公开(公告)号：US20130340929A1

公开(公告)日：2013-12-26

申请号：US13726684

申请日：2012-12-26

Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALS

Inventor： Eung-Sug LEE ,  Joo Yun Jung ,  Jun Hyuk Choi ,  Jae Won Hahn

IPC: B32B37/26 ,  G03F7/20

CPC classification number: B32B37/26 ,  B81C99/009 ,  B81C2201/0152 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F7/2004

Abstract: There is provided a method of manufacturing a stamp for a plasmonic nanolithography apparatus. The method includes forming metal patterns on a substrate, coating a hydrophobic thin film on external surfaces of the metal patterns to hydrophobic processing the external surfaces of the metal patterns, selectively hydrophilic processing only the external surfaces of the metal patterns, laminating a buffer layer on the substrate and the metal patterns, and transcribing the metal patterns and the buffer layer from the substrate to a base formed of light transmission material to be combined with the base.

Abstract translation: 提供了一种制造等离子体激光纳米光刻设备的印模的方法。 该方法包括在基板上形成金属图案，在金属图案的外表面上涂覆疏水性薄膜以对金属图案的外表面进行疏水处理，仅选择亲水处理金属图案的外表面，将缓冲层层压在 基板和金属图案，并且将金属图案和缓冲层从基板转印到由光透射材料形成的基底以与基底结合。

公开(公告)号：EP2217694A1

公开(公告)日：2010-08-18

申请号：EP08848829.1

申请日：2008-11-12

Applicant: The Regents of the University of California

Inventor： KHINE, Michelle ,  CHEN, Chi-shuo ,  GRIMES, Anthony ,  BRESLAUER, David Nate ,  LEE, Luke ,  DUNLAP, Michael ,  GOPINATHAN, Ajay ,  GHOSH, Sayantani

IPC: C12M1/34

CPC classification number: B01L3/502707 ,  B01F5/0057 ,  B01F5/0646 ,  B01F5/0647 ,  B01F13/0059 ,  B01F2215/0037 ,  B01L2200/12 ,  B01L2300/0816 ,  B01L2300/0867 ,  B01L2300/0887 ,  B81B1/002 ,  B81B2201/051 ,  B81B2201/058 ,  B81B2203/0338 ,  B81C1/00071 ,  B81C2201/0152 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/02269 ,  H01L21/02271

Abstract: A method is provided to prepare one or more microfluidic channels on a receptive material by applying an image-forming material to a heat sensitive thermoplastic receptive material in a designed pattern and heating the material under conditions that reduce the size of the thermoplastic receptive material by at least about 60%. In an alternative aspect, the microfluidic channels on receptive material are prepared by etching a designed pattern into a heat sensitive thermoplastic material support and then heating the material under conditions that reduce the size of the thermoplastic receptive material by at least about 60%.

公开(公告)号：EP2217694A4

公开(公告)日：2011-08-31

申请号：EP08848829

申请日：2008-11-12

Applicant: UNIV CALIFORNIA

Inventor： KHINE MICHELLE ,  CHEN CHI-SHUO ,  GRIMES ANTHONY ,  BRESLAUER DAVID NATE ,  LEE LUKE ,  DUNLAP MICHAEL ,  GOPINATHAN AJAY ,  GHOSH SAYANTANI

IPC: C12M1/34

CPC classification number: B01L3/502707 ,  B01F5/0057 ,  B01F5/0646 ,  B01F5/0647 ,  B01F13/0059 ,  B01F2215/0037 ,  B01L2200/12 ,  B01L2300/0816 ,  B01L2300/0867 ,  B01L2300/0887 ,  B81B1/002 ,  B81B2201/051 ,  B81B2201/058 ,  B81B2203/0338 ,  B81C1/00071 ,  B81C2201/0152 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/02269 ,  H01L21/02271

Abstract: A method is provided to prepare one or more microfluidic channels on a receptive material by applying an image-forming material to a heat sensitive thermoplastic receptive material in a designed pattern and heating the material under conditions that reduce the size of the thermoplastic receptive material by at least about 60%. In an alternative aspect, the microfluidic channels on receptive material are prepared by etching a designed pattern into a heat sensitive thermoplastic material support and then heating the material under conditions that reduce the size of the thermoplastic receptive material by at least about 60%.

