公开(公告)号：GB8811331D0

公开(公告)日：1988-06-15

申请号：GB8811331

申请日：1988-05-13

Applicant: HOLTRONIC TECHNOLOGIES LTD

IPC: G03H1/22 ,  G02B5/32 ,  G03H1/32

公开(公告)号：GB0418952D0

公开(公告)日：2004-09-29

申请号：GB0418952

申请日：2004-08-25

Applicant: HOLTRONIC TECHNOLOGIES LTD

IPC: G03H1/00

Abstract: A method and apparatus for automatically printing a pattern of features from a plurality of hologram masks on a lithographic machine, which method includes arranging the plurality of hologram masks on first faces of a plurality of prisms such that the pattern of features recorded in each hologram mask can be printed by an exposure beam illuminating second faces of the plurality of prisms; providing an exposure position at which any of the prisms and hologram masks can be arranged such that the patterns recorded in the hologram mask can be printed; providing a prism storage and transport system in which the prisms and hologram masks not at the exposure position can be arranged and for transporting the prisms and hologram masks between any of the exposure position and prism storage positions; and providing a control system for the prism transport and storage system.

公开(公告)号：DE69128771D1

公开(公告)日：1998-02-26

申请号：DE69128771

申请日：1991-10-07

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： CLUBE FRANCIS S M

IPC: G03F1/08 ,  G03F9/00 ,  G03H1/00 ,  H01L21/027

Abstract: Apparatus for transverse position measurement in a proximity lithographic system including a prism (10) having a glass plate (14) index matched beneath the prism on which a T.I.R. hologram (13) is pre-recorded. A laser source (12) provides a replay beam. A silicon wafer (16) is situated below the hologram and parallel therewith. A second laser source (17) produces through optics (18) a beam with gaussian intensity profile to generate a collimated strip of light (19) at the hologram plane. Elemental grating structures (20) are provided at different locations over the surface of the wafer. Detectors (22,24) collect parts of the lightfield resulting from the interaction of the laser beam with the grating structures. A piezo device (26) operated from a micro-processor (28) moves the silicon wafer in small increments in a direction substantially parallel to the hologram following measurements made by the two detectors which are processed by the micro-processor to produce an alignment signal for the piezo device.

公开(公告)号：GB2293459B

公开(公告)日：1997-10-01

申请号：GB9419086

申请日：1994-09-22

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： CLUBE FRANCIS STACE MURRAY

IPC: G03F7/20 ,  G03H1/00 ,  G03B27/72

公开(公告)号：GB2301884A

公开(公告)日：1996-12-18

申请号：GB9511760

申请日：1995-06-06

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： DAENDLIKER RENE ,  GRAY SIMON ,  SCHNELL URBAN

IPC: G01B11/06 ,  G01B11/14 ,  H01L21/66 ,  G01B9/02

Abstract: A method and apparatus are disclosed for characterising a one or more layer thin film system on a substrate, in particular in respect of layer thickness and refractive index, and for measuring the distance between two surfaces, wherein at least one of the surfaces comprises a one- or multi-layer system, taking into account, and allowing rectification of, the phase contribution from the thin film stack, by interferometry, in particular by white-light channelled spectrum interferometry or multi-wavelength interferometry.

公开(公告)号：GB2267356B

公开(公告)日：1995-12-06

申请号：GB9205560

申请日：1992-03-13

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： CLUBE FRANCIS STACE MURRAY

IPC: G03F7/20 ,  G03H1/00 ,  G03H1/26

Abstract: In the manufacture of an array total internal reflection hologram for printing a pattern of high-quality microfeatures over a large area, a mask defining just a part of the pattern is used to record an array of sub-holograms, the holographic recording medium or the mask being moved with respect to each other subsequent to the recordal of each sub-hologram, thereby building up a hologram of the complete pattern to be printed.

公开(公告)号：GB9221561D0

公开(公告)日：1992-11-25

申请号：GB9221561

申请日：1992-10-14

Applicant: HOLTRONIC TECHNOLOGIES LTD

IPC: G03H1/04 ,  G03F7/00 ,  G03F7/20 ,  G03H1/00 ,  G06K7/12

Abstract: A method for the manufacture of TIR holograms includes the division of an input laser beam into an object beam and a reference beam, the direction of the beams to a holographic recording layer so that the object beam is incident on a surface of the holographic recording layer following transmission through an object mask, so that the reference beam is incident on the other surface of the holographic recording layer at an angle such that following passage through the holographic recording layer it is totally internally reflected back into the holographic recording layer and so that the two beams are superposed at the holographic recording layer, and the displacement of the input laser beam causing the object and reference beams to traverse together the holographic recording layer. The method is especially useful for obtaining a high uniformity of exposure of the holographic recording layer.

公开(公告)号：CA1273129A

公开(公告)日：1990-08-21

申请号：CA540426

申请日：1987-06-23

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： PHILLIPS NICHOLAS J

IPC: G03H1/04 ,  G03F7/20 ,  G03H1/00 ,  H01L21/027 ,  H01L21/00

Abstract: MANUFACTURE OF INTEGRATED CIRCUITS USING HOLOGRAPHIC TECHNIQUES" . A method of manufacturing integrated circuits using holographic techniques by interference between an input beam and a reference beam generated from laser sources. A holographic image of the object formed on a mask window, is formed on recording emulsion coated on a glass slab by means of interference between the input beam which has passed through the mask and the reference beam which is reflected from the surface of a prism in contact with the glass slab. In order to reproduce the holographic image on a silicon slice which replaces the mask, the reference beam is replayed in the reverse direction through the prism such that the interference between the input beam and the replayed reference beam causes the holographic image to be created as a real image in the silicon slice.

公开(公告)号：GB2194353B

公开(公告)日：1990-02-21

申请号：GB8717741

申请日：1987-07-27

Applicant: HUGLE WILLIAM BELL ,  HOLTRONIC TECHNOLOGIES LTD

Inventor： TOMKINS DONALD WILLIAM ,  HOLDEN LAURENCE

IPC: G01B11/00 ,  G03H1/00 ,  G03H1/22

公开(公告)号：GB8922341D0

公开(公告)日：1989-11-22

申请号：GB8922341

申请日：1989-10-04

Applicant: HOLTRONIC TECHNOLOGIES LTD

IPC: G01B9/021 ,  G01N21/88 ,  G01N21/956 ,  G02B7/28 ,  G03F7/20 ,  G03F9/00 ,  G03H1/00 ,  H01L21/027

Abstract: Apparatus for and a method of optical inspection in a total internal reflection holographic imaging system. Multi wavelength laser beams are directed onto a prism supporting a first substrate containing pre-recorded hologram which is to be imaged onto a recording medium of a second substrate, the multi wavelength beams being normal to both substrates. The distance between the two substrates is measured by interferometric techniques. Actuators are provided for adjusting the distance between the two substrates, these actuators being energized to cause minute adjustments of the spacing during a scanning operation whereby the imaging of the pre-recorded hologram is ensured at the correct focus throughout the scanning operation.