CENTER-MASS-REDUCED MICROBRIDGE STRUCTURES FOR ULTRA-HIGH FREQUENCY MEM RESONATOR
    31.
    发明申请
    CENTER-MASS-REDUCED MICROBRIDGE STRUCTURES FOR ULTRA-HIGH FREQUENCY MEM RESONATOR 审中-公开
    用于超高频谐振器的中心质量减小的微结构

    公开(公告)号:WO2003028212A2

    公开(公告)日:2003-04-03

    申请号:PCT/US2002/031157

    申请日:2002-09-27

    Abstract: A micro-electromechanical (MEM) resonator is described that includes a substrate, a microbridge beam structure coupled to the substrate and at least one electrode disposed adjacent to the microbridge beam structure to induce vibration of the beam. The microbridge beam structure includes support sections and a beam formed between the support sections. The center region of the beam has a mass that is less than the mass of regions of the beam adjacent to the support sections.

    Abstract translation: 描述了一种微机电(MEM)谐振器,其包括衬底,耦合到衬底的微桥梁结构和邻近微桥梁结构设置的至少一个电极以引起梁的振动。 微桥梁结构包括支撑部分和形成在支撑部分之间的梁。 梁的中心区域的质量小于与支撑部分相邻的梁的区域的质量。

    SACRIFICIAL LAYER TECHNIQUE TO MAKE GAPS IN MEMS APPLICATIONS

    公开(公告)号:WO2003002450A3

    公开(公告)日:2003-01-09

    申请号:PCT/US2002/020764

    申请日:2002-06-27

    Abstract: A method comprising over an area of a substrate, forming a plurality of three dimensional first structures; following forming the first structures, conformally introducing a sacrificial material over the area of the substrate; introducing a second structural material over the sacrificial material; and removing the sacrificial material. An apparatus comprising a first structure on a substrate; and a second structure on the substrate and separated from the first structure by an unfilled gap defined by the thickness of a removed film.

    FREQUENCY TUNING OF FILM BULK ACOUSTIC RESONATORS (FBAR)
    37.
    发明申请
    FREQUENCY TUNING OF FILM BULK ACOUSTIC RESONATORS (FBAR) 审中-公开
    薄膜音箱谐振器(FBAR)的频率调谐

    公开(公告)号:WO2007078646A1

    公开(公告)日:2007-07-12

    申请号:PCT/US2006/047138

    申请日:2006-12-06

    CPC classification number: H03H3/04 H03H3/0076 H03H2003/0428 H03H2003/0478

    Abstract: Multiple FBARs may be manufactured on a single wafer and later diced. Ideally, all devices formed in a wafer would have the same resonance frequency. However, due to manufacturing variances, the frequency response of the FBAR devices may vary slightly across the wafer. An RF map may be created to determine zones (50, 52) over the wafer where FBARs in that zone all vary from a target frequency by a similar degree. A tuning layer (40) may be deposited over the wafer. Lithographically patterned features to the tuning layer based on the zones identified by the RF map may be used to correct the FBARs to a target resonance frequency with the FBARs still intact on the wafer.

    Abstract translation: 多个FBAR可以在单个晶片上制造并且稍后被切割。 理想地,形成在晶片中的所有器件将具有相同的谐振频率。 然而,由于制造方差,FBAR器件的频率响应可能会在晶圆上略有不同。 可以创建RF映射以确定晶片上的区域(50,52),其中该区域中的FBAR全部从目标频率变化相似程度。 调谐层(40)可以沉积在晶片上。 可以使用基于由RF映射表示的区域的调谐层的光刻图案特征来将FBAR校正到目标谐振频率,同时FBAR在晶片上仍然完整。

    LOW INDUCTANCE VIA STRUCTURES
    39.
    发明申请
    LOW INDUCTANCE VIA STRUCTURES 审中-公开
    通过结构的低电感

    公开(公告)号:WO2006127988A1

    公开(公告)日:2006-11-30

    申请号:PCT/US2006/020407

    申请日:2006-05-23

    Inventor: HECK, John MA, Qing

    CPC classification number: H01L21/76898 H01L23/481 H01L2924/0002 H01L2924/00

    Abstract: In one embodiment, a method for forming a semiconductor device, comprises forming a first aperture (450) and a second aperture (452) in a first surface of the substrate (440) , the first and second apertures being coaxial; forming, in the first aperture, a first conductive path between the first surface of the substrate and a second surface of the substrate; and forming, in the second aperture, a second conductive path between the first surface of the substrate and a second surface of the substrate .

    Abstract translation: 在一个实施例中,一种用于形成半导体器件的方法包括在所述衬底(440)的第一表面中形成第一孔(450)和第二孔(452),所述第一和第二孔同轴; 在所述第一孔中形成在所述基板的第一表面和所述基板的第二表面之间的第一导电路径; 以及在所述第二孔中形成在所述基底的所述第一表面和所述基底的第二表面之间的第二导电路径。

    MANUFACTURING FILM BULK ACOUSTIC RESONATOR FILTERS
    40.
    发明申请
    MANUFACTURING FILM BULK ACOUSTIC RESONATOR FILTERS 审中-公开
    制造薄膜大声道谐振器滤波器

    公开(公告)号:WO2004036744A2

    公开(公告)日:2004-04-29

    申请号:PCT/US2003/024142

    申请日:2003-08-01

    CPC classification number: H03H9/564 H03H3/02 Y10T29/42

    Abstract: A film bulk acoustic resonator filter may be formed with a plurality of interconnected series and shunt film bulk acoustic resonators formed on the same membrane. Each of the film bulk acoustic resonators may be formed from a common lower conductive layer which is defined to form the bottom electrode of each film bulk acoustic resonator. A common top conductive layer may be defined to form each top electrode of each film bulk acoustic resonator. A common piezoelectric film layer, that may or may not be patterned, forms a continuous or discontinuous film.

    Abstract translation: 薄膜体声波谐振器滤波器可以形成有形成在同一膜上的多个互连串联和分流膜体声波谐振器。 膜体积声谐振器中的每一个可以由限定为形成每个膜体声波谐振器的底部电极的公共下导电层形成。 可以限定共同的顶部导电层以形成每个膜体声波谐振器的每个顶部电极。 可以或可以不被图案化的公共压电膜层形成连续或不连续的膜。

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