公开(公告)号：EP2102119A1

公开(公告)日：2009-09-23

申请号：EP07857514.9

申请日：2007-12-13

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： HÜNERMANN, Michael

IPC: C03B19/14 ,  C03B20/00 ,  C03B37/012 ,  C03B37/014

CPC classification number: C03B19/1469 ,  C03B19/1423 ,  C03B19/1492 ,  C03B37/01205 ,  C03B37/01208 ,  C03B37/01211 ,  C03B37/0122 ,  C03B37/0142 ,  C03B37/01466 ,  C03B37/01493 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2203/42 ,  C03B2207/46

Abstract: A known method for producing a hollow cylinder of synthetic quartz glass comprises the steps of: a) providing an inner tube of synthetic quartz glass having an inner bore defined by an inner wall, b) cladding the inner tube (3') with an SIO2 soot layer (4' ), and c) sintering the SiO2 soot layer with formation of the hollow cylinder. Starting therefrom, to indicate a method in which on the one hand the sintering process is completed before the hollow cylinder is further processed together with the core rod, and in which on the other hand a complicated machining of the inner bore of the hollow cylinder of quartz glass is not required, the invention suggests that during sintering the surface temperature of the inner wall of the inner tube should be kept below the softening temperature.

公开(公告)号：EP1843982A2

公开(公告)日：2007-10-17

申请号：EP06713236.5

申请日：2006-02-01

Applicant: Asahi Glass Company, Limited

Inventor： HINO, Keigo, c/o AGC Electronics Co., Ltd.

IPC: C03B19/14 ,  C03C3/06 ,  C03C4/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/04 ,  C03B2201/23 ,  C03C2201/23

Abstract: The invention provides a process for producing a synthetic quartz glass, comprising: (a) depositing fine quartz glass particles synthesized by flame hydrolysis of a glass-forming material, on a substrate, to form a porous quartz glass base; (b) presintering the porous quartz glass base; (c) heat-treating the presintered porous quartz glass base by holding it under vacuum at a temperature in the range of from 1,100°C to below the vitrification temperature for a certain time period; and (d) heating the thus heat-treated porous quartz glass base to a temperature not lower than the vitrification temperature to obtain a synthetic quartz glass. According to the process for synthetic quartz glass production of the invention, a synthetic quartz glass having a reduced OH group amount and a uniform OH group concentration can be obtained. From the synthetic quartz glass, an optical member having excellent optical properties can be obtained.

公开(公告)号：EP1735250A2

公开(公告)日：2006-12-27

申请号：EP05732180.4

申请日：2005-04-05

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： SCHREIBER, Andreas ,  KÜHN, Bodo ,  SCHILLING, Franz-Josef ,  ARNOLD, Erich ,  WITZKE, Hans-Dieter

IPC: C03C3/06 ,  C03C4/00 ,  H01J61/30

CPC classification number: C03B19/01 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06

Abstract: A conventional method for producing a quartz glass component for a UV radiation source includes melting SiO2 containing grains. The aim of the invention is to provide an improved and inexpensive method which allows for the production of a quartz glass component that is characterized by high radiation resistance. For this purpose, synthetically produced quartz crystals are smelted to give an initial product that consists of quartz glass, and contains hydroxyl groups in a number greater than the number of SiH groups. In order to remove the SiH groups, the initial product is subjected to a tempering step at a temperature of at least 850 °C, thereby obtaining the quartz glass component. The inventive quartz glass component is characterized in that the quartz glass is smelted from synthetically produced quartz crystals and has an SiH group content of less than 5 x 1017 molecules/cm3. The invention also relates to a method for testing the aptitude of a quartz glass component for the use thereof with a UV radiation source.

公开(公告)号：EP1101741B1

公开(公告)日：2005-07-13

申请号：EP00123504.3

申请日：2000-10-27

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Uebbing, Bruno, Dr. ,  Vydra, Jan, Dr.

IPC: C03C3/06 ,  C03B19/14 ,  C03C4/00

CPC classification number: C03C4/0085 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/075 ,  C03C3/06 ,  C03C2201/06 ,  C03C2201/08 ,  C03C2201/23 ,  C03C2203/40 ,  Y10S65/08 ,  Y10S65/16 ,  Y10S501/905

公开(公告)号：EP1493719A1

公开(公告)日：2005-01-05

申请号：EP03715446.5

申请日：2003-03-26

Applicant: Japan Science and Technology Agency ,  Asahi Glass Co., Ltd.

