ELECTRONIC DEVICE HAVING A CONTACT RECESS AND RELATED METHODS
    362.
    发明申请
    ELECTRONIC DEVICE HAVING A CONTACT RECESS AND RELATED METHODS 有权
    具有接触回路的电子设备及相关方法

    公开(公告)号:US20140103521A1

    公开(公告)日:2014-04-17

    申请号:US13652937

    申请日:2012-10-16

    Abstract: An electronic device may include a bottom interconnect layer and an integrated circuit (IC) carried by the bottom interconnect layer. The electronic device may further include an encapsulation material on the bottom interconnect layer and laterally surrounding the IC. The electronic device may further include electrically conductive pillars on the bottom interconnect layer extending through the encapsulation material. At least one electrically conductive pillar and adjacent portions of encapsulation material may have a reduced height with respect to adjacent portions of the IC and the encapsulation material and may define at least one contact recess. The at least one contact recess may be spaced inwardly from a periphery of the encapsulation material.

    Abstract translation: 电子设备可以包括底部互连层和由底部互连层承载的集成电路(IC)。 电子设备还可以包括底部互连层上的封装材料并横向包围IC。 电子器件还可以包括穿过封装材料的底部互连层上的导电柱。 至少一个导电柱和封装材料的相邻部分可以相对于IC和封装材料的相邻部分具有减小的高度,并且可以限定至少一个接触凹部。 所述至少一个接触凹部可以与所述封装材料的周边向内间隔开。

    Resistor thin film MTP memory
    364.
    发明授权
    Resistor thin film MTP memory 有权
    电阻薄膜MTP存储器

    公开(公告)号:US08644053B2

    公开(公告)日:2014-02-04

    申请号:US13953626

    申请日:2013-07-29

    Inventor: Olivier Le Neel

    Abstract: An integrated circuit is formed having an array of memory cells located in the dielectric stack above a semiconductor substrate. Each memory cell has two adjustable resistors and two heating elements. A dielectric material separates the heating elements from the adjustable resistors. One heating element alters the resistance of one of the resistors by applying heat thereto to write data to the memory cell. The other heating element alters the resistance of the other resistor by applying heat thereto to erase data from the memory cell.

    Abstract translation: 形成集成电路,其具有位于半导体衬底上方的电介质堆叠中的存储器单元的阵列。 每个存储单元具有两个可调电阻器和两个加热元件。 电介质材料将加热元件与可调电阻分开。 一个加热元件通过加热来改变其中一个电阻器的电阻以将数据写入存储单元。 另一个加热元件通过加热来改变另一个电阻器的电阻,从而擦除来自存储单元的数据。

    RESISTOR THIN FILM MTP MEMORY
    365.
    发明申请
    RESISTOR THIN FILM MTP MEMORY 有权
    电阻薄膜MTP存储器

    公开(公告)号:US20130314972A1

    公开(公告)日:2013-11-28

    申请号:US13953626

    申请日:2013-07-29

    Inventor: Olivier Le Neel

    Abstract: An integrated circuit is formed having an array of memory cells located in the dielectric stack above a semiconductor substrate. Each memory cell has two adjustable resistors and two heating elements. A dielectric material separates the heating elements from the adjustable resistors. One heating element alters the resistance of one of the resistors by applying heat thereto to write data to the memory cell. The other heating element alters the resistance of the other resistor by applying heat thereto to erase data from the memory cell.

    Abstract translation: 形成集成电路,其具有位于半导体衬底上方的电介质堆叠中的存储器单元的阵列。 每个存储单元具有两个可调电阻器和两个加热元件。 电介质材料将加热元件与可调电阻分开。 一个加热元件通过加热来改变其中一个电阻器的电阻以将数据写入存储单元。 另一个加热元件通过加热来改变另一个电阻器的电阻,从而擦除来自存储单元的数据。

    SEMICONDUCTOR PACKAGE WITH EXPOSED ELECTRICAL CONTACTS

    公开(公告)号:EP4227992A3

    公开(公告)日:2023-12-06

    申请号:EP23151738.4

    申请日:2023-01-16

    Abstract: A semiconductor package includes a die and a first lamination layer on the die with openings through the first lamination layer. A redistribution layer is on the first lamination layer and extends through the openings to the die. A plurality of conductive extensions are on the redistribution layer with each stud including a first surface on the redistribution layer, a second surface opposite to the first surface, and a sidewall between the first surface and the second surface. A second lamination layer is on the redistribution layer and the first lamination layer with the die encapsulated in molding compound. The second lamination layer is removed around the conductive extensions to expose the second surface and at least a portion of the sidewall of each stud to improve solder bond strength when mounting the package to a circuit board.

