公开(公告)号：EP3523698A1

公开(公告)日：2019-08-14

申请号：EP18727761.1

申请日：2018-05-23

Applicant: ASML Netherlands B.V.

Inventor： HARUTYUNYAN, Davit ,  JIA, Fei ,  STAALS, Frank ,  WANG, Fuming ,  LOOIJESTIJN, Hugo, Thomas ,  RIJNIERSE, Cornelis, Johannes ,  PISARENCO, Maxim ,  WERKMAN, Roy ,  THEEUWES, Thomas ,  VAN HEMERT, Tom ,  BASTANI, Vahid ,  WILDENBERG, Jochem, Sebastiaan ,  MOS, Everhardus, Cornelis ,  WALLERBOS, Erik, Johannes, Maria

IPC: G03F7/20 ,  G05B13/04 ,  G05B19/418 ,  H01L21/66

公开(公告)号：EP3480659A1

公开(公告)日：2019-05-08

申请号：EP17199539.2

申请日：2017-11-01

Applicant: ASML Netherlands B.V.

Inventor： ONOSE, Alexandru ,  MOSSAVAT, Seyed Iman ,  THEEUWES, Thomas

IPC: G03F7/20

Abstract: Methods and apparatus for estimating an unknown value of at least one of a plurality of sets of data, each set of data comprising a plurality of values indicative of radiation diffracted and/or reflected and/or scattered by one or more features fabricated in or on a substrate, wherein the plurality of sets of data comprises at least one known value, and wherein at least one of the plurality of sets of data comprises an unknown value, the apparatus comprising a processor configured to estimate the unknown value of the at least one set of data based on: the known values of the plurality of sets of data; a first condition between two or more values within a set of data of the plurality of sets of data; and a second condition between two or more values being part of different sets of data of the plurality of the sets of data.

公开(公告)号：EP3451060A1

公开(公告)日：2019-03-06

申请号：EP17188175.8

申请日：2017-08-28

Applicant: ASML Netherlands B.V.

Inventor： VERMA, Alok ,  CRAMER, Hugo Augustinus Joseph ,  THEEUWES, Thomas ,  TSIATMAS, Anagnostis ,  VERSTRAETEN, Bert

IPC: G03F7/20

Abstract: A substrate comprising a plurality of features for use in measuring a parameter of a device manufacturing process and associated methods and apparatus. The measurement is by illumination of the features with measurement radiation from an optical apparatus and detecting a signal arising from interaction between the measurement radiation and the features, wherein the plurality of features comprise first features distributed in a periodic fashion at a first pitch, and second features distributed in a periodic fashion at a second pitch, and wherein the first pitch and second pitch are such that a combined pitch of the first and second features is constant irrespective of the presence of pitch walk in the plurality of features.