公开(公告)号：US12066764B2

公开(公告)日：2024-08-20

申请号：US18143825

申请日：2023-05-05

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Patrick Warnaar ,  Vasco Tomas Tenner ,  Maurits Van Der Schaar

IPC: G03F7/00 ,  G01R31/265

CPC classification number: G03F7/706839 ,  G01R31/2656 ,  G03F7/70633

Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.

公开(公告)号：US20210349395A1

公开(公告)日：2021-11-11

申请号：US17379662

申请日：2021-07-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Patrick WARNAAR ,  Patricius Aloysius Jacobus Tinnemans ,  Grzegorz Grzela ,  Everhardus Cornelis Mos ,  Wim Tjibbo Tel ,  Marinus Jochemsen ,  Bart Peter Bert Segers ,  Frank Staals

IPC: G03F7/20

Abstract: A method includes obtaining, for each particular feature of a plurality of features of a device pattern of a substrate being created using a patterning process, a modelled or simulated relation of a parameter of the patterning process between a measurement target for the substrate and the particular feature; and based on the relation and measured values of the parameter from the metrology target, generating a distribution of the parameter across at least part of the substrate for each of the features, the distribution for use in design, control or modification of the patterning process.

公开(公告)号：US11022902B2

公开(公告)日：2021-06-01

申请号：US16623647

申请日：2018-05-14

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey Den Boef ,  Patricius Aloysius Jacobus Tinnemans ,  Haico Victor Kok ,  William Peter Van Drent ,  Sebastianus Adrianus Goorden

IPC: G03B27/72 ,  G03F7/20

Abstract: The invention relates to a sensor comprising: a radiation source to emit radiation having a coherence length towards a sensor target; and a polarizing beam splitter to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.

公开(公告)号：US10527958B2

公开(公告)日：2020-01-07

申请号：US16132520

申请日：2018-09-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Edo Maria Hulsebos ,  Henricus Johannes Lambertus Megens ,  Sudharshanan Raghunathan ,  Boris Menchtchikov ,  Ahmet Koray Erdamar ,  Loek Johannes Petrus Verhees ,  Willem Seine Christian Roelofs ,  Wendy Johanna Martina Van De Ven ,  Hadi Yagubizade ,  Hakki Ergün Cekli ,  Ralph Brinkhof ,  Tran Thanh Thuy Vu ,  Maikel Robert Goosen ,  Maaike Van't Westeinde ,  Weitian Kou ,  Manouk Rijpstra ,  Matthijs Cox ,  Franciscus Godefridus Casper Bijnen

IPC: G03F7/20 ,  G03F9/00

Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured to measure a property of a substrate is disclosed. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameter values for the plurality of substrates using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameter values; and determining the one or more optimized values of the operational parameter based on the comparing.

公开(公告)号：US10267744B2

公开(公告)日：2019-04-23

申请号：US15641579

申请日：2017-07-05

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen

IPC: G02F1/35 ,  G01N21/47 ,  G01N21/88 ,  G01N21/956 ,  G03F7/20

Abstract: Disclosed is an illumination source for generating measurement radiation for an inspection apparatus. The source generates at least first measurement radiation and second measurement radiation such that the first measurement radiation and the second measurement radiation interfere to form combined measurement radiation modulated with a beat component. The illumination source may be a HHG source. Also disclosed is an inspection apparatus comprising such a source and an associated inspection method.

公开(公告)号：US09753380B2

公开(公告)日：2017-09-05

申请号：US15251915

申请日：2016-08-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria Mertens ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Antonius Johannus Van Der Net ,  Franciscus Johannes Herman Maria Teunissen ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Edwin Augustinus Matheus Van Gompel

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

公开(公告)号：US09506743B2

公开(公告)日：2016-11-29

申请号：US14427287

申请日：2013-09-20

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Arie Jeffrey Den Boef ,  Justin Lloyd Kreuzer ,  Simon Gijsbert Josephus Mathijssen ,  Gerrit Johannes Nijmeijer ,  J. Christian Swindal ,  Patricius Aloysius Jacobus Tinnemans ,  Richard Johannes Franciscus Van Haren

IPC: G06K9/00 ,  G01B11/00 ,  G03F9/00 ,  G03F7/20 ,  H01L21/66

CPC classification number: G01B11/002 ,  G03F7/70775 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7088 ,  H01L22/12

Abstract: An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.

