公开(公告)号：JP2007051299A

公开(公告)日：2007-03-01

申请号：JP2006272565

申请日：2006-10-04

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： MIYOSHI KAZUTAKA ,  ARAI TAKASHI

IPC: C08F20/28 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To obtain a polymer compound which does not exert bad effect on resist performance when it is used as a resin component of a resin composition for a photoresist. SOLUTION: This polymer compound for a photoresist is what becomes alkali-soluble by the action of an acid, and its monomer content as an impurity in the polymer is not higher than 2 wt.%. This polymer compound for a photoresist is produced, for example, by supplying a solution of the polymer compound for a photoresist which becomes alkali-soluble by the action of an acid into a poor solvent through a nozzle of not greater than 6 mmϕ diameter and being precipitated or reprecipitated. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了获得当用作光致抗蚀剂树脂组合物的树脂组分时，不会对抗蚀性能产生不良影响的聚合物化合物。 解决方案：用于光致抗蚀剂的高分子化合物通过酸的作用变成碱溶性，其在聚合物中作为杂质的单体含量不高于2重量％。 用于光致抗蚀剂的这种高分子化合物例如可以通过使用通过酸的作用使碱溶性的光致抗蚀剂的溶液通过不大于6mmφ的喷嘴向不良溶剂提供溶液，并且 沉淀或再沉淀 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006070167A

公开(公告)日：2006-03-16

申请号：JP2004255497

申请日：2004-09-02

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： ARAI TAKASHI

IPC: C08F6/00 ,  C08F20/18 ,  C08F20/28 ,  C08F32/00 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a polymer compound for photoresists for immersion exposure which forms resist films excellent in water resistance.
SOLUTION: The manufacturing process of the polymer compound for photoresists for immersion exposure comprises precipitating, using an organic solvent, a polymer containing a monomer unit having a group part of which is eliminated with an acid to show alkaline solubility and re-precipitating, rinsing or re-pulping it using an aqueous solvent. A polymer containing a monomer unit having a group part of which is eliminated with an acid to show alkaline solubility and a monomer unit adhering to a substrate may be used for the polymer subjected to precipitation.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于浸渍曝光的光致抗蚀剂的聚合物化合物，其形成耐水性优异的抗蚀剂膜。 解决方案：用于浸渍曝光的光刻胶用高分子化合物的制造方法包括使用有机溶剂使含有其一部分被除去的单体单元的聚合物与酸一起析出以显示碱溶性并重新沉淀 ，使用水性溶剂冲洗或重新制浆。 含有其一部分的单体单元的聚合物用酸去除以显示碱溶性，并且可以将使用沉淀的聚合物使用附着于基材上的单体单元。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2004252096A

公开(公告)日：2004-09-09

申请号：JP2003041752

申请日：2003-02-19

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： ARAI TAKASHI ,  KURIHARA HAJIME ,  ITOKAZU TERUO

IPC: G03F7/039 ,  C08F20/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a resin composition for a photoresist having improved alkali solubilization function without impairing adhesion to a substrate or dry etching resistance. SOLUTION: The resin composition for a photoresist comprises a polymer X comprising 1 to COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2003206315A

公开(公告)日：2003-07-22

申请号：JP2002003936

申请日：2002-01-10

Applicant: DAICEL CHEM

Inventor： ARAI TAKASHI ,  SHUDO MASASHI ,  NISHIMURA MASAMICHI

IPC: G03F7/039 ,  C08F6/06 ,  C08F20/18 ,  C08F20/28

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a polymeric compound for a photoresist highly soluble in a resist solvent comprising a glycol-based solvent, an ester-based solvent, a ketone-based solvent or the like. SOLUTION: The method for manufacturing a polymeric compound for a photoresist exhibiting changes in solubility in an alkali by an action of an acid comprises a step for polymerization using as a polymerization solvent one or more solvents selected among a glycol-based solvent, an ester-based solvent and a ketone-based solvent followed by a filtration treatment of the polymerization reaction liquid containing the resultant polymer. Preferably, the polymerization solvent is at least one selected among propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, ethyl lactate and methyl isobutyl ketone. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2003020312A

公开(公告)日：2003-01-24

申请号：JP2001209601

申请日：2001-07-10

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： MIYOSHI KAZUTAKA ,  ARAI TAKASHI

IPC: G03F7/039 ,  C08F20/28

Abstract: PROBLEM TO BE SOLVED: To obtain a particulate polymeric compound which does not adversely affect resist performance when used as the resin component of a photoresist resin composition. SOLUTION: The particulate photoresist compound polymeric compound is a photoresist polymeric compound which becomes alkali-soluble by the action of an acid, and has a volume average particle diameter in the range of 20-300 μm and, simultaneously, >=90 vol.%, based on the entire particles, particles having a particle diameter of 10-500 μm. This particulate photoresist polymeric compound can be produced by feeding a solution of a photoresist polymeric compound which becomes alkali-soluble by the action of an acid into a poor solvent through a nozzle having a bore diameter of

Abstract translation: 要解决的问题：为了获得当用作光致抗蚀剂树脂组合物的树脂组分时，不会对抗蚀性能产生不利影响的颗粒聚合物。 解决方案：颗粒状光致抗蚀剂复合聚合物是光致抗蚀剂聚合物，其通过酸的作用变成碱溶性，体积平均粒径在20-300μm的范围内，同时≥90体积％ 基于整个颗粒，粒径为10-500μm的颗粒。 这种颗粒状光致抗蚀剂聚合物可以通过将通过酸的作用变成碱溶性的光致抗蚀剂聚合物的溶液通过孔直径<=6mmφ的喷嘴供给到不良溶剂中来进行，以产生沉淀或再沉淀。

