APPARATUS AND METHOD FOR DEPOSITING LARGE AREA COATINGS ON PLANAR SURFACES

    公开(公告)号:AU2003211169A1

    公开(公告)日:2004-09-17

    申请号:AU2003211169

    申请日:2003-02-20

    Applicant: GEN ELECTRIC

    Inventor: SCHAEPKENS MARC

    Abstract: A method and apparatus (200) for depositing a uniform coating (232) on a large area, planar surface (234) using an array (210) of multiple plasma sources (212) and a common reactant gas injector (220). The apparatus (200) includes at least one array of a plurality of plasma sources (212), wherein each of the plurality of plasma sources (212) includes a cathode (214), an anode (216), and an inlet (218) for a non-reactive plasma source gas disposed in a plasma chamber (202), and a common reactant gas injector (220) disposed in a deposition chamber (204) that contains the substrate (230). The common reactant gas injector (220) provides a uniform flow of at least one reactant gas to each of the multiple plasmas generated the multiple plasma sources (212) through a single delivery system. The at least one reactant gas reacts with the plurality of plasmas to form a uniform coating (232) on a substrate (230).

    HIGH INDEX OF REFRACTION COATED LIGHT MANAGEMENT FILMS

    公开(公告)号:CA2507284A1

    公开(公告)日:2004-06-17

    申请号:CA2507284

    申请日:2003-11-20

    Applicant: GEN ELECTRIC

    Abstract: There is provided an optical structure. The optical structure includes a lig ht source (14). The optical structure also includes an organic light management film (16) having an index of refraction of less than 1.7 disposed above the light source, and a transparent inorganic film (18) having an index of refraction of greater than 1.7 disposed adjacent the organic light managemen t film (16). A optical device is also provided including the organic light management film (16) and the transparent inorganic film (18). A method of forming the optical structure is also provided. The method includes depositi ng the transparent inorganic film (18) under vacuum.

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