CPC classification number: C08G83/005

Abstract: Provided is a method for forming solid substrates having high density of primary amine group on its surface, in which the primary amine groups on the surface of an aminosilylated substrate are treated with aziridine or an aziridine derivative. The surface density of the primary amine functional groups (nullNH2) on the very top surface of a substrate can be drastically increased.

公开(公告)号：US20030079652A1

公开(公告)日：2003-05-01

申请号：US10003626

申请日：2001-10-31

Inventor： Mark L. Choy

IPC: C09D011/00 ,  B05D001/26 ,  B05D003/04 ,  B05D003/10 ,  B05D003/02 ,  B05D001/32

CPC classification number: C09D11/54 ,  B41J2/2107 ,  B41J11/002 ,  B41M5/0017 ,  B41M5/508 ,  B41M5/5254 ,  B41M7/0018 ,  C09D11/30 ,  G03G11/00

Abstract: Ink and fixer compositions for printing on hydrophobic media. The ink compositions include a water soluble dye and a vehicle, the vehicle includes water, a glycol ether, a humectant, and a non-ionic surfactant. The fixer compositions include a fixing agent and a vehicle, the vehicle includes water, a glycol ether, a humectant, and a non-ionic surfactant. Methods of printing on hydrophobic media. The methods include the steps of providing an ink that includes a water soluble dye and a vehicle, the vehicle including water, a glycol ether, a humectant, and a non-ionic surfactant; providing a hydrophobic print medium; and depositing the ink on the hydrophobic print medium. The method of printing may further include steps of applying heat to the hydrophobic print medium during and/or after the ink deposition step. The method of printing may yet further include steps of providing a fixer that includes a fixing agent and a vehicle, the vehicle including water, a glycol ether, a humectant, and a non-ionic surfactant; and depositing the fixer on the hydrophobic print medium before, after, or both before and after the ink is deposited.

Abstract translation: 用于在疏水介质上印刷的油墨和定影剂组合物。 油墨组合物包括水溶性染料和载体，载体包括水，二醇醚，保湿剂和非离子表面活性剂。 定影剂组合物包括固定剂和载体，载体包括水，二醇醚，保湿剂和非离子表面活性剂。 疏水介质印刷方法。 所述方法包括提供包含水溶性染料和载体的油墨的步骤，所述载体包括水，二醇醚，保湿剂和非离子表面活性剂; 提供疏水印刷介质; 以及将油墨沉积在疏水性打印介质上。 印刷方法还可以包括在油墨沉积步骤期间和/或之后向疏水性印刷介质施加热量的步骤。 打印方法还可以包括提供包括固定剂和载体的定影剂的步骤，所述载体包括水，二醇醚，保湿剂和非离子表面活性剂; 以及在沉积墨水之前，之后或之前将定影剂沉积在疏水性印刷介质上。

公开(公告)号：US20030026994A1

公开(公告)日：2003-02-06

申请号：US09394320

申请日：1999-09-13

Inventor： HIDEYUKI HATAKEYAMA ,  MASANOBU OHGANE

IPC: B05D003/10 ,  B05D003/04

CPC classification number: G02B5/0866 ,  G02B5/0858 ,  Y10T428/3154

Abstract: The present invention provides a reflective optical element being excellent in reflectivity and transmittance having a metallic thin film being excellent in durability and abrasion resistance wherein, in the reflective optical element in which light impinges in the transparent substrate and projects out after repeating reflection on the back plane, the reflection plane is formed by laminating the transparent substrate, metallic thin film and amorphous fluorocarbon resin in this order while forming a layer of the amorphous fluorocarbon resin on the incident and projection planes simultaneously with forming the layer on the outermost layer to allow durability and abrasion resistance to be improved with the amorphous fluorocarbon resin on the reflection plane, silver being deposited on the metallic layer by electroless plating in depositing the films while the amorphous fluorocarbon resin being preferably deposited by a wet film-deposition method such as a dip-coating method.

Abstract translation: 本发明提供一种具有优异的反射率和透射率的反射光学元件，其具有耐久性和耐磨性优异的金属薄膜，其中在反射光学元件中，其中光照射在透明基板中并在背面反复反射之后突出出来 在反射面上依次层叠透明基板，金属薄膜和无定形碳氟树脂，同时在入射面和投影面上同时形成非晶氟碳树脂层，同时在最外层形成层，从而使耐久性 并且通过反射平面上的无定形氟碳树脂改善耐磨性，在沉积薄膜的同时通过无电解电镀将银沉积在金属层上，而非晶氟碳树脂优选通过湿式薄膜沉积方法如浸渍 - 涂布方法。