Abstract:
A wafer cleaning device of an embodiment comprises a cleaning tub in which a wafer to be cleaned is stored; a chemical liquid circulation pipe for circulating a chemical liquid supplied to the cleaning tub; a chemical liquid supply pipe for supplying the chemical liquid to the cleaning tub; a three-way valve part disposed at the chemical liquid supply pipe; and a cleaning solution pipe connected to the valve part. The valve part selects either the chemical solution discharged to a discharge part of the chemical liquid supply pipe or the cleaning solution moved through the cleaning solution pipe.
Abstract:
PURPOSE: A silicon attachment system for a radiator cover is provided to economically produce the cover, and to obtain a product in which the height and the width of silicon are uniform. CONSTITUTION: A silicon attachment system for a radiator cover comprises the following steps: a cover transfer unit transferring the radiator cover(10); a cover fixing jig(120) fixing multiple radiator covers; a cover unloading/loading unit installed on one side of the transfer unit; an impurity removal unit(140) combust-removing impurities from the cover; a dispensing unit(150) spreading silicon to the combination surface of the cover with a constant thickness; a curing unit(160) attaching the radiator cover while curing the silicon spread on the combination surface; and a cooling unit(170) cooling the cover fixing jig and the radiator cover.
Abstract:
Provided are a blade device equipped with a blade member which can accurately adjust pressing force due to a blade member, and a printing machine and a coating device equipped with the blade device. A blade device 40 according to the present invention has: a blade member 41 contacting with a plate roll 10 to which coating material is to be applied; an upper holder 43 contacting with the blade member from one surface side of the blade member; a lower holder 44 contacting with the blade member from another surface side of the blade member; a tube 42 contacting with the blade member and configured to expand and contract by pressure of fluid; and a tube positioning part 43a which is provided on the upper holder and positions the tube closer to the roller, in a direction in which the blade member extends, than a tip end of the lower holder is. The tube adjusts a pressing force, of the tip end of the blade member, against the roller by being expanded or contracted while being held by the tube positioning part and the blade member.
Abstract:
Ejection and stop of a powder flow are switched while maintaining a once generated steady flow without stopping it. A processing nozzle includes a supply source of a fluid containing a powder, a first channel through which the fluid supplied from the supply source passes, a second channel that supplies the fluid to an ejection port of the nozzle, a third channel that releases the fluid outside the nozzle, and a switch that causes the first channel and the second channel to communicate with each other when supplying the fluid to the ejection port, and causes the first channel and the third channel to communicate with each other when not supplying the fluid to the ejection port.