公开(公告)号：US20030076497A1

公开(公告)日：2003-04-24

申请号：US10193769

申请日：2002-07-10

Inventor： Robert Gregory Wolf ,  Christopher Morath ,  Robin Mair

IPC: G01J004/00

CPC classification number: G01B11/0666 ,  G01N21/1702 ,  G01N21/211 ,  G01N2021/1725

Abstract: An optical system includes both a microspot broadband spectroscopic ellipsometer and a photoacoustic film thickness measurement system that are supplied laser light by the same laser light source. One of the systems makes a measurement, the result of which is used to adjust a parameter of the other system; e.g. the ellipsometer measures thickness and the photoacoustic system uses the thickness result to measure the speed of sound. In one version, the ellipsometer converts the laser beam to a broad-spectrum beam that provides higher intensity.

公开(公告)号：US20030067603A1

公开(公告)日：2003-04-10

申请号：US10235648

申请日：2002-09-06

Applicant: Dainippon Screen Mfg. Co., Ltd.

Inventor： Masahiro Horie

IPC: G01J004/00 ,  B05D001/00

CPC classification number: G01N21/211 ,  G01N21/8422

Abstract: In a dielectric constant measuring apparatus provided are a light source for irradiating a substrate with light in a visible or near-ultraviolet wavelength range, a spectroscope for receiving reflected light from the substrate, and a first optical characteristic acquiring unit for acquiring the spectral reflectance of the substrate. Further are provided therein a light source for irradiating the substrate with light in an infrared wavelength range, a spectroscope for receiving transmission light from the substrate, and a second optical characteristic acquiring unit for acquiring the spectral transmittance of the substrate. The dielectric constant of a dielectric film on the substrate is obtained by a first parameter set calculation unit, a second parameter set calculation unit and a dielectric constant calculation unit, using the spectral reflectance and spectral transmittance of the substrate. It is thereby possible to achieve a noncontact measurement of the dielectric constant of the dielectric film on the substrate.

Abstract translation: 所提供的介电常数测量装置是用于用可见光或近紫外线波长范围的光照射基板的光源，用于接收来自基板的反射光的分光镜，以及第一光学特性获取单元，用于获取 底物。 此外还设置有用于用红外线波长范围的光照射基板的光源，用于接收来自基板的透射光的分光器，以及用于获取基板的光谱透射率的第二光学特性获取单元。 通过使用基板的光谱反射率和光谱透射率的第一参数组计算单元，第二参数组计算单元和介电常数计算单元来获得基板上的电介质膜的介电常数。 由此，能够实现基板上的电介质膜的介电常数的非接触式的测量。

公开(公告)号：US20030025905A1

公开(公告)日：2003-02-06

申请号：US10219632

申请日：2002-08-14

Inventor： Steven W. Meeks

IPC: G01N021/88 ,  G01J004/00

CPC classification number: G01B11/0616 ,  G01B11/0641 ,  G01B11/306 ,  H01L22/12

Abstract: Scratches, pits and particles which are smaller or larger than the beam size may be measured and identified by a dual beam technique. This invention uses a pair of orthogonally oriented laser beams, one in the radial and one in the circumferential direction. The scattered light from radial and circumferential beams allows the detection and classification of particles, pits and scratches.

Abstract translation: 可以通过双光束技术来测量和识别小于或大于光束尺寸的划痕，凹坑和颗粒。 本发明使用一对正交定向的激光束，一个在径向上和一个沿圆周方向。 来自径向和圆周波束的散射光允许检测和分类颗粒，凹坑和划痕。