公开(公告)号：JP2002251009A

公开(公告)日：2002-09-06

申请号：JP2001047682

申请日：2001-02-23

Applicant: DAICEL CHEM

Inventor： ARAI TAKASHI

IPC: G03F7/039 ,  C07C67/58 ,  C07C69/013 ,  C07C69/533 ,  C07C69/54 ,  C08F20/00

Abstract: PROBLEM TO BE SOLVED: To obtain a single-peaked narrow-disperse polymer with good reproducibility when a polymer used for a resin for a photoresist is produced by polymerization and to enable the microfabrication of a semiconductor with a resin for a photoresist using such a polymer. SOLUTION: The polymerizable unsaturated compound for a photoresist used as a monomer of a high molecular compound for the photoresist has

公开(公告)号：JPH11349642A

公开(公告)日：1999-12-21

申请号：JP15742498

申请日：1998-06-05

Applicant: DAICEL CHEM

Inventor： ARAI TAKASHI ,  IWATSUKI AKIHIRO ,  NAGANO SHINYA

IPC: C08F279/02

Abstract: PROBLEM TO BE SOLVED: To obtain a rubber-modified styrene resin composition which yields a molded part possessing well balanced impact resistance and surface gloss. SOLUTION: This composition contains a rubber-modified styrene resin which satisfies the following three requirements. (A) The area average particle size of rubbery polymer dispersed particles is from 0.1 to 2.0 μm, (B) the number average molecular weight (Mn ) of polystyrene chains grafted to rubber polymers is within the range of from 60 to 100% of the number average molecular weight (Mn ) of a continuous phase polystyrene and (C) the average chain number of polystyrene chains grafted to rubber polymers is from 1.3 to 3.0 per rubber polymer chain.

公开(公告)号：JPH06195780A

公开(公告)日：1994-07-15

申请号：JP35756892

申请日：1992-12-24

Applicant: SUMITOMO CHEMICAL CO ,  SUMITOMO METAL MINING CO ,  DAICEL CHEM

Inventor： ARAI TAKASHI ,  TAKATSUKA YUJI ,  KAWABUCHI AKIRA

IPC: G11B11/10 ,  G11B11/105

Abstract: PURPOSE:To maintain an antistatic function for a sufficient period by incorporating the superfines of a 10-70wt.% conductive metal oxide in an organic-resin protective layer. CONSTITUTION:A transparent dielectric layer 2, a magneto-optic recording layer 3, a transparent dielectric layer 4 and a reflecting film 5 are deposited successively through a sputtering method as thin-films. A section just above the reflecting film 5 is coated uniformly with an ultraviolet curing type resin through a spin coating method as a first organic-resin protective layer 6, and the resin is cured through the irradiation of ultraviolet rays. A section just above the protective layer 6 is coated uniformly with a resin, in which the superfines 8 of a conductive oxide are kneaded with isofluorocarbon in the content of 10-70wt.% through the spin coating method, and the resin is dried, thus forming a second organic-resin protective layer 7. Accordingly, the protective layer 7 has conductivity, the surface of an optical disk is not charged and dust is not attracted, and the protective layers 6, 7 are transparent, and normal pinhole inspection can be carried out. Consequently, an antistatic function is obtained, and the function can be maintained for a sufficient period.

公开(公告)号：JPH05225630A

公开(公告)日：1993-09-03

申请号：JP2643692

申请日：1992-02-13

Applicant: DAICEL CHEM ,  SUMITOMO METAL MINING CO ,  SUMITOMO CHEMICAL CO

Inventor： YOKOYAMA HIROYUKI ,  KAWABUCHI AKIRA ,  ARAI TAKASHI ,  HIRAKAWA MANABU

IPC: G11B11/10 ,  C23C14/06 ,  C23C14/34 ,  G11B11/105

Abstract: PURPOSE:To protect a recording film against the destruction of data in magnetic field modulation recording and to smooth floating and lowering of a magnetic head by providing protective films having uniform and adequate surface roughness and strength. CONSTITUTION:There is a reflection film 5 consisting of metal on the recording film 3 and there are the first protective film 6 and the second protective film 7 thereon. The first protective film of two layers of the protective films is relatively small in the surface roughness and therefore the structure constituting the film is finer, is consequently high in density and strong and is suitable for protecting the recording film. On the other hand, the second protective film is relatively large in the surface roughness and, therefore the structure constituting the film is large. While the density of the film is low, the area in contact with the slider surface of a magnetic head is small and, therefore the friction force and attraction force are small. The characteristic preferable for CSS are thus obtd. Then, the recording film is protected against the destruction of the data and the floating and lowering of the magnetic head at the time of CSS are smoothed.

公开(公告)号：JPH05163564A

公开(公告)日：1993-06-29

申请号：JP35029791

申请日：1991-12-09

Applicant: SUMITOMO CHEMICAL CO ,  SUMITOMO METAL MINING CO ,  DAICEL CHEM

Inventor： ARAI TAKASHI ,  MATSUMOTO KATAKO

IPC: C23C14/06 ,  C23C14/58

Abstract: PURPOSE:To suppress the damage of an optical information recording medium adopting a magnetic field modulation system due to contact with a floating magnetic header used in the system. CONSTITUTION:When a recording layer 2 and a protective layer 3 of org. resin are successively laminated on a substrate 1 to obtain an optical information recording medium, a lubricant layer 4 is further formed on the protective layer 3. This lubricant layer 4 is made of fluorocarbon lubricating oil having one or more active polar groups and based on fluorine and carbon.