公开(公告)号：GB2203889A

公开(公告)日：1988-10-26

申请号：GB8806912

申请日：1988-03-23

Applicant: RPC IND

Inventor： FARRELL SHERMAN R ,  SMITH RICHARD R

IPC: H01J27/08 ,  H01J3/02 ,  H01J27/20 ,  H01J33/00 ,  H01J37/06 ,  H01J37/08 ,  H01J3/08

Abstract: An ion plasma electron gun for the generation of electron beams which exhibits electron beam dose uniformity and which is capable of varying the dose received by a material to be irradiated. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid onto a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode, causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid in the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is subsantially the same as the ion distribution of the ion beam impinging upon the cathode. Means are provided for creating a pulse of secondary electrons by varying the period of time in which the secondary electrons are transmitted through the foil.

公开(公告)号：GB2199691A

公开(公告)日：1988-07-13

申请号：GB8700605

申请日：1987-01-12

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE

IPC: H05H1/46 ,  H01J3/02 ,  H01J33/00 ,  H01J37/073 ,  H01J37/077 ,  H01S3/038 ,  H01S3/0959 ,  H05H1/48

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. Control of the generated electron beam is achieved by applying a control voltage between the wire and the grounded housing of the plasma chamber to control the density of positive ions bombarding the cathode.

公开(公告)号：GB2157140A

公开(公告)日：1985-10-16

申请号：GB8506508

申请日：1985-03-13

Applicant: RPC IND

Inventor： RAMLER WARREN J ,  DAIGLE RICHARD G

IPC: B01J19/08 ,  C08F2/54 ,  G21K5/10

Abstract: An apparatus for providing ionizing radiation to a moving web or sheet 12 comprising a central chamber 10 which includes means 11 for generating and directing ionizing radiation to said moving web or sheet. Inlet and outlet means for the passage of the moving web or sheet comprise one or more subchambers 20, 21 at the inlet and outlet sides of the central chamber, said subchambers containing means 60-63a, 70-73a for trapping spurious ionizing radiation and being further characterized as being removable from adjacent subchambers and the central chamber. A radiation trap 35 is removable for access to the central chamber 10.

公开(公告)号：GB8405431D0

公开(公告)日：1984-04-04

申请号：GB8405431

申请日：1984-03-01

Applicant: RPC IND

IPC: B29C35/00 ,  B05D3/06 ,  B29C35/08 ,  B29C35/10 ,  B29C71/00 ,  B29C71/04 ,  B29D1/00 ,  C08J7/00 ,  G11B5/842 ,  B29D7/22

公开(公告)号：FR2615324B1

公开(公告)日：1991-01-04

申请号：FR8804080

申请日：1988-03-29

Applicant: RPC IND

Inventor： FARRELL SHERMAN R ,  SMITH RICHARD R

IPC: H01J27/08 ,  H01J3/02 ,  H01J27/20 ,  H01J33/00 ,  H01J37/06 ,  H01J37/08 ,  H01J1/32 ,  H01J7/44

Abstract: An ion plasma electron gun for the generation of electron beams which exhibits electron beam dose uniformity and which is capable of varying the dose received by a material to be irradiated. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid onto a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode, causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid in the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is subsantially the same as the ion distribution of the ion beam impinging upon the cathode. Means are provided for creating a pulse of secondary electrons by varying the period of time in which the secondary electrons are transmitted through the foil.

公开(公告)号：GB2203890A

公开(公告)日：1988-10-26

申请号：GB8806913

申请日：1988-03-23

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE ,  FARRELL SHERMAN R

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959 ,  H01J3/08

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

公开(公告)号：DE3810293A1

公开(公告)日：1988-10-13

申请号：DE3810293

申请日：1988-03-25

Applicant: RPC IND

Inventor： FARRELL SHERMAN R ,  SMITH RICHARD R

IPC: H01J27/08 ,  H01J3/02 ,  H01J27/20 ,  H01J33/00 ,  H01J37/06 ,  H01J37/08

Abstract: An ion plasma electron gun for the generation of electron beams which exhibits electron beam dose uniformity and which is capable of varying the dose received by a material to be irradiated. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid onto a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode, causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid in the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is subsantially the same as the ion distribution of the ion beam impinging upon the cathode. Means are provided for creating a pulse of secondary electrons by varying the period of time in which the secondary electrons are transmitted through the foil.

公开(公告)号：FR2609840A1

公开(公告)日：1988-07-22

申请号：FR8700502

申请日：1987-01-19

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE

IPC: H05H1/46 ,  H01J3/02 ,  H01J33/00 ,  H01J37/073 ,  H01J37/077 ,  H01S3/038 ,  H01S3/0959 ,  H05H1/48 ,  H01J33/02 ,  H01S3/22

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. Control of the generated electron beam is achieved by applying a control voltage between the wire and the grounded housing of the plasma chamber to control the density of positive ions bombarding the cathode.

公开(公告)号：SE8700017L

公开(公告)日：1988-07-03

申请号：SE8700017

申请日：1987-01-02

Applicant: RPC IND

Inventor： WAKALOPULOS G

IPC: H05H1/46 ,  H01J3/02 ,  H01J33/00 ,  H01J37/073 ,  H01J37/077 ,  H01S3/038 ,  H01S3/0959 ,  H05H1/48 ,  H01J15/00

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. Control of the generated electron beam is achieved by applying a control voltage between the wire and the grounded housing of the plasma chamber to control the density of positive ions bombarding the cathode.

公开(公告)号：GB8806913D0

公开(公告)日：1988-04-27

申请号：GB8806913

申请日：1988-03-23

Applicant: RPC IND

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.