Abstract:
A catalyst for producing a poly- alpha -olefin which comprises a metallocene compound containing an element of group IVA bonded to an organic polymer containing an element of group IVB; and a process for producing a poly- alpha -olefin which comprises polymerizing an alpha -olefin in the presence of the above-described catalyst and also a specified aluminoxane as a co-catalyst.
Abstract:
A catalyst for producing a poly- alpha -olefin which comprises a metallocene compound containing an element of group IVA bonded to an organic polymer containing an element of group IVB; and a process for producing a poly- alpha -olefin which comprises polymerizing an alpha -olefin in the presence of the above-described catalyst and also a specified aluminoxane as a co-catalyst.
Abstract:
A catalyst for producing a poly- alpha -olefin which comprises a metallocene compound containing an element of group IVA bonded to an organic polymer containing an element of group IVB; and a process for producing a poly- alpha -olefin which comprises polymerizing an alpha -olefin in the presence of the above-described catalyst and also a specified aluminoxane as a co-catalyst.
Abstract:
A catalyst for producing a poly-* small Greek alpha *-olefin which comprises a metallocene compound containing an element of group IVA bonded to an organic polymer containing an element of group IVB; and a process for producing a poly-* small Greek alpha *-olefin which comprises polymerizing an * small Greek alpha *-olefin in the presence of the above-described catalyst and also a specified aluminoxane as a co-catalyst. The catalyst comprises a polysiloxane having pendent groups selected from cyclopentadiene, fluorene and indene linked to a transition metal halide such as zirconium chloride. The catalyst is prepared by reacting R 2 Si(Hal) 2 where R is cyclopentadienyl, fluorenyl or indenyl with water followed by addition of butyllithium and a transition metal halide.
Abstract:
PROBLEM TO BE SOLVED: To provide a method for preparing a resin composition for photoresist which is improved in alkali solubility without deteriorating adhesion to a substrate and dry etching resistance. SOLUTION: The method for preparing the resin composition for photoresist includes a step wherein a monomer mixture M Y including ≥61 mol% of a monomer corresponding to a repeating unit A2 which has an alicyclic skeleton and becomes alkali-soluble by the action of an acid to a mixed solution containing a polymer X containing 1 to Y (weight ratio) 75/25 to 99/1, and polymerization is conducted. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a resin which has good solubility to organic solvent when applied for a resin for resist and exhibits high etching resistance, a resist composition, and a semiconductor manufacturing method. SOLUTION: This polymer compound for photoresist has a monomer unit expressed by a formula (1). The polymer compound is polymerized while adding monomer solution and polymerization initiator solution to the solvent controlled at the polymerization temperature. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To obtain a polyolefin copolymer by introducing a high boiling point polymerizable compound into a poly-α-olefin to improve the properties of the polymer. SOLUTION: This poly-α-olefin copolymer has a repeating unit containing an alicyclic hydrocarbon or an aromatic hydrocarbon in the side chain. The method for producing a poly-α-olefin copolymer having a repeating unit containing an alicyclic hydrocarbon or an aromatic hydrocarbon in the side chain comprises copolymerizing an α-olefin with a polymerizable compound containing an alicyclic hydrocarbon or an aromatic hydrocarbon in the side chain in the presence of a compound expressed by the formula (1), R2R3MX2 (where R2 and R3 each represents a compound having a cyclopentadienyl ring and may be linked via a bi-valent hydrocarbon; M denotes a transition metal; and X denotes a halogen atom) and an auxiliary catalyst.
Abstract:
PROBLEM TO BE SOLVED: To obtain a polymeric compound for photoresist excellent in resist properties such as alkali solubility and adhesion to a substrate, especially, excellent in adhesion to a substrate. SOLUTION: The photoresist polymeric compound comprises a vinyl polymer obtained by a polymerization reaction using a polymerization initiator containing an oxygen-containing group or a substituted or unsubstituted amino group in the molecule. The polymerization initiator used is exemplified by an azoic radical polymerization initiator. Examples of the oxygen-containing groups include hydroxyl, carboxyl, substituted oxy, substituted oxycarbonyl, acyls, substituted or unsubstituted carbamoyl, hydroxyimino, substituted oxyimino, and nitro. The vinyl polymer is exemplified by a homo- or co-polymer of a (meth)acrylic monomer, or a copolymer of a (meth)acrylic monomer with other monomers.
Abstract:
PROBLEM TO BE SOLVED: To prepare a rubber-modified styrenic resin having a high impact resistance. SOLUTION: The preparation process uses a continuous reaction apparatus which is successively equipped with three complete-mixing type reactors and one tower type reactor. The process comprises a step wherein the whole amount of styrenic monomers used for preparing a rubber-modified styrenic monomer is divided into three batches at a desired ratio, and then the first batch of styrene monomers and the whole amount of rubbers, which make 100 wt.% in total, are introduced into a first reactor and subjected to initial polymerization, a step wherein a polymerized liquid obtained in the first reactor and the next batch of styrenic monomers are introduced into a second reactor and polymerized under stirring until a rubber phase inversion occurs to yield a rubbery polymer as dispersed particles, and a step wherein a polymerized liquid obtained in the second reactor and the last batch of styrenic monomers are continuously introduced into a third reactor to increase the polymerization conversion rate.
Abstract:
PROBLEM TO BE SOLVED: To obtain a catalyst for the production of a poly-α-olefin having a low atactic component and highly stereoregular isotactic component by impregnating a magnesium halide with an organometallic compound and forming only a recemic modification structure of a zirconium metallocene compound on its surface. SOLUTION: The organometallic compound used is a compound of formula I (wherein R and R are each an organic liquid such as cyclopentadienyl, indenyl, fluorenyl or a derivative thereof; M is a group IVB transition metal; and X is a halogen). This is reacted with a halide of a group IVA metal (M ) to obtain a compound represented by formula II (wherein M is an element typified by a group IVB element; R and R are each as defined in formula I; M is a group IVA transition metal element; and X and X are each a halogen). A magnesium halide is impregnated with the organometallic compound of formula II to obtain a catalyst for the production of a poly-α-olefin. This is combined with a promoter such as a water-modified organoaluminum compound of a trialkylaluminum compound of formula IV (wherein R is a 1-10C alkyl).