Abstract:
Embodiments of the present disclosure are related to manufacturing system-in-packages at wafer-level. In particular, various embodiments are directed to adhering a first wafer to a second wafer and adhering solder balls to contact pads of the first wafer. In one embodiment, a first wafer having first and second surfaces is provided. The first wafer includes bond pads located on the first surface that are coupled to a respective semiconductor device located in the first wafer. A second wafer having an electrical component located therein is provided. A conductive adhesive is provided on at least one of the first wafer and the second wafer. Conductive balls are provided on the bond pads on the first surface of the first wafer. The conductive balls and the conductive adhesive are heated to cause the conductive balls to adhere to the bond pad and the conductive adhesive to adhere the first wafer to the second wafer.
Abstract:
An electronic device may include a bottom interconnect layer and an integrated circuit (IC) carried by the bottom interconnect layer. The electronic device may further include an encapsulation material on the bottom interconnect layer and laterally surrounding the IC. The electronic device may further include electrically conductive pillars on the bottom interconnect layer extending through the encapsulation material. At least one electrically conductive pillar and adjacent portions of encapsulation material may have a reduced height with respect to adjacent portions of the IC and the encapsulation material and may define at least one contact recess. The at least one contact recess may be spaced inwardly from a periphery of the encapsulation material.
Abstract:
A surface mount package of a semiconductor device, has: an encapsulation, housing at least one die including semiconductor material; and electrical contact leads, protruding from the encapsulation to be electrically coupled to contact pads of a circuit board; the encapsulation has a main face designed to face a top surface of the circuit board, which is provided with coupling features designed for mechanical coupling to the circuit board to increase a resonant frequency of the mounted package. The coupling features envisage at least a first coupling recess defined within the encapsulation starting from the main face, designed to be engaged by a corresponding coupling element fixed to the circuit board, thereby restricting movements of the mounted package.
Abstract:
An integrated circuit is formed having an array of memory cells located in the dielectric stack above a semiconductor substrate. Each memory cell has two adjustable resistors and two heating elements. A dielectric material separates the heating elements from the adjustable resistors. One heating element alters the resistance of one of the resistors by applying heat thereto to write data to the memory cell. The other heating element alters the resistance of the other resistor by applying heat thereto to erase data from the memory cell.
Abstract:
An integrated circuit is formed having an array of memory cells located in the dielectric stack above a semiconductor substrate. Each memory cell has two adjustable resistors and two heating elements. A dielectric material separates the heating elements from the adjustable resistors. One heating element alters the resistance of one of the resistors by applying heat thereto to write data to the memory cell. The other heating element alters the resistance of the other resistor by applying heat thereto to erase data from the memory cell.
Abstract:
A semiconductor package includes a die and a first lamination layer on the die with openings through the first lamination layer. A redistribution layer is on the first lamination layer and extends through the openings to the die. A plurality of conductive extensions are on the redistribution layer with each stud including a first surface on the redistribution layer, a second surface opposite to the first surface, and a sidewall between the first surface and the second surface. A second lamination layer is on the redistribution layer and the first lamination layer with the die encapsulated in molding compound. The second lamination layer is removed around the conductive extensions to expose the second surface and at least a portion of the sidewall of each stud to improve solder bond strength when mounting the package to a circuit board.
Abstract:
A bonding pad for an integrated circuit is formed by a stack of bonding pad layers. A lower bonding pad layer is supported by a bonding pad support layer. A passivation layer extends over the lower bonding pad layer and includes a passivation opening at a portion of an upper surface of the lower bonding pad layer. An upper bonding pad layer rests on said passivation layer and in the passivation opening in contact with the lower bonding pad layer.
Abstract:
A semiconductor substrate (12) has a trench (18) extending from a front surface (14) and including a lower part and an upper part. A first insulation layer (20) lines the lower part of the trench, and a first conductive material (22) in the lower part is insulated from the semiconductor substrate by the first insulating layer to form a field plate electrode of a transistor. A second insulating layer (130) lines sidewalls of the upper part of said trench. A third insulating layer (132) lines a top surface of the first conductive material at a bottom of the upper part of the trench. A second conductive material (32) fills the upper part of the trench. The second conductive material forms a gate electrode of the transistor (100) that is insulated from the semiconductor substrate by the second insulating layer and further insulated from the first conductive material by the third insulating layer.
Abstract:
The present disclosure is directed to a wafer level chip scale package (WLCSP) (100, 200, 300) with bumps with various combinations of conductive structures such as solder (118, 120, 214, 216, 314, 316) and under bump metallizations (UBMs) (112, 117, 311, 312) having different structures and different amounts of solder (118, 120, 214, 216, 314, 316) coupled to the UBMs (112, 117, 311, 312). Although the bumps have different structures and the volume (height) of solder (118, 120, 214, 216, 314, 316) differs, the total standoff height along the WLCSP (100, 200, 300) remains substantially the same. Each portion of solder (118, 120, 214, 216, 314, 316) includes a point furthest away from an active surface (103, 203, 303) of a die (102, 202, 302) of the WLCSP (100, 200, 300). Each point of each respective portion of solder (118, 120, 214, 216, 314, 316) is co-planar with each other respective point of the other respective portions of solder (118, 120, 214, 216, 314, 316). Additionally, the bumps with different structures are positioned accordingly on the active surface of the die (102, 202, 302) of the WLCSP (100, 200, 300) to reduce failures that may result from the WLCSP (100, 200, 300) being exposed to thermal cycling or the WLCSP (100, 200, 300) being dropped, or because of electromigration, in that less solder (118, 120, 214, 216, 314, 316) is used for bumps at corners of the WLCSP (100, 200, 300). The bumps with less solder comprise an additional contact structure (116, 212, 310) on which the solder (120, 214, 314) is formed. The bumps may be placed on a conductive redistribution layer (108, 208) or on contact pads (304) on the active surface (303) of the die (302) without a redistribution layer. During the manufacturing process, the conductive material (428) of the conductive structures (the solder) is filled in openings (424, 426) of a stencil (422), followed by removing excess portions of the conductive material (428) on the stencil (422) by a squeegee (430).
Abstract:
The present disclosure is directed to a thin film resistor (102) having a first resistor layer (103a) having a first temperature coefficient of resistance and a second resistor layer (103b) on the first resistor layer, the second resistor layer having a second temperature coefficient of resistance different from the first temperature coefficient of resistance. The first temperature coefficient of resistance may be positive while the second temperature coefficient of resistance is negative. The first resistor layer may have a thickness in the range of 5-15 nm and the second resistor layer may have a thickness in the range of 2-5 nm.