公开(公告)号：US20030020911A1

公开(公告)日：2003-01-30

申请号：US10245477

申请日：2002-09-17

Inventor： Baoliang Wang ,  Theodore C. Oakberg ,  Paul Kadlec

IPC: G01J004/00

CPC classification number: G01N21/23 ,  G01J4/04

Abstract: A practical system and method for precisely measuring low-level birefringence properties (retardance and fast axis orientation) of optical materials (26). The system permits multiple measurements to be taken across the area of a sample to detect and graphically display (100) variations in the birefringence properties across the sample area. In a preferred embodiment, the system incorporates a photoelastic modulator (24) for modulating polarized light that is then directed through a sample (26). The beam (nullBinull) propagating from the sample is separated into two parts, with one part (nullB1null) having a polarization direction different than the polarization direction of the other beam part (nullB2null). These separate beam parts are then processed as distinct channels. Detection mechanisms (32, 50) associated with each channel detect the time varying light intensity corresponding to each of the two parts of the beam. This information is combined for calculating a precise measure of the retardance induced by the sample, as well as the sample's fast axis orientation.

Abstract translation: 一种用于精确测量光学材料（26）的低级双折射性质（延迟和快轴取向）的实用系统和方法。 该系统允许在样品区域上进行多次测量，以检测和图形地显示横跨样品区域的双折射性质的变化（100）。 在优选实施例中，该系统包含用于调制偏振光的光弹性调制器（24），然后将其引导通过样品（26）。 从样品传播的光束（“Bi”）被分成两部分，其中一部分（“B1”）的偏振方向与另一光束部分（“B2”）的偏振方向不同。 然后将这些单独的光束部分作为不同的通道进行处理。 与每个通道相关联的检测机构（32,50）检测对应于梁的两个部分中的每一个的时变光强度。 该信息被组合用于计算样品诱导的延迟的精确测量以及样品的快轴取向。

公开(公告)号：US20020176080A1

公开(公告)日：2002-11-28

申请号：US09983186

申请日：2001-10-23

Applicant: FUJITSU LIMITED

Inventor： Hiroyuki Iwata

IPC: G01J004/00

CPC classification number: H04B10/2572 ,  G01J4/04 ,  G02F1/0136 ,  G02F1/09 ,  H04J14/02 ,  H04J14/06

Abstract: In a polarization compensator for converting a polarization state of a lightwave, and a wavelength division multiplexing apparatus using same, a controller of the polarization compensator controls a rotator to orient a polarization plane of an input lightwave to a polarization plane of a reference polarizer. Also, the controller receives an output lightwave from the polarization compensator, of the above-mentioned present invention, which inputs the input lightwave through the rotator and a first null wave plate, through a second null wave plate and a polarizer having the polarization plane set in the reference direction, and the input lightwave is compensated to a linear polarization having the polarization plane of the reference direction based on a received polarization signal. Furthermore, a plurality of polarization compensators and a coupler are connected directly or with a connector so as to prevent the polarization planes of the lightwaves whose wavelengths are adjoining from coinciding with each other, and preferably the polarization compensators and the coupler are connected directly or with connectors so that the polarization planes are orthogonal.

Abstract translation: 在用于转换光波的偏振态的偏振补偿器和使用它的波分复用装置中，偏振补偿器的控制器控制旋转器将输入光波的偏振面定向到参考偏振器的偏振面。 此外，控制器接收来自偏振补偿器的输出光波，上述本发明通过旋转器和第一1/4波片通过第二1/4波片和具有偏振面集合的偏振器输入输入光波 并且基于所接收的偏振信号将输入光波补偿为具有基准方向的偏振面的线偏振。 此外，多个极化补偿器和耦合器直接或与连接器连接，以防止其波长相邻的光波的偏振面彼此重合，并且优选地，极化补偿器和耦合器直接连接或与 连接器，使得偏振面正交。

