公开(公告)号：AU3521178A

公开(公告)日：1979-10-25

申请号：AU3521178

申请日：1978-04-18

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

公开(公告)号：DE2545654A1

公开(公告)日：1976-06-16

申请号：DE2545654

申请日：1975-10-11

Applicant: IBM

Inventor： BARCLAYY DONALD JOHN ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/56

公开(公告)号：AU556367B2

公开(公告)日：1986-10-30

申请号：AU9068282

申请日：1982-11-18

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  VIGAR JAMES MICHAEL ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.

公开(公告)号：DE3265889D1

公开(公告)日：1985-10-03

申请号：DE3265889

申请日：1982-11-11

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS ,  VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

Abstract: A chromium electroplating electrolyte containing trivalent chromium ions, a complexant, a buffer agent and thiocyanate ions for promoting chromium deposition, the thiocyanate having a molar concentration lower than that of the chromium ions. The chromium preferably has a concentration lower than 0.01M. Preferably the complexant is selected so that the stability constant K1 of chromium complex is in the range 10 M . Complexants in this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid and 5-sulphosalicylic acid.

公开(公告)号：DE3265888D1

公开(公告)日：1985-10-03

申请号：DE3265888

申请日：1982-11-11

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS ,  VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

公开(公告)号：GB2110242B

公开(公告)日：1985-06-12

申请号：GB8134777

申请日：1981-11-18

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  VIGAR JAMES MICHAEL LINFORD ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

公开(公告)号：NO151375C

公开(公告)日：1985-03-27

申请号：NO782046

申请日：1978-06-12

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

公开(公告)号：GB2109816B

公开(公告)日：1985-01-23

申请号：GB8134778

申请日：1981-11-18

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  VIGAR JAMES MICHAEL LINFORD ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

Abstract: A chromium electroplating electrolyte containing trivalent chromium ions, a complexant, a buffer agent and thiocyanate ions for promoting chromium deposition, the thiocyanate having a molar concentration lower than that of the chromium ions. The chromium preferably has a concentration lower than 0.01M. Preferably the complexant is selected so that the stability constant K1 of chromium complex is in the range 10 M . Complexants in this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid and 5-sulphosalicylic acid.

公开(公告)号：ZA828367B

公开(公告)日：1983-10-26

申请号：ZA828367

申请日：1982-11-15

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS ,  LINFORD VIGAR JAMES MICHAEL

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56 ,  C25D

公开(公告)号：ZA8208368B

公开(公告)日：1983-09-28

申请号：ZA8208368

申请日：1982-11-15

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS ,  LINFORD VIGAR JAMES MICHAEL

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56 ,  C25C

CPC classification number: C25D3/56 ,  C25D3/06