31.
    发明专利
    未知

    公开(公告)号:BR8903591A

    公开(公告)日:1990-03-13

    申请号:BR8903591

    申请日:1989-07-20

    Applicant: IBM

    Abstract: The method for fabricating exactly aligned apertures for use in electron and ion microscopy involves the placing of a very sharply pointed tip (1) in front of a set of extremely thin metal foils (3, 5) having closely controlled mutual distances in an atmosphere of heavy gas atoms. The application of an elevated voltage at the tip (1) will result in a sputtering operation to commence and erode the metal foils (3, 5) at a location underneath the facing tip (1). The sputtering operation is continued until the first ions are detected to emerge on the far side of the lens structure (2).

Patent Agency Ranking