公开(公告)号：US20020171829A1

公开(公告)日：2002-11-21

申请号：US09858597

申请日：2001-05-17

Applicant: ADVANTEST Corporation

Inventor： Tomoyu Yamashita

IPC: G01J004/00

CPC classification number: G01M11/333 ,  G01J4/04 ,  G01M11/335 ,  G01M11/336

Abstract: An apparatus is provided which is capable of measuring the polarization mode dispersion of an objective without changing a wavelength of an angle frequency of light incident upon the objective. The apparatus comprises a variable wavelength light source 10 generating an incident light, a light modulator 54 modulating the incident light on the basis of the frequency f of the signal for modulation oscillated from an oscillator 52 and outputting the modulated light, a polarization controller 20 polarizing the modulated light, changing a polarizing condition so that an modulated light polarizing is passed through the axes having a minimum and a maximum propagation group velocity of the light in DUT 30, and outputting the polarized light for incidence, a phase comparator 64 measuring the phase difference null between a phase nulls of the transmitted light which the polarized light for incidence is transmitted through DUT 30 and a phase nullr of the signal for modulation and a polarization mode dispersion measuring unit 66 calculating the polarization mode dispersion of DUT 30 from the phase difference null. The apparatus is capable of measuring of the polarization mode dispersion without changing the wavelength of the incident light and if the wavelength of the incident light is changed, it is capable of measuring the wavelength dependent characteristic of the polarization mode dispersion.

Abstract translation: 提供一种能够在不改变入射到物镜上的光的角度频率的波长的情况下测量物镜的偏振模色散的装置。 该装置包括产生入射光的可变波长光源10，基于从振荡器52振荡的调制信号的频率f调制入射光并输出调制光的光调制器54，偏振控制器20偏振 调制光，改变偏振条件，使得调制的光偏振通过DUT 30中的光的最小和最大传播群速度的轴，并输出用于入射的偏振光;相位比较器64，测量相位 用于入射的偏振光通过DUT 30传输的透射光的相位相位与用于调制的信号的相位phier和偏振模色散测量单元66之间的差phi，该偏振模色散测量单元66从相位差计算DUT 30的偏振模色散 phi 该装置能够在不改变入射光的波长的情况下测量偏振模色散，并且如果入射光的波长改变，则能够测量偏振模色散的波长依赖特性。

公开(公告)号：US20020159063A1

公开(公告)日：2002-10-31

申请号：US10128379

申请日：2002-04-23

Inventor： Toyoki Kanzaki

IPC: G01J004/00

CPC classification number: G01N21/211

Abstract: A spectroscopic ellipsometer is provided for measuring a small target surface with a high degree of precision. An irradiating optical system provides a polarized light to the surface of the target, while a detecting optical system is provided with a higher F-number for collecting the reflected light from the target surface to introduce it into the spectrometer for measuring a thickness of a thin film on the surface of the sample in accordance with the polarization state of change of the detected light rays.

Abstract translation: 提供了一种用于以高精度测量小目标表面的分光椭偏仪。 照射光学系统向目标表面提供偏振光，同时检测光学系统具有较高的F数，用于收集来自目标表面的反射光，将其引入光谱仪中，以测量薄的厚度 根据检测到的光线的偏振状态改变样品表面的膜。

公开(公告)号：US20020113966A1

公开(公告)日：2002-08-22

申请号：US09741663

申请日：2000-12-19

Inventor： Andrei V. Shchegrov ,  Anatoly Fabrikant ,  Mehrdad Nikoonahad

IPC: G01J004/00

CPC classification number: H01L22/20 ,  G01J3/447 ,  G01J4/04 ,  G01N21/211

Abstract: A gallery of seed profiles is constructed and the initial parameter values associated with the profiles are selected using manufacturing process knowledge of semiconductor devices. Manufacturing process knowledge may also be used to select the best seed profile and the best set of initial parameter values as the starting point of an optimization process whereby data associated with parameter values of the profile predicted by a model is compared to measured data in order to arrive at values of the parameters. Film layers over or under the periodic structure may also be taken into account. Different radiation parameters such as the reflectivities Rs, Rp and ellipsometric parameters may be used in measuring the diffracting structures and the associated films. Some of the radiation parameters may be more sensitive to a change in the parameter value of the profile or of the films then other radiation parameters. One or more radiation parameters that are more sensitive to such changes may be selected in the above-described optimization process to arrive at a more accurate measurement. The above-described techniques may be supplied to a track/stepper and etcher to control the lithographic and etching processes in order to compensate for any errors in the profile parameters.

