Method of creating MEMS device cavities by a non-etching process
    301.
    发明申请
    Method of creating MEMS device cavities by a non-etching process 有权
    通过非蚀刻工艺制造MEMS器件腔的方法

    公开(公告)号:US20070155051A1

    公开(公告)日:2007-07-05

    申请号:US11321134

    申请日:2005-12-29

    Abstract: MEMS devices (such as interferometric modulators) may be fabricated using a sacrificial layer that contains a heat vaporizable polymer to form a gap between a moveable layer and a substrate. One embodiment provides a method of making a MEMS device that includes depositing a polymer layer over a substrate, forming an electrically conductive layer over the polymer layer, and vaporizing at least a portion of the polymer layer to form a cavity between the substrate and the electrically conductive layer. Another embodiment provides a method for making an interferometric modulator that includes providing a substrate, depositing a first electrically conductive material over at least a portion of the substrate, depositing a sacrificial material over at least a portion of the first electrically conductive material, depositing an insulator over the substrate and adjacent to the sacrificial material to form a support structure, and depositing a second electrically conductive material over at least a portion of the sacrificial material, the sacrificial material being removable by heat-vaporization to thereby form a cavity between the first electrically conductive layer and the second electrically conductive layer.

    Abstract translation: 可以使用包含热可汽化聚合物以在可移动层和基底之间形成间隙的牺牲层来制造MEMS器件(例如干涉式调制器)。 一个实施例提供了一种制造MEMS器件的方法,该MEMS器件包括在衬底上沉积聚合物层,在聚合物层上形成导电层,并蒸发聚合物层的至少一部分以在衬底和电 导电层。 另一个实施例提供了制造干涉式调制器的方法,该方法包括提供衬底,在衬底的至少一部分上沉积第一导电材料,在第一导电材料的至少一部分上沉积牺牲材料,沉积绝缘体 在所述衬底上并且邻近所述牺牲材料以形成支撑结构,以及在所述牺牲材料的至少一部分上沉积第二导电材料,所述牺牲材料可通过热蒸发而被去除,从而在所述第一电 导电层和第二导电层。

    Method of fabricating a polymer-based capacitive ultrasonic transducer
    302.
    发明申请
    Method of fabricating a polymer-based capacitive ultrasonic transducer 有权
    制造基于聚合物的电容式超声换能器的方法

    公开(公告)号:US20070013266A1

    公开(公告)日:2007-01-18

    申请号:US11212611

    申请日:2005-08-29

    Abstract: A method of fabricating a polymer-based capacitive ultrasonic transducer, which comprises the steps of: (a) providing a substrate; (b) forming a first conductor on the substrate; (c) coating a sacrificial layer on the substrate while covering the first conductor by the same; (d) etching the sacrificial layer for forming an island while maintaining the island to contact with the first conductor; (e) coating a first polymer-based material on the substrate while covering the island by the same; (f) forming a second conductor on the first polymer-based material; (g) forming a via hole on the first polymer-based material while enabling the via hole to be channeled to the island; and (h) utilizing the via hole to etch and remove the island for forming a cavity.

    Abstract translation: 一种制造基于聚合物的电容式超声换能器的方法,包括以下步骤:(a)提供基底; (b)在所述基板上形成第一导体; (c)在衬底上涂覆牺牲层,同时覆盖第一导体; (d)蚀刻用于形成岛的牺牲层,同时保持岛与第一导体接触; (e)在衬底上涂覆第一聚合物基材料同时覆盖该岛; (f)在第一聚合物基材料上形成第二导体; (g)在第一聚合物基材料上形成通孔,同时使通孔能够引导到岛上; 和(h)利用通孔蚀刻并去除用于形成空腔的岛。

    Method for manufacturing MEMS structures
    304.
    发明申请
    Method for manufacturing MEMS structures 有权
    制造MEMS结构的方法

    公开(公告)号:US20050170544A1

    公开(公告)日:2005-08-04

    申请号:US10769346

    申请日:2004-01-30

    Abstract: A method for forming a free standing micro-structural member including providing a substrate; blanket depositing a first sacrificial resist layer over the substrate; exposing and developing the first sacrificial resist layer to form a first resist portion; subjecting the first resist portion to at least a hard bake process to form the first resist portion having a predetermined first smaller volume compared to a desired final resist portion volume; blanket depositing at least a second sacrificial resist layer followed by exposure, development and the at least a hard bake process to form the final resist portion volume; and, depositing at least one structural material layer over the final resist portion.

    Abstract translation: 一种形成独立式微结构构件的方法,包括提供基底; 在衬底上铺设第一牺牲抗蚀剂层; 曝光和显影第一牺牲抗蚀剂层以形成第一抗蚀剂部分; 使所述第一抗蚀剂部分至少进行硬烘烤处理,以形成具有预定的第一较小体积的第一抗蚀剂部分,与期望的最终抗蚀剂部分体积相比; 毯毯沉积至少第二牺牲抗蚀剂层,随后曝光,显影和至少硬烘烤工艺以形成最终的抗蚀剂部分体积; 并且在最终抗蚀剂部分上沉积至少一个结构材料层。

    Method for integrating micro- and nanoparticles into MEMS and apparatus including the same
    309.
    发明申请
    Method for integrating micro- and nanoparticles into MEMS and apparatus including the same 失效
    将微米和纳米颗粒整合到MEMS中的方法和包括其的设备

    公开(公告)号:US20030228411A1

    公开(公告)日:2003-12-11

    申请号:US10391122

    申请日:2003-03-18

    Abstract: MEMs devices are integrally fabricated with included micro or nanoparticles by providing a mixture of a sacrificial material and a multiplicity of particles, disposing the mixture onto a substrate, fabricating a MEMs structure on the substrate including at least part of the mixture, so that at least some of the mixture is enclosed in the MEMs structure, removing the sacrificial material, and leaving at least some of the multiplicity of particles substantially free and enclosed in the MEMs structure. The step of fabricating a MEMs structure is quite general and is contemplated as including one or a multiplicity of additional steps for creating some type of structure in which the particles, which may be microbeads or nanobeads, are included. A wide variety of useful applications for MEMs integrated with micro or nanoparticles are available.

    Abstract translation: 通过提供牺牲材料和多个颗粒的混合物将MEM装置与包含的微型或纳米颗粒整体制造,将混合物设置在衬底上,在包括至少部分混合物的衬底上制造MEM结构,使得至少 一些混合物被包封在MEMs结构中,去除牺牲材料,并且使至少一些多个颗粒基本上自由并且封闭在MEM结构中。 制造MEMs结构的步骤是相当普遍的,并且被设想为包括用于产生某些类型的结构的一个或多个附加步骤,其中可以包括可以是微珠或纳米珠的颗粒。 可以使用与微型或纳米颗粒集成的MEM的各种有用的应用。

    Method of manufacturing a microstructure

    公开(公告)号:US06583920B2

    公开(公告)日:2003-06-24

    申请号:US09995956

    申请日:2001-11-29

    CPC classification number: B81C1/00142 B81B2201/042 B81C2201/0108

    Abstract: A method of manufacturing a micromirror actuator includes forming a trench on a substrate by etching, laminating a film-type organic layer on the substrate to cover but not fill the trench so that the trench is maintained hollow, and depositing and patterning a metal layer on the film-type organic layer and removing the film-type organic layer. According to the method of manufacturing a micromirror actuator, a micromirror can be easily planarized by laminating the film-type organic layer on the substrate including the trench, which reduces the cost of manufacturing the micromirror actuator and increases a reflectivity of the micromirror actuator by increasing the flatness level of the micromirror so as to enhance an optical transmission efficiency.

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