Patent search ap:("ASML NETHERLANDS B.V.") AND inv:"Christiaan Alexander Hoogendam" Page 4

31.

发明授权
Lithographic apparatus and device manufacturing method 有权

公开(公告)号：US09436097B2

公开(公告)日：2016-09-06

申请号：US14586518

申请日：2014-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Augustinus Matheus Van Gompel

IPC: G03B27/52 , G03B27/42 , G03F7/20

CPC classification number: G03F7/70716 , G03F7/70341

Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

32.

发明授权
Lithographic apparatus and device manufacturing method 有权
Title translation: 平版印刷设备和器件制造方法

公开(公告)号：US09429853B2

公开(公告)日：2016-08-30

申请号：US14664360

申请日：2015-03-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers

IPC: G03B27/52 , G03B27/42 , G03F7/20

CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808

Abstract: A lithographic apparatus, including a movable table, a projection system configured to project a patterned radiation beam onto a substrate, and a liquid supply system configured to provide liquid to a space between a final element of the projection system and the table, the liquid supply system including an inlet configured to provide liquid to the space, the inlet including an array of inlet orifices located below a bottom surface of the final element and configured to provide an essentially horizontal flow of liquid therefrom, the array of inlet orifices extending along a side of an exposure field of the patterned radiation beam, and an extractor configured to remove liquid from the space, the extractor including a two dimensional array of outlet orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.

Abstract translation: 一种光刻设备，包括可移动台，配置成将图案化辐射束投影到基板上的投影系统以及被配置为向投影系统的最终元件和台之间的空间提供液体的液体供应系统，液体供应系统，其包括被配置为向该空间提供液体的入口，入口包括位于最终元件的底表面下方的入口孔阵列，并被配置为从其提供基本上水平的液体流，沿着一侧延伸的入口孔阵列所述图案化辐射束的曝光区域以及被配置为从所述空间移除液体的提取器，所述提取器包括至少部分地沿水平方向延伸的出口孔的二维阵列，通过所述出口孔可以从空间。

33.

发明授权
Lithographic apparatus and device manufacturing method 有权

公开(公告)号：US09182679B2

公开(公告)日：2015-11-10

申请号：US14504191

申请日：2014-10-01

Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT GmbH

Inventor： Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Bob Streefkerk , Bernhard Gellrich , Andreas Wurmbrand

IPC: G03B27/52 , G03F7/20

CPC classification number: G03F7/70341

Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

34.

发明申请
SUBSTRATE TABLE SYSTEM, LITHOGRAPHIC APPARATUS AND SUBSTRATE TABLE SWAPPING METHOD 有权
Title translation: 基板表系统，平面设备和基板表交换方法

公开(公告)号：US20150153661A1

公开(公告)日：2015-06-04

申请号：US14388773

申请日：2013-02-15

Applicant: ASML Netherlands B.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Hans Butler

IPC: G03F9/00 , H02K41/02

CPC classification number: G03F7/70758 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F9/70 , H02K41/02

Abstract: A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement that is defined by a first direction and a second direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate to form a first motor to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure, the second pusher structure and the substrate table to cooperate to form a second motor to exert a force between the second pusher structure and the substrate table in the second direction.

Abstract translation: 衬底台系统包括衬底台和用于在由第一方向和第二方向限定的运动平面中移动衬底台的双向电动机。双向电动机包括：沿第一方向延伸的第一推动器结构，所述衬底台相对于第一推动器结构可移动，第一推动器结构和衬底台布置成协作以形成第一电动机以施加力在所述第一推动器结构和所述基板台之间沿所述第一方向; 以及沿所述第一方向延伸的第二推动器结构，所述衬底台可相对于所述第二推动器结构，所述第二推动器结构和所述衬底台移动以协作以形成第二电动机，以在所述第二推动器结构和所述第二推动器结构之间施加力衬底台在第二个方向。

35.

发明申请
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
Title translation: LITHOGRAPHIC装置和装置制造方法

公开(公告)号：US20140300883A1

公开(公告)日：2014-10-09

申请号：US14273335

申请日：2014-05-08

Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.

Inventor： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel

IPC: G03F7/20

CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract translation: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。或者，多孔构件可以用于减少两相流中的不均匀性。

36.

发明申请
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权

公开(公告)号：US20140233004A1

公开(公告)日：2014-08-21

申请号：US14266591

申请日：2014-04-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers

IPC: G03F7/20

CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

37.

发明授权
Bearing device, magnetic gravity compensator, vibration isolation system, lithographic apparatus, and method to control a gravity compensator having a negative stiffness 有权

公开(公告)号：US11029612B2

公开(公告)日：2021-06-08

申请号：US16494200

申请日：2018-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Maarten Hartger Kimman , Hans Butler , Olof Martinus Josephus Fischer , Christiaan Alexander Hoogendam , Theodorus Mattheus Joannus Maria Huizinga , Johannes Marinus Maria Rovers , Eric Pierre-Yves Vennat , Maurice Willem Jozef Etienne Wijckmans

IPC: G03F7/20 , F16C39/06

Abstract: The invention relates to a bearing device arranged to support in a vertical direction a first part of an apparatus with respect to a second part of the apparatus, comprising a magnetic gravity compensator. The magnetic gravity compensator comprises: a first permanent magnet assembly mounted to one of the first part and the second part and comprising at least a first column of permanent magnets, the first column extending in the vertical direction, wherein the permanent magnets have a polarization direction in a first horizontal direction or in a second horizontal direction opposite to the first horizontal direction, wherein vertically adjacent permanent magnets have opposite polarization directions, a second permanent magnet assembly mounted to the other of the first part and the second part and comprising at least one other column of permanent magnets, the at least one other column extending in the vertical direction, wherein vertically adjacent permanent magnets of the at least one other column have opposite polarization directions in the first horizontal direction or the second horizontal direction, wherein the first permanent magnet assembly at least partially encloses the second permanent magnet assembly.

38.

发明授权
Lithographic apparatus and device manufacturing method 有权

公开(公告)号：US10684554B2

公开(公告)日：2020-06-16

申请号：US16511809

申请日：2019-07-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen

IPC: G03F7/20

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.