公开(公告)号：JP2006186364A

公开(公告)日：2006-07-13

申请号：JP2005371835

申请日：2005-12-26

Applicant: ASML NETHERLANDS BV

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BASELMANS JOHANNES JACOBUS MAT ,  JORRITSMA LAURENTIUS C

IPC: H01L21/027 ,  G02B26/08 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and device manufacturing method that improves handling of regions prone to excess exposed-spot overlap. SOLUTION: The lithography apparatus is provided with an array of individually controllable elements configured to modulate sub-beams of radiation and a data path that includes at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each irradiated spot to be exposed on the substrate by one of the sub-beams of radiation at a given time. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP2005123613A

公开(公告)日：2005-05-12

申请号：JP2004295574

申请日：2004-10-08

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JOHANNES MARTINUS ANDREAS HART ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VISSER RAYMOND

IPC: G03F7/20 ,  G03B27/58 ,  G03F9/00 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68

CPC classification number: G03F7/7075 ,  G03F9/7011 ,  G03F9/7096

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus which is lithographic projection apparatus which uses extreme ultra-violet rays, wherein a substrate is disposed on a carrier in the minimum delivery number and high accuracy, when the substrate is loaded into a vacuum chamber via a load lock.
SOLUTION: A position of a substrate 1 is detected, when the substrate is in a load lock LL before it is held by a gripper 20, and the substrate is held at a grip position determined according to the detected position and disposed to a correct position in a carrier 16, at a pretreatment position or a carrier 17 in a vacuum chamber; or the position is detected, after the substrate 1 has been held by the gripper 20, and the substrate is disposed to the correct position according the detected position, when the carriers 16, 17 are provided. In this way, positioning of the substrate on the carrier is achieved with a precision of several microns or smaller, and transfer time, substrate contamination, and in addition, cost are reduced.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种使用极紫外线的平版印刷设备的方法和装置，其中当基板被装入时基板以最小的输送数量和高精度设置在载体上 通过加载锁定的真空室。 解决方案：当基板在由夹持器20保持之前处于装载锁定LL中时，检测基板1的位置，并且将基板保持在根据检测到的位置确定的抓地位置并设置在 在载体16中的真空室中的预处理位置或载体17处的正确位置; 或者在基板1被夹持器20保持之后检测到位置，并且当设置载体16,17时，将基板根据检测到的位置设置在正确的位置。 以这种方式，基板在载体上的定位以几微米或更小的精度实现，并且传输时间，基板污染，另外降低了成本。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2012160760A

公开(公告)日：2012-08-23

申请号：JP2012112394

申请日：2012-05-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MERTENS JEROEN JOHANNES SOPHIA MARIA ,  DONDERS SJOERD NICOLAAS L ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  VAN DER NET ANTONIUS J ,  TEUNISSEN FRANCISCUS JOHANNES HERMAN MARIA ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MARIA ,  VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  VAN GOMPEL EDWIN AUGUSTINUS MATHEUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an improved system and method for evacuating mixtures of liquid and gas from components in a lithographic apparatus.SOLUTION: An evacuation system configured to draw a mixture of liquid and gas from a region is provided. The evacuation system comprises a two-phase compatible pump, and a liquid/gas homogenizer to provide the mixture to the two-phase compatible pump. The liquid/gas homogenizer comprises a holding tank and a porous block, the porous block configured to homogenize the mixture by suspension of fine gas bubbles in a liquid.

Abstract translation: 要解决的问题：提供一种用于从光刻设备中的组件排出液体和气体的混合物的改进的系统和方法。 解决方案：提供了一种构造成从区域中抽出液体和气体混合物的抽空系统。 抽空系统包括两相兼容的泵和液/气均化器，以将混合物提供给两相兼容的泵。 液体/气体均化器包括容纳槽和多孔块，所述多孔块被配置为通过将细小气泡悬浮在液体中使混合物均匀化。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012032825A

公开(公告)日：2012-02-16

申请号：JP2011208936

申请日：2011-09-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VISSER HUIBERT ,  MARTINUS HENDRIKS HENDRIKS FUCHS ,  BORCHERT KRUIZINGA ,  STREEFKERK BOB ,  TINNEMANS PATRICIUS ALOYSIUS J ,  ERWIN JOHN VAN ZWET ,  ROLAND MICHOLAS MARIA FAHNER ,  MARCUS HEELALDUS HENDRICKS MEYELINK ,  NICHOLAS CORNELIUS JOHANNES VAN DER BURG ,  HAL VAN HIMBERGEN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70516

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for ensuring an easier use of an array of individually controllable elements in a lithographic apparatus.SOLUTION: The present invention relates to an apparatus and a method used to calibrate an array of individually controllable elements in a lithographic apparatus. A calibration unit can switch between a first state in which modulated radiation beam enters into a projection system for projecting the modulated radiation beam onto a substrate, and a second state in which a portion of the modulated radiation beam is inspected by the calibration unit. The calibration unit generates or updates calibration data, based on inspection result of the modulated radiation beam. An array controller uses the calibration data to provide control signals to elements of the array of individually controllable elements. These elements are configured to respond to the control signals.