    SPLIT-GATE TRENCH POWER MOSFET WITH SELF-ALIGNED POLY-TO-POLY ISOLATION

    公开(公告)号:EP3955311A1

    公开(公告)日:2022-02-16

    申请号:EP21189249.2

    申请日:2021-08-03

    Abstract: A semiconductor substrate (12) has a trench (18) extending from a front surface (14) and including a lower part and an upper part. A first insulation layer (20) lines the lower part of the trench, and a first conductive material (22) in the lower part is insulated from the semiconductor substrate by the first insulating layer to form a field plate electrode of a transistor. A second insulating layer (130) lines sidewalls of the upper part of said trench. A third insulating layer (132) lines a top surface of the first conductive material at a bottom of the upper part of the trench. A second conductive material (32) fills the upper part of the trench. The second conductive material forms a gate electrode of the transistor (100) that is insulated from the semiconductor substrate by the second insulating layer and further insulated from the first conductive material by the third insulating layer.

    WAFER LEVEL CHIP SCALE PACKAGE WITH CO-PLANAR BUMPS WITH DIFFERENT SOLDER HEIGHTS AND CORRESPONDING MANUFACTURING METHOD

    公开(公告)号:EP3852139A3

    公开(公告)日:2021-09-08

    申请号:EP20215558.6

    申请日:2020-12-18

    Inventor: GANI, David

    Abstract: The present disclosure is directed to a wafer level chip scale package (WLCSP) (100, 200, 300) with bumps with various combinations of conductive structures such as solder (118, 120, 214, 216, 314, 316) and under bump metallizations (UBMs) (112, 117, 311, 312) having different structures and different amounts of solder (118, 120, 214, 216, 314, 316) coupled to the UBMs (112, 117, 311, 312). Although the bumps have different structures and the volume (height) of solder (118, 120, 214, 216, 314, 316) differs, the total standoff height along the WLCSP (100, 200, 300) remains substantially the same. Each portion of solder (118, 120, 214, 216, 314, 316) includes a point furthest away from an active surface (103, 203, 303) of a die (102, 202, 302) of the WLCSP (100, 200, 300). Each point of each respective portion of solder (118, 120, 214, 216, 314, 316) is co-planar with each other respective point of the other respective portions of solder (118, 120, 214, 216, 314, 316). Additionally, the bumps with different structures are positioned accordingly on the active surface of the die (102, 202, 302) of the WLCSP (100, 200, 300) to reduce failures that may result from the WLCSP (100, 200, 300) being exposed to thermal cycling or the WLCSP (100, 200, 300) being dropped, or because of electromigration, in that less solder (118, 120, 214, 216, 314, 316) is used for bumps at corners of the WLCSP (100, 200, 300). The bumps with less solder comprise an additional contact structure (116, 212, 310) on which the solder (120, 214, 314) is formed. The bumps may be placed on a conductive redistribution layer (108, 208) or on contact pads (304) on the active surface (303) of the die (302) without a redistribution layer. During the manufacturing process, the conductive material (428) of the conductive structures (the solder) is filled in openings (424, 426) of a stencil (422), followed by removing excess portions of the conductive material (428) on the stencil (422) by a squeegee (430).

    Multi-layer via-less thin film resistor and manufacturing method therefor
    370.
    发明公开
    Multi-layer via-less thin film resistor and manufacturing method therefor 审中-公开
    MehrschichtigerDünnfilmwiderstandohneKontaktlöcherund Herstellungsverfahrendafür

    公开(公告)号:EP2423949A2

    公开(公告)日:2012-02-29

    申请号:EP11178593.7

    申请日:2011-08-24

    Abstract: The present disclosure is directed to a thin film resistor (102) having a first resistor layer (103a) having a first temperature coefficient of resistance and a second resistor layer (103b) on the first resistor layer, the second resistor layer having a second temperature coefficient of resistance different from the first temperature coefficient of resistance. The first temperature coefficient of resistance may be positive while the second temperature coefficient of resistance is negative. The first resistor layer may have a thickness in the range of 5-15 nm and the second resistor layer may have a thickness in the range of 2-5 nm.

    Abstract translation: 本公开涉及一种薄膜电阻器(102),其具有第一电阻层(103a)和第二电阻层(103b),第一电阻层(103a)具有第一温度系数电阻,第二电阻层具有第二温度 电阻系数与第一温度系数电阻不同。 电阻的第一温度系数可以为正,而第二温度系数为负。 第一电阻层的厚度可以在5-15nm的范围内,第二电阻层的厚度可以在2-5nm的范围内。

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