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公开(公告)号:DE3540950A1
公开(公告)日:1987-05-21
申请号:DE3540950
申请日:1985-11-19
Applicant: BASF AG
Inventor: KOCH HORST DR , ZIEGLER WALTER DR
IPC: C08F2/48 , C08F2/46 , G03F7/004 , G03F7/027 , G03F7/028 , G03F7/032 , G03F7/033 , G03F7/038 , H01L21/027 , G03C1/68 , G03F7/10 , G03F7/26 , C08L23/08 , C08L31/00 , C08L33/00 , C08J3/24 , C08J3/28 , C08F210/02 , C08F218/04 , C08F220/06
Abstract: Mixtures crosslinkable by photopolymerization and based on binders, photopolymerizable monomers compatible therewith and photoinitiators, contain as binders copolymers prepared from (a1) from 30 to 70% by weight of ethylene, (a2) from 5 to 40% by weight of (meth)acrylic acid and (a3) from 5 to 50% by weight of one or more vinyl ester, vinyl ether, (meth)acrylic acid ester and/or (meth)acrylamide.
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公开(公告)号:DE58909538D1
公开(公告)日:1996-02-01
申请号:DE58909538
申请日:1989-09-22
Applicant: BASF AG
Inventor: KOCH HORST DR , KURTZ KARL-RUDOLF DR , TELSER THOMAS DR , ZUERGER MANFED
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公开(公告)号:DE3851126D1
公开(公告)日:1994-09-22
申请号:DE3851126
申请日:1988-10-25
Applicant: BASF AG
Inventor: KURTZ KARL-RUDOLF DR , KOCH HORST DR , TELSER THOMAS DR , BACH HELMUT DR
Abstract: Light-sensitive registration material comprising… A) a photopolymerisable relief-forming layer which, after imagewise exposure to actinic light, can be developed with a liquid developer,… B) a covering layer which adheres firmly to the photopolymerisable relief-forming layer (A), is soluble or swellable in the liquid developers and is composed of polymers forming rupture-resistant films, and… C) a covering sheet which can readily be peeled off the covering layer (B),… the covering layer (B) containing specific tertiary amines and/or amides and/or specific quaternary ammonium salts of the type according to the claims and defined in greater detail. … A process is also provided for producing photopolymerisable printing plates, relief plates or photoresists using this registration material.
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公开(公告)号:DE58902095D1
公开(公告)日:1992-10-01
申请号:DE58902095
申请日:1989-01-28
Applicant: BASF AG
Inventor: KURTZ KARL-RUDOLF DR , KOCH HORST DR , TELSER THOMAS DR , ZUERGER MANFRED
Abstract: A novel sheet-like light-sensitive recording material I with at least one photopolymerisable, relief-forming layer (A) which, relative to (A), contains a1) 20 to 99.499 % by weight of at least one polymeric binder from the group comprising random ethylene/propylene/alkadiene terpolymers of an ethylene content of from 40 to 80 % by weight and a double bond content of 2 to 20 olefinic double bonds per 1000 carbon atoms, a2) 0.001 to 10 % by weight of at least one photopolymerisation initiator, a3) 0.5 to 50 % by weight of at least one monomer which is compatible with the binder (a1) and contains at least one photopolymerisable olefinic double bond, and a4) 0 to 40 % by weight of at least one auxiliary, by means of which the property pattern is varied, and the production of novel relief plates, relief printing plates and photoresists from these novel recording materials I and novel flexographic printing plates which have been produced from the recording materials I.