Abstract translation: 提供了一种方法，以在接受材料制备一种或多种微流体通道通过以设计的图案施加成像材料到热敏热塑性接受材料和下条件做了通过在降低热塑性接受材料的尺寸加热材料 至少约60％。 在可选的方面，在接收材料的微流体通道，通过蚀刻所设计的图案划分为热敏感的热塑性材料载体上，然后加热该材料的条件下做了至少约60％降低热塑性接受材料的尺寸制备。

公开(公告)号：US20130078796A1

公开(公告)日：2013-03-28

申请号：US13625400

申请日：2012-09-24

Applicant: AGENCY FOR SCIENCE, TECHNOLOGY AND R

Inventor： Ramakrishnan GANESAN ,  Jarrett DUMOND ,  M.S.M. SAIFULLAH ,  Su Hui LIM ,  Hazrat HUSSAIN ,  Hong Yee LOW

IPC: H01L21/283

CPC classification number: H01L21/283 ,  B81C1/0046 ,  B81C2201/0152 ,  B82Y10/00 ,  B82Y40/00 ,  C23C18/04 ,  C23C18/06 ,  C23C18/1216 ,  G03F7/0002 ,  G03F7/0043 ,  G03F7/027 ,  H01L29/0676

Abstract: There is provided a process for making a patterned metal oxide structure comprising the step of heating an imprint structure comprising a polymerized organometallic compound to remove organic material and thereby form the patterned metal oxide structure, wherein the imprint structure is formed by polymerizing a resist mixture comprising at least one olefinic polymerizable compound and a polymerizable organometallic compound having, e.g., at least one carboxylate of Formula 1: wherein n is 1-12; and each R is independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, cycloakyl, cycloakenyl, aryl, and aralkyl.

Abstract translation: 提供了一种用于制造图案化金属氧化物结构的方法，其包括加热包含聚合的有机金属化合物的压印结构以除去有机材料并由此形成图案化的金属氧化物结构的步骤，其中通过聚合抗蚀剂混合物形成压印结构，所述抗蚀剂混合物包含 至少一种烯属聚合性化合物和具有例如至少一种式1羧酸酯的可聚合的有机金属化合物：其中n为1-12; 并且每个R独立地选自氢，烷基，烯基，炔基，环烷基，环辛基，芳基和芳烷基。

公开(公告)号：US20050170544A1

公开(公告)日：2005-08-04

申请号：US10769346

申请日：2004-01-30

Applicant: M.C. Chang ,  H.S. Wu ,  Tsang-Mu Lai

Inventor： M.C. Chang ,  H.S. Wu ,  Tsang-Mu Lai

IPC: B81B3/00 ,  H01L21/00

CPC classification number: B81C99/0085 ,  B81C2201/0108 ,  B81C2201/0133 ,  B81C2201/0152

Abstract: A method for forming a free standing micro-structural member including providing a substrate; blanket depositing a first sacrificial resist layer over the substrate; exposing and developing the first sacrificial resist layer to form a first resist portion; subjecting the first resist portion to at least a hard bake process to form the first resist portion having a predetermined first smaller volume compared to a desired final resist portion volume; blanket depositing at least a second sacrificial resist layer followed by exposure, development and the at least a hard bake process to form the final resist portion volume; and, depositing at least one structural material layer over the final resist portion.

