광간섭 리소그래피에 의한 멀티스케일 격자 패턴 형성 방법
    31.
    发明公开
    광간섭 리소그래피에 의한 멀티스케일 격자 패턴 형성 방법 有权
    使用全息图进行多尺度图案的形成方法

    公开(公告)号:KR1020110085696A

    公开(公告)日:2011-07-27

    申请号:KR1020100005613

    申请日:2010-01-21

    CPC classification number: G03F7/70408 G03F7/2051 G03F7/7055

    Abstract: PURPOSE: A method for forming a multi-scale lattice pattern by optical interference lithography is provided to effectively form a multi-scale lattice pattern which has various lattice constants. CONSTITUTION: At least two interference lights have an optical interference pattern with a different cycle. A photo resist layer is formed on a substrate. A multi-scale lattice pattern is formed on the photo resist layer by overlappingly irradiating at least two interference lights on the photo resist layer. At least two interference lights are formed by interfering parallel lights with different optical routes.

    Abstract translation: 目的:提供通过光学干涉光刻形成多尺度格子图案的方法,以有效地形成具有各种晶格常数的多尺度格子图案。 构成:至少有两个干涉灯具有不同周期的光学干涉图案。 在基板上形成光刻胶层。 通过在光致抗蚀剂层上重叠照射至少两个干涉光,在光致抗蚀剂层上形成多尺度格子图案。 通过用不同的光学路线干扰平行光,形成至少两个干涉光。

    염료감응 태양전지용 광전극, 이의 제조 방법, 및 이를 포함하는 염료감응 태양전지
    39.
    发明公开
    염료감응 태양전지용 광전극, 이의 제조 방법, 및 이를 포함하는 염료감응 태양전지 有权
    用于透明的太阳能电池的光电子体,其制备方法和包含其的透明的太阳能电池

    公开(公告)号:KR1020140061590A

    公开(公告)日:2014-05-22

    申请号:KR1020120127677

    申请日:2012-11-12

    Inventor: 문준혁 박예슬

    Abstract: The present invention relates to a photoelectrode for a dye-sensitized solar cell, a method of manufacturing the same, and a dye-sensitized solar cell including the same. The method of manufacturing a photoelectrode for a dye-sensitized solar cell according to one embodiment of the present invention includes a step of forming a colloid crystal layer on a conductive transparent base material; a step of forming a porous first transition metal oxide layer; a step of forming a porous 3D structure; and a step of surface-treating the porous 3D structure.

    Abstract translation: 本发明涉及一种用于染料敏化太阳能电池的光电极,其制造方法和包含该光电子的染料敏化太阳能电池。 根据本发明的一个实施方案的用于染料敏化太阳能电池的光电极的制造方法包括在导电透明基材上形成胶体晶体层的步骤; 形成多孔第一过渡金属氧化物层的步骤; 形成多孔3D结构的步骤; 以及对多孔3D结构进行表面处理的步骤。

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