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公开(公告)号:CA2148548A1
公开(公告)日:1995-11-05
申请号:CA2148548
申请日:1995-05-03
Applicant: HOECHST AG
Inventor: DOENGES REINHARD , EHRLER RUDOLF , MILEWSKI ECKHARD , RENG ALWIN KARL
IPC: C07H15/12 , C07C231/02 , C07C233/17 , C07C233/18 , C07C233/20 , C07C235/74 , C07C235/76 , C07H13/04 , C07H15/04 , C09K23/00 , C09K23/22 , C11D1/04 , C07C235/72 , C07H5/06 , B01F17/22
Abstract: Salts of alkyl- and/or alkenylsuccinic acid half-amides The invention relates to salts of alkyl- and alkenylsuccinic acid half-amides of the formulae and/or ( Ia) ( Ib) in which R1 is C6-C100-alkyl or C6-C100-alkenyl (straight-chain or branched), R2 is a deoxysaccharide radical which is derived from mono-, di- or oligosaccharides, R3 is hydrogen, C1-C6-alkyl or R2, and X+ is a proton, an alkali metal ion, the equivalent of an alkaline earth metal ion, or an ammonium ion of the formula N+HR4R5R6 (II) or of the formula N+HR2R3R4 (III), in which R4, R5 and R6 independently of one another are hydrogen, C1-C20-alkyl, a hydroxyl group, C1-C6-hydroxyalkyl or C3-C6-polyhydroxyalkyl and R2, R3 and R4 have the abovementioned meanings. The invention furthermore relates to a process for the preparation of the salts of alkyl- and/or alkenylsuccinic acid half-amides, which comprises reacting an alkyland/or alkenylsuccinic acid anhydride with carbohydrates containing amino groups in the presence of basic compounds.
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公开(公告)号:CA2097765A1
公开(公告)日:1993-12-07
申请号:CA2097765
申请日:1993-06-04
Applicant: HOECHST AG
Inventor: BARTZ UWE , DOENGES REINHARD , KLEHR HEINER
Abstract: HOE 92/F 165 of the disclosure Alkyl hydroxyalkyl cellulose ethers containing sulfoalkyl groups The present invention relates to alkyl hydroxyalkyl cellulose ethers which contain a sulfoalkyl group as a further substituent, to a process for the preparation of these cellulose ethers and to building material mixtures which are based on gypsum, hydrated lime or cement and contain alkyl hydroxyalkyl cellulose ethers containing sulfoalkyl groups.
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公开(公告)号:FI925499A0
公开(公告)日:1992-12-03
申请号:FI925499
申请日:1992-12-03
Applicant: HOECHST AG
Inventor: WALLISCH HEINZ , DOENGES REINHARD , MEYER-BLUMENROTH ULRICH
IPC: C08B11/20
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公开(公告)号:FI81786C
公开(公告)日:1990-12-10
申请号:FI843594
申请日:1984-09-13
Applicant: HOECHST AG
Inventor: DOENGES REINHARD , RUCKERT HANS , GEISSLER ULRICH , STEPPAN HARTMUT
IPC: C07D277/20 , C07D209/12 , C07D215/10 , C07D215/12 , C07D215/14 , C07D277/12 , C07D277/64 , C07D277/84 , C07D293/00 , C07D293/12 , C07D521/00 , C08F2/00 , C08F2/50 , C08G85/00 , G03C1/00 , G03C1/675 , G03F7/029 , C07D277/10 , G03C1/73
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公开(公告)号:FI81786B
公开(公告)日:1990-08-31
申请号:FI843594
申请日:1984-09-13
Applicant: HOECHST AG
Inventor: DOENGES REINHARD , RUCKERT HANS , GEISSLER ULRICH , STEPPAN HARTMUT
IPC: C07D277/20 , C07D209/12 , C07D215/10 , C07D215/12 , C07D215/14 , C07D277/12 , C07D277/64 , C07D277/84 , C07D293/00 , C07D293/12 , C07D521/00 , C08F2/00 , C08F2/50 , C08G85/00 , G03C1/00 , G03C1/675 , G03F7/029 , C07D277/10 , G03C1/73
Abstract: Compounds of the formula I … … are described in which L denotes H or CO-(R )n(CX3)m, M denotes alkylene, alkenylene or arylene, Q denotes S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, where M + Q together form 3 or 4 ring members, R denotes alkyl, aralkyl or alkoxyalkyl, R denotes an aromatic group, and X denotes Cl, Br or I and n = 0 and m = 1 or n = 1 and m = 1 or 2. The compounds eliminate HX on irradiation and form radicals. They are therefore highly active acid donors and radical initiators for photochemical processes.
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公开(公告)号:ZA847165B
公开(公告)日:1985-04-24
申请号:ZA847165
申请日:1984-09-12
Applicant: HOECHST AG
Inventor: DOENGES REINHARD , RUCKERT HANS , GEISSLER ULRICH , STEPPAN HARTMUT
IPC: C07D277/20 , C07D209/12 , C07D215/10 , C07D215/12 , C07D215/14 , C07D277/12 , C07D277/64 , C07D277/84 , C07D293/00 , C07D293/12 , C07D521/00 , C08F2/00 , C08F2/50 , C08G85/00 , G03C1/00 , G03C1/675 , G03F7/029 , C07D , C08F , G03C , G03F
Abstract: Compounds of the formula I … … are described in which L denotes H or CO-(R )n(CX3)m, M denotes alkylene, alkenylene or arylene, Q denotes S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, where M + Q together form 3 or 4 ring members, R denotes alkyl, aralkyl or alkoxyalkyl, R denotes an aromatic group, and X denotes Cl, Br or I and n = 0 and m = 1 or n = 1 and m = 1 or 2. The compounds eliminate HX on irradiation and form radicals. They are therefore highly active acid donors and radical initiators for photochemical processes.
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公开(公告)号:ZA8103555B
公开(公告)日:1982-06-30
申请号:ZA8103555
申请日:1981-05-27
Applicant: HOECHST AG
Inventor: REINHARD DOENGES , DOENGES REINHARD
IPC: C08F2/00 , C07D263/34 , C07D263/56 , C07D263/57 , C07D413/04 , C08F2/48 , C08F2/50 , C08F2/54 , G03C1/675 , G03F7/004 , G03F7/028 , G03F7/039 , C07D , C08J , C08K , A61K , G03C
CPC classification number: C07D263/34 , C07D263/57 , E04G21/3276 , E04G21/328 , G03C1/675 , G03F7/004 , Y10S430/115 , Y10S430/117 , Y10S430/121 , Y10S430/126
Abstract: This invention relates to a novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 2-halogenomethyl-phenyl)-4-halogeno-oxazole derivative; and to a process for the preparation of the novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivatives.
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