METHOD FOR MANUFACTURING POLYMERIC COMPOUND FOR PHOTORESIST, AND RESIN COMPOSITION FOR PHOTORESIST

    公开(公告)号:JP2003206315A

    公开(公告)日:2003-07-22

    申请号:JP2002003936

    申请日:2002-01-10

    Applicant: DAICEL CHEM

    Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a polymeric compound for a photoresist highly soluble in a resist solvent comprising a glycol-based solvent, an ester-based solvent, a ketone-based solvent or the like. SOLUTION: The method for manufacturing a polymeric compound for a photoresist exhibiting changes in solubility in an alkali by an action of an acid comprises a step for polymerization using as a polymerization solvent one or more solvents selected among a glycol-based solvent, an ester-based solvent and a ketone-based solvent followed by a filtration treatment of the polymerization reaction liquid containing the resultant polymer. Preferably, the polymerization solvent is at least one selected among propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, ethyl lactate and methyl isobutyl ketone. COPYRIGHT: (C)2003,JPO

    TEAR STRENGTH MEASURING DEVICE
    2.
    发明专利

    公开(公告)号:JPH0682352A

    公开(公告)日:1994-03-22

    申请号:JP26086192

    申请日:1992-09-02

    Applicant: DAICEL CHEM

    Abstract: PURPOSE:To rapidly and accurately measure tear strength making it correspond to actual tearing. CONSTITUTION:A tear strength measuring device is attached to rods 3, 5 and equipped with a pair of chucking members 8a, 8b for holding a film or sheet like sample 6 and a motor 2 for rotating one rod 3. The torque acting on the sample accompanying the rotation of the chucking member 8a is detected with a strain gauge connected to the other rod 5 and the tension (normal stress) acting on the sample is detected with the strain gauge and the respective detected values are recorded on a recorder 11.

    GAS GENERATING AGENT COMPOSITION AND GAS GENERATING MEMBER

    公开(公告)号:JP2003146790A

    公开(公告)日:2003-05-21

    申请号:JP2001350487

    申请日:2001-11-15

    Applicant: DAICEL CHEM

    Abstract: PROBLEM TO BE SOLVED: To generate microgases with high gas generation power from microareas and to intermittently shut off or change the direction of the liquid flow continuously discharged from a nozzle with high accuracy. SOLUTION: The gas generating composition is composed of a gas generating agent and a light absorbent and can generate the gases in the microareas by microheating sources. The gas generating member can be obtained by forming a tight contact layer 2 and a gas generating layer 3 containing the gas generating agent (nitrocellulose, etc.), and the light absorbent (carbon black, etc.), and having >=20 μm thickness on the surface of a supporting body 1. The tight contact layer 2 firmly sticks the supporting body 1 and the gas generating layer 3. A coating layer 4 may be formed on the surface of the gas generating layer 3 in order to hold gaseous pressure.

    Apparatus and method for evaluation of tearing property of film
    4.
    发明专利
    Apparatus and method for evaluation of tearing property of film 审中-公开
    用于评估电影的声音属性的装置和方法

    公开(公告)号:JP2003014600A

    公开(公告)日:2003-01-15

    申请号:JP2001203439

    申请日:2001-07-04

    Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and a method for evaluation wherein the sticking strength, the tearing strength, the tearing property and the like of a film or a sheet can be evaluated and tested with a satisfactory correlation property with an actual hand tearing evaluation or a transplantation test and quantitatively.
    SOLUTION: The evaluation apparatus for the tearing property of a film is provided with a sample base which comprises a flat plate with a formed circular hole, a fixation means by which the film arranged so as to cover the circular hole is fixed onto the sample base, a conical sticking implement which comprises a tip movable toward the surface of the film on the central axis of the circular hole and a movement-stress measuring means by which the tip of the sticking implement is moved to the side of the film at a prescribed movement speed and which measures a movement amount and a stress applied to the sticking implement, the film is stuck and torn by the tip, and the tearing property of the film is evaluated.
    COPYRIGHT: (C)2003,JPO

    Abstract translation: 要解决的问题:提供一种用于评价的装置和方法,其中可以以与实际手撕裂的令人满意的相关性来评价和测试膜或片的粘着强度,撕裂强度,撕裂性等 评估或移植测试并定量。 解决方案:用于膜的撕裂性能的评估装置设置有包括具有形成的圆形孔的平板的样品基底,将覆盖圆形孔的膜固定在其上的固定装置固定在样品基底上 一个圆锥形的粘贴工具,它包括一个在圆形孔的中心轴线上能朝着薄膜表面移动的尖端,以及一个运动应力测量装置,通过该运动应力测量装置,该粘贴工具的尖端以规定的方式移动到胶片的侧面 运动速度,并且测量施加到粘贴工具的移动量和应力,膜被尖端卡住和撕裂,并且评估膜的撕裂性能。

    TESTER FOR CHEMICAL RESISTANCE
    5.
    发明专利

    公开(公告)号:JPH0658866A

    公开(公告)日:1994-03-04

    申请号:JP23780192

    申请日:1992-08-12

    Applicant: DAICEL CHEM

    Abstract: PURPOSE:To rapidly and accurately measure the chemical resistance with a signal test piece aver an extended period. CONSTITUTION:The device for examining chemical resistance of a test piece is provided with a vessel 5 which houses a test liquid, a motor 10 and a stirring brade 1 which stirs the test liquid, a holder 8 which holds the test piece 6 in the test liquid, an optical displacement sensor which detects test piece's displacement held with the holder 8 in a non-contact manner, and a display device 14 which displays test piece's displacement based upon the detection signal from the sensor. The displacement of the test piece may be calculated at an calculation circuit based on the size of the test piece and the detection signal from the optical displacement sensor, and then displayed on the display means. With this device, it is not required that multiple test pieces are prepared or excessive test liquid stuck to the test piece is removed and then the changes of weight and dimension are measured. Displacement of the test piece are continuously measured.

    POLYMERIC COMPOUND FOR RESIST AND RESIST COMPOSITION

    公开(公告)号:JP2001278919A

    公开(公告)日:2001-10-10

    申请号:JP2000093286

    申请日:2000-03-30

    Applicant: DAICEL CHEM

    Abstract: PROBLEM TO BE SOLVED: To provide a polymeric compound for a resist having a superior film forming property as well as keeping resist characteristics such as an alkali- solubility and an adhesiveness to substrate. SOLUTION: The polymeric compound for a resist comprises a repetition unit having an acid-eliminating group, a repetition unit having an adhesion group to substrate, and a repetition unit expressed by formula (1), wherein R1 represents a hydrogen atom or a methyl group, R2 represents a 3-8C alkyl group (provided that a tertiary alkyl group is excluded). The repetition unit expressed by formula (1) is about 0.01-30 mol % of all the repetition units composing a polymer.

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