Abstract translation: 构建种子轮廓的画廊，并且使用半导体器件的制造工艺知识来选择与轮廓相关联的初始参数值。 也可以使用制造过程知识来选择最佳种子轮廓和最佳初始参数值集合作为优化过程的起始点，由此将与模型预测的轮廓的参数值相关联的数据与测量数据进行比较，以便 达到参数的值。 也可以考虑在周期性结构之上或之下的膜层。 可以使用诸如反射率Rs，Rp和椭偏参数的不同辐射参数来测量衍射结构和相关膜。 一些辐射参数可能对轮廓或膜的参数值的变化对其他辐射参数更敏感。 可以在上述优化过程中选择对这种变化更敏感的一个或多个辐射参数，以获得更准确的测量。 可以将上述技术提供给轨道/步进器和蚀刻器以控制光刻和蚀刻工艺，以便补偿轮廓参数中的任何误差。

公开(公告)号：US20020093654A1

公开(公告)日：2002-07-18

申请号：US10046620

申请日：2001-11-12

Inventor： Robert A. Lieberman ,  William Rassman ,  Lothar U. Kempen ,  David Ralin

IPC: G01J004/00

CPC classification number: G01N21/253 ,  G01N21/21 ,  G01N21/552

Abstract: Apparatus for acquiring an image of a specimen comprising a cassette having an optical portion holding a specimen array on a TIR surface and being removably matable to a processing portion having a polarized light beam source and a processing polarization-sensitive portion to image the spatially distributed charges in polarization of the specimen array. In one form the array optical portion comprises a transparent slide having a bottom surface with first and second gratings located to direct polarized light to the TIR surface and to direct light reflected by that (TIR) surface to an imager, respectively. The apparatus may include a flow cell integral with the optical portion as well as means for selecting the direction and wavelength of the polarized light.

Abstract translation: 用于获取样本的图像的装置，包括具有在TIR表面上保持样本阵列的光学部分的盒，并且可移除地配合到具有偏振光束源和处理偏振敏感部分的处理部分，以对空间分布的电荷进行成像 在样本阵列的极化。 在一种形式中，阵列光学部分包括具有底表面的透明滑块，其中第一和第二光栅被定位成将偏振光引导到TIR表面并且将由该TIR表面反射的光分别引导到成像器。 该装置可以包括与光学部分成一体的流动池以及用于选择偏振光的方向和波长的装置。

公开(公告)号：US20020089677A1

公开(公告)日：2002-07-11

申请号：US10033950

申请日：2001-12-28

Inventor： Jurgen Ziegler ,  Reinhold Waller ,  Lothar Pfitzner ,  Claus Schneider ,  Heiner Ryssel ,  Volker Tegeder

IPC: G01B011/28 ,  G01J005/00 ,  G01K011/00 ,  G01J004/00

CPC classification number: B24B37/013 ,  C23C14/547 ,  C23C16/4407 ,  C23C16/52 ,  G01B11/0616 ,  H01J37/32935 ,  H01L22/26

Abstract: The apparatus allows monitoring layer depositions in a process chamber. The apparatus has a light source, a sensor element, and at least one light detector. The sensor element is suitably configured in order to influence the intensity of the light beam measured by the detector by the thickness of the layer growing on the sensor element. The novel monitoring method for measuring the transmitted light intensity utilizes the apparatus. The sensor element has a continuous opening through which the intensity of the light is observed as a function of the opening grown over by the thickness of the growing layer.

Abstract translation: 该装置允许在处理室中监测层沉积。 该装置具有光源，传感器元件和至少一个光检测器。 传感器元件被适当地构造以便通过由传感器元件上生长的层的厚度来影响由检测器测量的光束的强度。 用于测量透射光强度的新型监测方法利用该装置。 传感器元件具有连续的开口，作为根据生长层的厚度生长的开口的函数，观察到光的强度。