Inventor： HOSONO, Hideo ,  KAJIHARA, Kouichi ,  HIRANO, Masahiro ,  IKUTA, Yoshiaki ,  KIKUKAWA, Shinya

IPC: C03C3/06 ,  C03B20/00

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/21 ,  C03C3/06 ,  C03C23/0025 ,  C03C2201/21 ,  C03C2203/40 ,  C03C2203/50 ,  G02B1/02 ,  Y02P40/57

Abstract: Disclosed is a synthetic silica glass for use with light having a wavelength of 150 to 200 nm, which has an OH group at a concentration of less than 1 ppm, an oxygen-excess type defect at a concentration of 1 x 10 16 defects/cm 3 or less, a hydrogen molecule at a concentration of less than 1 x 10 17 molecules/cm 3 , and a non-bridging oxygen radical at a concentration of 1 × 10 16 radicals/cm 3 or less in the state after the synthetic silica glass is irradiated with light of a xenon excimer lamp having an energy density of 10 mW/cm 2 and 3 kJ/cm 2 or with light of an F 2 laser by 10 7 pulses at an energy density of 10 mJ/cm 2 /pulse. The synthetic silica glass can exhibit excellent resistance to ultraviolet light with a wavelength of 150 to 190 nm when incorporated in a device using ultraviolet light with a wavelength of 150 to 190 nm as a light source.

公开(公告)号：EP1164431B1

公开(公告)日：2004-11-24

申请号：EP00961001.5

申请日：2000-09-13

Applicant: ASAHI GLASS COMPANY LTD.

Inventor： IKUTA, Yoshiaki, Asahi Glass Company, Limited ,  KIKUGAWA, Shinya, Asahi Glass Company, Limited ,  MISHIRO, Hitoshi, Mito Asahi Fine Glass Co., Ltd. ,  ARISHIMA, Hiroshi, Asahi Glass Company, Limited ,  OKADA, Kaname, Asahi Glass Company, Limited ,  MATSUMOTO, Katsuhiro, Asahi Glass Company, Limited

IPC: G03F1/14 ,  B24B7/24

CPC classification number: G03F1/62 ,  C03B33/082 ,  C03B2201/04

Abstract: A pellicle, characterized as having a pellicle sheet comprising a synthetic quartz glass which has an OH group concentration of 100 ppm or less and is substantially free from the presence of the defect of a reduced form. In particular, it is preferred that the synthetic quartz glass has an OH group concentration of 10 ppm or less and an internal transmittance at a wavelength of 157 nm of 80 %/cm or more.

Abstract translation: 1。一种薄膜，其特征在于，具有由OH基浓度为100ppm以下的合成石英玻璃构成的薄膜片，其基本上不存在还原型缺陷。 特别优选合成石英玻璃的OH基浓度为10ppm以下，波长157nm下的内部透射率为80％/ cm以上。

公开(公告)号：EP1413559A1

公开(公告)日：2004-04-28

申请号：EP02741357.4

申请日：2002-06-27

Applicant: M. Watanabe & Co., Ltd. ,  ASAHI DENKA KOGYO KABUSHIKI KAISHA

Inventor： KUSUHARA, Masakio M. WATANABE & CO., LTD. ,  WATANABE, Hiroyuki M. WATANABE & CO., LTD. ,  UEHARA, Hirofumi M. WATANABE & CO., LTD. ,  SANPEI, Keiko M. WATANABE & CO., LTD. ,  KURITA, Naoyasu ASAHI DENKA KOGYO KABUSHIKI KAISHA ,  TADA, Shuichi ASAHI DENKA KOGYO KABUSHIKI KAISHA ,  OMI, Jinichi ASAHI DENKA KOGYO KABUSHIKI KAISHA ,  TAKAHASHI, Makio ASAHI DENKA KOGYO KABUSHIKI K. ,  MORITA, Hiroshi ASAHI DENKA KOGYO KABUSHIKI KAISHA

IPC: C03C3/06

CPC classification number: C03B19/1065 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/02

Abstract: High purity synthetic quartz glass particles are derived from alkali metal silicate and have a total amount of metal impurities content of at least 1 µg/g and, in particular, have oxygen-deficient defects. The high-purity synthetic quartz glass particles having high viscosity similar to natural quartz and high-purity similar to known synthetic quartz can be provided at a low cost.