Abstract translation: 一种用于测量标记位置的装置，该装置包括使用由照明装置提供的辐射将辐射引导到标记上的物镜; 接收由标记衍射并被镜面反射的辐射的光学装置，其中所述光学装置被配置为提供第一图像和第二图像，所述第一图像通过相干地添加镜面反射辐射和正衍射级辐射而形成，并且所述第二图像 通过相干地加入镜面反射辐射和负衍射级辐射形成; 以及检测装置，用于检测第一和第二图像的辐射强度的变化，并计算标记在测量方向上的位置。

公开(公告)号：US20150177166A1

公开(公告)日：2015-06-25

申请号：US14416484

申请日：2013-06-18

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph Cramer ,  Robert John Socha ,  Patricius Aloysius Jacobus Tinnemans ,  Jean-Pierre Agnes Henricus Marie Vaessen

IPC: G01N23/203 ,  G03F7/20 ,  H01J37/26

CPC classification number: G01N23/203 ,  G03F7/70058 ,  G03F7/70625 ,  H01J37/26

Abstract: An inspection method determines values of profile parameters of substrate patterns. A baseline substrate with a baseline pattern target (BP) is produced that has a profile described by profile parameters, for example CD (median critical dimension), SWA (side wall angle) and RH (resist height). Scatterometry is used to obtain first and second signals from first and second targets. Values of differential pattern profile parameters are calculated using a Bayesian differential cost function based on a difference between the baseline pupil and the perturbed pupil and dependence of the pupil on pattern profile parameters. For example, the difference is measured between a baseline process and a perturbed process for stability control of a lithographic process. Fed-forward differential stack parameters are also calculated from observations of stack targets on the same substrates as the pattern targets.

Abstract translation: 检查方法确定基板图案的轮廓参数的值。 产生具有基线图案目标（BP）的基准基底，其具有通过轮廓参数描述的轮廓，例如CD（中值临界尺寸），SWA（侧壁角）和RH（抗蚀剂高度）。 散射法用于获得第一和第二个目标的第一和第二信号。 使用贝叶斯差分成本函数，基于基线瞳孔和扰动瞳孔之间的差异以及瞳孔对图形轮廓参数的依赖性来计算微分图案轮廓参数的值。 例如，在光刻工艺的稳定性控制的基线工艺和扰动工艺之间测量差异。 前馈差分堆栈参数也是通过与模式目标相同的基板上的堆叠目标的观察来计算的。

公开(公告)号：US20150176979A1

公开(公告)日：2015-06-25

申请号：US14421434

申请日：2013-07-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Simon Gijsbert Josephus Mathijssen ,  Erik Willem Bogaart ,  Patricius Aloysius Jacobus Tinnemans ,  Arie Jeffrey Den Boef

IPC: G01B11/14 ,  G01B9/02 ,  G01B11/27 ,  G03F7/20

CPC classification number: G01B11/14 ,  G01B9/02 ,  G01B11/27 ,  G03F7/70058 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7069 ,  G03F9/7088

Abstract: A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of an alignment target comprising a periodic structure. An illumination optical system for focusing radiation into a spot on said structure. An asymmetry detection optical system receives a share of positive and negative orders of radiation diffracted by the periodic structure, and forms first and second images of said spot on first and second detectors respectively, wherein said negative order radiation is used to form the first image and said positive order radiation is used to form the second image. A processor for processing together signals from said first and second detectors representing intensities of said positive and negative orders to produce a measurement of asymmetry in the periodic structure. The asymmetry measurement can be used to improve accuracy of the position read by the alignment sensor.

Abstract translation: 光刻设备包括对准传感器，其包括用于读取包括周期性结构的对准目标位置的自参考干涉仪。 一种照明光学系统，用于将辐射聚焦到所述结构上的光斑中。 不对称检测光学系统接收通过周期性结构衍射的辐射的正数和负数的共享，并分别在第一和第二检测器上形成所述光斑的第一和第二图像，其中所述负序辐射用于形成第一图像， 所述正阶辐射用于形成第二图像。 用于处理来自所述第一和第二检测器的信号的处理器，其表示所述正序和负序的强度，以产生周期性结构中的不对称性的测量。 可以使用不对称测量来提高由对准传感器读取的位置的精度。

公开(公告)号：US20150116677A1

公开(公告)日：2015-04-30

申请号：US14586468

申请日：2014-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria Mertens ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Leon Joseph Maria Van Den Schoor ,  Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.

Abstract translation: 在浸没式光刻设备中，浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。