Abstract translation: 一种形成独立式微结构构件的方法，包括提供基底; 在衬底上铺设第一牺牲抗蚀剂层; 曝光和显影第一牺牲抗蚀剂层以形成第一抗蚀剂部分; 使所述第一抗蚀剂部分至少进行硬烘烤处理，以形成具有预定的第一较小体积的第一抗蚀剂部分，与期望的最终抗蚀剂部分体积相比; 毯毯沉积至少第二牺牲抗蚀剂层，随后曝光，显影和至少硬烘烤工艺以形成最终的抗蚀剂部分体积; 并且在最终抗蚀剂部分上沉积至少一个结构材料层。

公开(公告)号：US20050156357A1

公开(公告)日：2005-07-21

申请号：US11026821

申请日：2004-12-30

Applicant: C. Willson ,  Britain Smith ,  Nicholas Stacey

Inventor： C. Willson ,  Britain Smith ,  Nicholas Stacey

IPC: C08F2/46 ,  G03F7/095 ,  B29C35/08 ,  B29C59/02

CPC classification number: B29C43/003 ,  B29C2043/025 ,  B81C99/0085 ,  B81C2201/0152 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0955

Abstract: The present invention includes a method for forming a pattern on a substrate with a composition by forming a cross-linked polymer from the composition upon exposing the same to radiation. The method includes depositing the composition to function as a planarization layer. Thereafter, a layer of polymerizable material into which a pattern is to be recorded is deposited.

Abstract translation: 本发明包括通过在将组合物暴露于辐射时从组合物形成交联聚合物而在组合物上形成图案的方法。 该方法包括沉积作为平坦化层的组合物。 此后，沉积要记录图案的可聚合材料层。

公开(公告)号：WO2013191341A1

公开(公告)日：2013-12-27

申请号：PCT/KR2012/011028

申请日：2012-12-17

Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALS

Inventor： LEE, Eung-Sug ,  JUNG, Joo Yun ,  CHOI, Jun Hyuk ,  HAHN, Jae Won

IPC: G03F7/00 ,  H01L21/027 ,  G03F7/021 ,  B29C33/42

CPC classification number: B32B37/26 ,  B81C99/009 ,  B81C2201/0152 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F7/2004

Abstract: There is provided a method of manufacturing a stamp for a plasmonic nanolithography apparatus. The method includes forming metal patterns on a substrate, coating a hydrophobic thin film on external surfaces of the metal patterns to hydrophobic processing the external surfaces of the metal patterns, selectively hydrophilic processing only the external surfaces of the metal patterns, laminating a buffer layer on the substrate and the metal patterns, and transcribing the metal patterns and the buffer layer from the substrate to a base formed of light transmission material to be combined with the base.

Abstract translation: 提供了一种制造等离子体激光纳米光刻设备的印模的方法。 该方法包括在基板上形成金属图案，在金属图案的外表面上涂覆疏水性薄膜以对金属图案的外表面进行疏水处理，仅选择亲水处理金属图案的外表面，将缓冲层层压在 基板和金属图案，以及将金属图案和缓冲层从基板转印到由光透射材料形成的基底上，以与基底结合。

公开(公告)号：US09028639B2

公开(公告)日：2015-05-12

申请号：US13726684

申请日：2012-12-26

Applicant: Korea Institute of Machinery & Materials

Inventor： Eung-Sug Lee ,  Joo Yun Jung ,  Jun Hyuk Choi ,  Jae Won Hahn

IPC: B32B37/26 ,  G03F7/20 ,  B81C99/00 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: B32B37/26 ,  B81C99/009 ,  B81C2201/0152 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F7/2004

Abstract: There is provided a method of manufacturing a stamp for a plasmonic nanolithography apparatus. The method includes forming metal patterns on a substrate, coating a hydrophobic thin film on external surfaces of the metal patterns to hydrophobic processing the external surfaces of the metal patterns, selectively hydrophilic processing only the external surfaces of the metal patterns, laminating a buffer layer on the substrate and the metal patterns, and transcribing the metal patterns and the buffer layer from the substrate to a base formed of light transmission material to be combined with the base.