Abstract translation: 高纯度合成石英玻璃颗粒来自总金属杂质量为至多1微克/克的碱金属硅酸盐。

公开(公告)号：EP1319635A3

公开(公告)日：2003-12-17

申请号：EP02090401.7

申请日：2002-12-11

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Oyamada, HIroshi, Shin-Etsu Chemical Co., Ltd. ,  Otosaka, Tesuya, Shin-Etsu Chemical Co., Ltd.

IPC: C03B37/014

CPC classification number: C03C13/00 ,  C03B37/01446 ,  C03B2201/04 ,  C03B2201/075

Abstract: A method for manufacturing a preform (200), which is a base material of an optical fiber, comprising forming porous-glass-base-material (12) by accumulating glass particles; and dehydrating the porous-glass-base-material (12) by heating the porous-glass-base-material (12) in an atmosphere of gas that contains chlorine; characterized in that the method further comprises: heating the porous-glass-base-material (12) dehydrated by the dehydrating with a first heating temperature in an atmosphere of a first inert gas; and vitrifying the porous-glass-base-material (12) by heating the porous-glass-base-material with a second heating temperature in an atmosphere of second inert gas. The glass optical fiber preform obtainable by the method is also claimed.

Abstract translation: 一种制造作为光纤基材的预成型体（200）的制造方法，其特征在于，包括：通过聚集玻璃粒子形成多孔玻璃基材（12） 以及通过在含氯的气体气氛中加热多孔玻璃基材（12）使多孔玻璃基材（12）脱水; 其特征在于，所述方法还包括：在第一惰性气体的气氛中，以第一加热温度加热脱水脱水的多孔玻璃基材料（12） 并且在第二惰性气体气氛中以第二加热温度加热多孔玻璃基材料，使多孔玻璃基材（12）玻璃化。 还要求保护通过该方法可获得的玻璃光纤预制件。

公开(公告)号：EP0944109B1

公开(公告)日：2003-09-10

申请号：EP99105347.1

申请日：1999-03-16

Applicant: Matsushita Electric Industrial Co., Ltd.

Inventor： Horiuchi, Makoto ,  Kai, Makoto ,  Takeda, Mamoru

IPC: H01J61/12 ,  H01J61/30 ,  H01J9/24 ,  H01J9/38

CPC classification number: H01J61/302 ,  C03B23/0493 ,  C03B23/07 ,  C03B2201/04 ,  H01J9/247

公开(公告)号：EP1314701A1

公开(公告)日：2003-05-28

申请号：EP02026393.5

申请日：2002-11-26

Applicant: Japan Super Quartz Corporation

Inventor： Fukui, Masanori, c/o Japan Super Quartz Corp. ,  Satoh, Takahiro, c/o Japan Super Quartz Corp.

IPC: C03B19/10 ,  C03C1/02 ,  C30B35/00 ,  C30B15/10 ,  C01B33/18

CPC classification number: C30B35/002 ,  C03B19/1065 ,  C03B2201/04 ,  C03B2201/20 ,  C03C1/026 ,  C30B15/10 ,  Y10T117/10 ,  Y10T428/13 ,  Y10T428/131 ,  Y10T428/1317

Abstract: A modification process of a synthetic silica powder and a crucible using said modified silica powder are provided, wherein said synthetic silica powder is kept in helium atmosphere at least in the cooling process, when the amorphous synthetic silica powder produced by the sol-gel method is heat-treated in a vacuum furnace at a temperature more than the degas temperature and less than the sintering temperature. It is preferable that the synthetic silica powder is heated in the helium atmosphere to from more than 700°C to less than 1400°C, and then cooled in the helium atmosphere to less than 400°C.

Abstract translation: 提供合成二氧化硅粉末和使用所述改性二氧化硅粉末的坩埚的改性方法，其中当通过溶胶 - 凝胶法制备的无定形合成二氧化硅粉末是至少在冷却过程中时，所述合成二氧化硅粉末保持在氦气氛中 在真空炉中在脱气温度大于烧结温度的温度下进行热处理。 优选将合成二氧化硅粉末在氦气气氛中加热至700℃以上至小于1400℃，然后在氦气气氛中冷却至低于400℃。