Preparation of alkyl esters of (meth) acrylic acid

    公开(公告)号:SG50766A1

    公开(公告)日:1998-07-20

    申请号:SG1996010697

    申请日:1996-09-27

    Applicant: BASF AG

    Abstract: A process for the prodn. of (1-4C alkyl) (meth)acrylate esters (AM/AE) from esters of formula (I) and opt. esters of formula (II), in which R = H or Me; R , R = 1-4C alkyl; n = 0 or more. The process comprises reaction in the liq. phase under reduced pressure in presence of acid, with continuous removal of cleavage prods. Also claimed is a process for the prodn. of (AM/AE) by the acid-catalysed esterification of 1-4C alkanols with (meth)acrylic acid, in which by-prods. (I) and (II) are sepd. from the prod. mixt. and subjected to the above cleavage process, and the cleavage prods. are continuously removed and returned to the esterification process.

    32.
    发明专利
    未知

    公开(公告)号:DE10341724A1

    公开(公告)日:2005-04-21

    申请号:DE10341724

    申请日:2003-09-10

    Applicant: BASF AG

    Abstract: A description is given of an alkanol-free alkoxylate of the general formula (I) CnH2n+1O(A)x(B)yR (I) where R is C1-6 alkyl or benzyl A is ethyleneoxy B is C3-6 alkyleneoxy or mixtures thereof, it being possible for groups A and B to be in random distribution, in alternation or in the form of two or more blocks in any order, n is an integer in the range from 4 to 8 x is a number in the range from 0 to 25 y is a number in the range from 0 to 10 and x+y is at least 3.

    37.
    发明专利
    未知

    公开(公告)号:ES2190116T3

    公开(公告)日:2003-07-16

    申请号:ES98954254

    申请日:1998-09-05

    Applicant: BASF AG

    Abstract: A process is described for copolymerizing ethylene with vinyl esters and, if desired, with further vinylic comonomers in a tube reactor at pressures of from 500 to 4000 bar and at not more than 220° C., which comprises initiating the free-radical polymerization at at least two locations of the tube reactor by adding a catalyst/initiator and adjusting the temperature profile within the reactor such that the temperature maxima downstream of the initiation locations are from 150 to 220° C. and differ by less than ±10° C. from one another.

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