Abstract translation: 提供了一种制造等离子体激光纳米光刻设备的印模的方法。 该方法包括在基板上形成金属图案，在金属图案的外表面上涂覆疏水性薄膜以对金属图案的外表面进行疏水处理，仅选择亲水处理金属图案的外表面，将缓冲层层压在 基板和金属图案，并且将金属图案和缓冲层从基板转印到由光透射材料形成的基底以与基底结合。

公开(公告)号：US20110122406A1

公开(公告)日：2011-05-26

申请号：US12742598

申请日：2008-11-12

Applicant: Michelle Khine ,  Chi-shuo Chen ,  Anthoy Grimes ,  David Nate Breslauer ,  Luke Lee ,  Michael Dunlap ,  Ajay Gopinathan ,  Sayantani Ghosh

Inventor： Michelle Khine ,  Chi-shuo Chen ,  Anthoy Grimes ,  David Nate Breslauer ,  Luke Lee ,  Michael Dunlap ,  Ajay Gopinathan ,  Sayantani Ghosh

IPC: G01J3/44 ,  B01L3/00 ,  B01F5/00 ,  B01F11/00 ,  C23C16/44 ,  B28B11/08 ,  G01N21/55 ,  G01J3/00

CPC classification number: B01L3/502707 ,  B01F5/0057 ,  B01F5/0646 ,  B01F5/0647 ,  B01F13/0059 ,  B01F2215/0037 ,  B01L2200/12 ,  B01L2300/0816 ,  B01L2300/0867 ,  B01L2300/0887 ,  B81B1/002 ,  B81B2201/051 ,  B81B2201/058 ,  B81B2203/0338 ,  B81C1/00071 ,  B81C2201/0152 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/02269 ,  H01L21/02271

Abstract: A method is provided to prepare one or more microfluidic channels on a receptive material by applying an image-forming material to a heat sensitive thermoplastic receptive material in a designed pattern and heating the material under conditions that reduce the size of the thermoplastic receptive material by at least about 60%. In an alternative aspect, the microfluidic channels on receptive material are prepared by etching a designed pattern into a heat sensitive thermoplastic material support and then heating the material under conditions that reduce the size of the thermoplastic receptive material by at least about 60%.

Abstract translation: 提供了一种通过将图像形成材料以设计图案施加到热敏性热塑性接受材料上并在加热材料的条件下，通过在下述条件下加热该材料的方法来制备接受材料上的一个或多个微流体通道： 至少约60％。 在另一方面，接收材料上的微流体通道是通过将设计的图案蚀刻成热敏热塑性材料载体，然后在将热塑性接受材料的尺寸减小至少约60％的条件下加热材料来制备的。

公开(公告)号：US07067239B2

公开(公告)日：2006-06-27

申请号：US10461825

申请日：2003-06-13

Applicant: Samuel Obi ,  Michael Gale

Inventor： Samuel Obi ,  Michael Gale

IPC: G02B26/00

CPC classification number: B81C1/0019 ,  B81B2201/047 ,  B81B2203/0118 ,  B81C2201/0152 ,  Y10T29/49117

Abstract: A method for fabricating optical MEMS (optical Micro-Electro-Mechanical Systems or Micro-Opto-Electro-Mechanical Systems (MOEMS)) is described. The basic process involves deposition and patterning of a sacrificial spacer layer and a combined molding and photolithography step.The method described allows the fabrication of micromechanical elements incorporating micro-optical structures such as lenses (diffractive or refractive), gratings (for polarizers or resonant filters), waveguides or other micro-optical relief structures fabricated by UV-curing replication processes.

Abstract translation: 描述了制造光学MEMS（光学微机电系统或微机电系统（MOEMS））的方法。 基本过程涉及牺牲间隔层的沉积和图案化以及组合的模制和光刻步骤。 所描述的方法允许制造结合微光学结构的微机械元件，例如透镜（衍射或折射），光栅（用于偏振器或谐振滤光器），波导或通过UV固化复制工艺制造的其它微光学浮雕结构。