Abstract translation: 要解决的问题：提供一种用于确保在光刻设备中更容易使用单独可控元件阵列的系统和方法。 解决方案：本发明涉及用于校准光刻设备中独立可控元件阵列的装置和方法。 校准单元可以在调制的辐射束进入用于将调制的辐射束投影到衬底上的投影系统的第一状态和第二状态之间切换，其中调制的辐射束的一部分被校准单元检查。 校准单元根据调制辐射束的检查结果生成或更新校准数据。 阵列控制器使用校准数据向各个可控元件阵列的元件提供控制信号。 这些元件被配置为响应控制信号。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2009302549A

公开(公告)日：2009-12-24

申请号：JP2009174603

申请日：2009-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BASELMANS JOHANNES JACOBUS MAT

IPC: H01L21/027

CPC classification number: G03F7/70191 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/70508

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and method that more efficiently and effectively performs maskless lithography. SOLUTION: The apparatus and method comprise a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams of radiation. The patterning device modulates the sub-beams of radiation to substantially generate a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that includes only spatial frequency components below a selected threshold frequency. The data manipulation device generates a control signal comprising spot exposure intensities to be generated by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供更有效和更有效地执行无掩模光刻的装置和方法。 解决方案：该装置和方法包括投影系统，图案形成装置，低通滤波器和数据操作装置。 投影系统将辐射束投射到基板上作为辐射子束阵列。 图案形成装置调制辐射的子光束，以基本上在衬底上产生所要求的剂量图案。 低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包括低于选定阈值频率的空间频率分量的限幅目标剂量图案。 数据处理装置基于斑点曝光强度对频率削减的目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009163242A

公开(公告)日：2009-07-23

申请号：JP2008323792

申请日：2008-12-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VISSER HUIBERT ,  HENDRICUS HOEKS MARTINUS H ,  KRUIZINGA BORGERT ,  STREEFKERK BOB ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN ZWET ERWIN JOHN ,  ROLAND NICOLAS MARIA FAHNER ,  MEIJERINK MARCUS GERHARDUS HEN ,  NICOLAS CORNELIS JOHANNES VAN ,  HAR VAN HIMBERGEN

IPC: G03F7/20 ,  G02B26/08 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70516

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for more easily using an array of individually controllable elements in a lithographic apparatus. SOLUTION: The present invention relates to an apparatus and a method used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate, and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements which are subsequently configured in response to the control signals. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在光刻设备中更容易地使用独立可控元件阵列的系统和方法。 解决方案：本发明涉及一种用于校准光刻设备内单独可控元件阵列的设备和方法。 校准单元可以在第一状态和第二状态之间进行切换，其中调制的辐射束通过投影系统以将经调制的辐射束投影到衬底上，以及第二状态，其中调制的辐射束的一部分通过校准 单元。 校准单元产生校准数据，或者替代地，基于调制的辐射束的检查更新校准数据。 阵列控制器使用校准数据来向单独可控元件的阵列的元件提供控制信号，随后可以响应于控制信号而被配置。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008070866A

公开(公告)日：2008-03-27

申请号：JP2007196523

申请日：2007-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  TINNEMANS PATRICIUS ALOYSIUS J

IPC: G03F7/20 ,  G02B26/06 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70283

Abstract: PROBLEM TO BE SOLVED: To independently control multiple parameters of a patterned beam.
SOLUTION: The present invention provides a patterning device configured to pattern a beam of radiation comprising a controller and an array of stepped mirrors. The array comprises a plurality of sets of four of the stepped mirrors that are controlled with respect to each other by the controller. Adjacent ones of the stepped mirrors in each of the sets have perpendicular axes of rotation and perpendicular steps. In one example, the patterning device is used to pattern the beam of radiation, which patterned beam is projected onto an object. For example, the object can be a substrate (e.g. semiconductor substrate or flat panel display substrate) or a display device.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：独立地控制图案化束的多个参数。 解决方案：本发明提供一种图案形成装置，其构造成对包括控制器和阶梯式反射镜阵列的辐射束进行图案化。 阵列包括由控制器相对于彼此控制的多组四个阶梯式反射镜组。 每组中相邻的阶梯式反射镜具有垂直的旋转轴线和垂直方向的轴线。 在一个示例中，图案形成装置用于对辐射束进行图案化，该图案束被投影到物体上。 例如，该物体可以是基板（例如半导体基板或平板显示基板）或显示装置。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008047873A