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公开(公告)号:DE3780974D1
公开(公告)日:1992-09-17
申请号:DE3780974
申请日:1987-01-24
Applicant: BASF AG
Inventor: KOCH HORST DR , ZIEGLER WALTER DR
IPC: C08F2/48 , C08F8/00 , C08F8/14 , C08F8/30 , C08F8/34 , C08F290/00 , C08F290/12 , C08F299/00 , G03F7/033
Abstract: The polymers (I), in form of acids or their salts, comprise A) copolymer of a1) 30-70 pts.wt. ethylene, a2) 5-40 pts.wt. acrylic and/or methacrylic acid, a3) 5-40 pts.wt. one or more vinyl esters, vinyl ethers, esters of (meth)acrylic acid, acrylamide and/or methacrylamide, and B) lateral residues, introduced therein by polymer-analogous reaction, of formula -CH2.CH(X).CH2Y.C(R'):CH2 (where X=OH, amino, or SH; Y=ester, amide, ether, or 1-10C alkylene gp.; R'=H or Me) and opt. C) further lateral residues, introduced by polymer-analogous reaction of formula -CH2.CH(X)R2 (where R2=polar gp., H, or a further gp. X). Pref. A) consists of 40-60 pts.wt. a1), 8-30 pts.wt. a2), and 20-40 pts.wt. a3). (I) contain C) where R=omega-alkyl-poly(ethylene oxide)-alpha-oxyl residue. (I) is a metal, ammonium, or hydrazinium salt, or salt of a polyfunctional amine. a3) is vinyl acetate, vinyl Bu ether, n-Bu, 2-ethylhexyl, or dicylopentadienyl acrylate, and/or omega-methyl-poly(ethylene oxide)-alpha-yl acrylate (II).
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公开(公告)号:AT79382T
公开(公告)日:1992-08-15
申请号:AT87100994
申请日:1987-01-24
Applicant: BASF AG
Inventor: KOCH HORST DR , ZIEGLER WALTER DR
IPC: C08F2/48 , C08F8/00 , C08F8/14 , C08F8/30 , C08F8/34 , C08F290/00 , C08F290/12 , C08F299/00 , G03F7/033
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公开(公告)号:DE3871553D1
公开(公告)日:1992-07-09
申请号:DE3871553
申请日:1988-02-20
Applicant: BASF AG
Inventor: KOCH HORST DR , SCHUPP HANS DR , SCHWALM REINHOLD DR
Abstract: Light-sensitive copying material for producing printing plates or resist patterns has a photopolymerisable copying layer on a dimensionally stable substrate, which can be developed with aq. alkali or organic solvent. This contains a polymeric binder, which is soluble or dispersible in aq. alkaline medium or organic solvent, low mol. ethylenically unsatd. photopolymerisable organic cpd(s), photopolymerisation initiator(s), and opt. other additives. The novelty is that the binder consists of film-forming copolymer(s) (I) with multiphase morphology, in which at least one phase has a Tg below room temp. and at least one other phase of Tg above room temp. (I) is produced by free radical copolymerisation of macromer(s) (II) with other olefinically unsatd. copolymerisable organic cpd(s) (III).
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公开(公告)号:DE3905947A1
公开(公告)日:1990-09-06
申请号:DE3905947
申请日:1989-02-25
Applicant: BASF AG
Inventor: KURTZ KARL-RUDOLF DR , KOCH HORST DR , TELSER THOMAS DR
IPC: C08F2/44 , C08F2/50 , C08L23/08 , C08L23/16 , C08L33/02 , C09D123/02 , C09D123/16 , C09J123/16 , G02B1/04
Abstract: The novel optically transparent polymer alloy contains A) at least one elastomer containing copolymerised ethylene and propylene, and B) at least one elastomer containing copolymerised ethylene and (meth)acrylic acid, and is used as a moulding composition or for the production of moulding compositions, mouldings, films, coatings, adhesives and photosensitive recording materials.
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公开(公告)号:AT55498T
公开(公告)日:1990-08-15
申请号:AT86114916
申请日:1986-10-27
Applicant: BASF AG
Inventor: KOCH HORST DR , ZIEGLER WALTER DR
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公开(公告)号:AT54210T
公开(公告)日:1990-07-15
申请号:AT86115918
申请日:1986-11-17
Applicant: BASF AG
Inventor: HOFFMANN GERHARD DR , KOCH HORST DR , SCHULZ GUENTHER DR
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