公开(公告)日：2008-02-28

申请号：JP2007161319

申请日：2007-06-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TINNEMANS PATRICIUS ALOYSIUS J

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70433 ,  G03F7/70291 ,  G03F7/705 ,  G03F9/7026

Abstract: PROBLEM TO BE SOLVED: To provide a focusing system having no unmaching point between image forming points even in an unevenness of a substrate. SOLUTION: A lithographic apparatus is provided with an illumination optical system IL, an individually controllable element array PD, a projection optical system PS, and a control system. The illumination optical system IL adjusts a radiation beam. The individually controllable element PD array modulates the cross section of the radiation beam. The projection optical system PS projects the modulated radiation beam on a target portion. The control system calculates a pattern to be formed on the individually controllable element array PD. The calculation includes adjusting the pattern so that focal plane can be shifted in response to a separation distance to be measured between the target and the focal plane of the projection optical system PS. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：即使在基板的不均匀性中，也可以提供一种在图像形成点之间没有脱色点的聚焦系统。 光刻设备设置有照明光学系统IL，独立可控元件阵列PD，投影光学系统PS和控制系统。 照明光学系统IL调节辐射束。 独立可控元件PD阵列调制辐射束的横截面。 投影光学系统PS将调制的辐射束投影到目标部分上。 控制系统计算要在单独可控元件阵列PD上形成的图案。 计算包括调整图案，使得可以响应于在投影光学系统PS的目标和焦平面之间测量的间隔距离来移动焦平面。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007298981A

公开(公告)日：2007-11-15

申请号：JP2007103857

申请日：2007-04-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TINNEMANS PATRICIUS ALOYSIUS J

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70508

Abstract: PROBLEM TO BE SOLVED: To provide datapath architecture that reduces the impact of quantization noise arising from digitization of a data stream representing a desired dose pattern.
SOLUTION: A first datapath section 520 converts data defining a required dose pattern into a stream of setpoint data defining a desired sequence of setpoints for an array of individually controllable elements. A second datapath section 530 stores and reproduces the stream of setpoint data for the array of individually controllable elements. A quantization device 512 digitizes the stream of setpoint data before it is passed from the first datapath section 520 to the second datapath section 530. The first datapath section 520 further comprises a noise controller 506 configured to incorporate noise of a predetermined magnitude into the stream of setpoint data before the setpoint data stream is digitized by the quantization device 512.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供数据路径架构，其减少由代表期望剂量模式的数据流的数字化引起的量化噪声的影响。 解决方案：第一数据通路部分520将定义所需剂量模式的数据转换成定义数据流的流数据，该数据流数据定义用于独立可控元件阵列的所需设定点序列。 第二数据路径部分530存储和再现用于独立可控元件阵列的设定点数据流。 设定点数据流在从第一数据通路部分520通过到第二数据路径部分530之前，将设定数据流数字化。第一数据通路部分520还包括噪声控制器506，其被配置成将预定大小的噪声并入到 设定点数据流之前的设定点数据被量化装置512数字化。版权所有：（C）2008，JPO＆INPIT

公开(公告)号：JP2007116148A

公开(公告)日：2007-05-10

申请号：JP2006272435

申请日：2006-10-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  VENEMA WILLEM JURRIANUS ,  MARIA ZAAL KOEN JACOBUS JOHANN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70725 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system and method used for compensating a thermal affection in a lithography apparatus. SOLUTION: This system comprises a device for patterning, a projection stem, a controller of the substrate position, and a part for compensating the inflation of a substrate position base. The device for patterning controls an irradiated beam. The projection stem projects the controlled irradiated beam on a target part of the substrate. The controller of the substrate position moves the substrate relative to the projection stem via a plurality of exposing positions sequentially. The part for compensating the inflation of the substrate position base interacts with the controller of the substrate position to control the exposing position, to thereby compensate at least partially a geometric change induced by a heat of at least one of the substrate and the projection stem. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供用于补偿光刻设备中的热感受的系统和方法。 解决方案：该系统包括用于图案化的装置，投影杆，衬底位置的控制器和用于补偿衬底位置基座的膨胀的部件。 用于图案的装置控制照射的束。 投影杆将受控照射的光束投影到基板的目标部分上。 基板位置的控制器经由多个曝光位置相对于投影杆移动基板。 用于补偿衬底位置基底的膨胀的部分与衬底位置的控制器相互作用以控制曝光位置，从而至少部分补偿由衬底和突起杆中的至少一个的热引起的几何变化。 版权所有（C）2007，JPO＆INPIT