公开(公告)号：JP2004300230A

公开(公告)日：2004-10-28

申请号：JP2003093456

申请日：2003-03-31

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： CHIBA TAKASHI ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C07F7/18 ,  C08G77/24 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new polysiloxane which has fluorine-containing norbornane skeletons, is useful as a resin component for resists having high transparency for radiations having wavelengths of ≤200 nm and having excellent resolutions, and the like, to provide a new silicon-containing compound useful as a raw material for synthesizing the polysiloxane and the like, and to provide a radiation-sensitive resin composition containing the polysiloxane. SOLUTION: This silicon-containing compound is represented by the general formula (1) [X is H, OH, a halogen, a monovalent group such as a (halogenated) hydrocarbon group; R 1 is a monovalent (halogenated) hydrocarbon group; (a) is an integer of 0 to 3; B is H or F; (m) is an integer of 1 to 10; (n) is 0 or 1]. The polysiloxane has structural units originated from the silicon-containing compound. The radiation-sensitive resin composition is characterized by comprising the polysiloxane and a radiation-sensitive acid-generating agent. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004151267A

公开(公告)日：2004-05-27

申请号：JP2002315016

申请日：2002-10-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： CHIBA TAKASHI ,  SHIMOKAWA TSUTOMU ,  HAYASHI AKIHIRO

IPC: G03F7/11 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method which can form dense patterns without receiving the influence of standing waves and can form the patterns having a high aspect ratio in a dry etching step by combining lower layer films usable as thin films having excellent dry etching resistance and a resist film containing a fluorine-containing polymer having high transparency at a wavelength ≤193 nm and multilayered films for forming the patterns. SOLUTION: The pattern forming method has a step of successively forming (1) the first lower layer film containing a polymer of a carbon content ≥80wt%, (2) the second lower layer film containing a siloxane component, and (3) the resist film containing a polymer of a carbon content ≥30wt% which is made easily soluble in an alkali by the effect of an acid, and a radiation sensitive acid generating agent, exposing the resist film with radiation, and developing the exposed resist film. The multilayered films for pattern formation has the first lower layer film, the second lower layer film and the resist film. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种图案形成方法，其可以形成致密图案而不受到驻波的影响，并且可以通过组合可用作薄膜的下层膜来形成干蚀刻步骤中具有高纵横比的图案 具有优异的耐干蚀刻性和含有在波长≤193nm具有高透明度的含氟聚合物的抗蚀剂膜和用于形成图案的多层膜。 图案形成方法具有以下步骤：（1）含有碳含量≥80重量％的聚合物的第一下层膜，（2）含有硅氧烷成分的第二下层膜和（3） ）抗蚀剂膜，其含有通过酸作用容易溶于碱的含量≥30重量％的聚合物，和辐射敏感性酸产生剂，用抗辐射剂曝光抗蚀剂膜，以及显影曝光的抗蚀剂膜 。 用于图案形成的多层膜具有第一下层膜，第二下层膜和抗蚀剂膜。 版权所有（C）2004，JPO

公开(公告)号：JP2004107277A

公开(公告)日：2004-04-08

申请号：JP2002273899

申请日：2002-09-19

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： CHIBA TAKASHI ,  SHIMOKAWA TSUTOMU ,  HAYASHI AKIHIRO

IPC: G03F7/039 ,  C07C43/192 ,  C07C43/196 ,  C07F7/12 ,  C07F7/18 ,  C08G77/14 ,  C08G77/24 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new polysiloxane having a fluoronorbornane skeleton, useful as a resin component or the like of resists high in transparency to radiation ≤200 nm in wavelength, high in resolution and easy to control the solubility to alkaline developing solution, to provide a new silicon-containing compound and a new norbornene-based compound useful as raw materials or intermediates or the like for the polysiloxane, and to provide a radiation-sensitive resin composition containing the polysiloxane. SOLUTION: The norbornene-based compound is represented by 5-heptafluoropropoxy-5,6,6-trifluorobicyclo[2.2.1]hept-2-ene or the like. The silicon-containing compound is represented by 5-heptafluoropropoxy-5,6,6-trifluorobicyclo[2.2.1]heptyltriethoxysilane or the like. The polysiloxane has a structural unit derived from the silicon-containing compound. The radiation-sensitive resin composition comprises the polysiloxane and a radiation-sensitive acid generator. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2000147773A

公开(公告)日：2000-05-26

申请号：JP31880298

申请日：1998-11-10

Applicant: JSR CORP

Inventor： CHIBA TAKASHI ,  KOBAYASHI HIDEKAZU ,  IWANAGA SHINICHIRO

IPC: H01L21/027 ,  C08F212/14 ,  C08K5/17 ,  C08L25/18 ,  G03F7/004 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation-sensitive resin compsn. useful as a fine resist pattern with high accuracy by incorporating a resin having individually specified two kinds of repeating units as the essential units, a radiation-sensitive acid producing agent and at lest one kind of basic compd. selected from a group of specified compds. SOLUTION: This radiation-sensitive compsn. contains a resin having a repeating unit expressed by formula I and a repeating unit expressed by formula II as the essential units, a radiation-sensitive acid producing agent and at least one kind of basic compd. selected from a group of compds. expressed by formula III. In formula I, R1 is a hydrogen atom or methyl group, each of R2 and R3 is independently hydrogen atom or 1-6C straight-chain, branched or cyclic alkyl group. In formula II, R4 is a hydrogen atom or methyl group. In formula III, X1 is a polymethylene chain having 2 to 8 carbon atoms in the main chain, each of R5 to R8 is independently 1-12C straight-chain, branched or cyclic alkyl group.

公开(公告)号：JP2000066382A

公开(公告)日：2000-03-03

申请号：JP23616798

申请日：1998-08-21

Applicant: JSR CORP

Inventor： CHIBA TAKASHI ,  KOBAYASHI HIDEKAZU ,  IWANAGA SHINICHIRO

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin compsn. having low substrate dependency and capable of forming a rectangular pattern almost free from trailing even on a basic substrate such as a TiN, SiN or SiON substrate by incorporating a copolymer contg. two specified repeating units, a radiation sensitive acid generating agent and a basic compd. having a hydroxyl group. SOLUTION: The radiation sensitive resin compsn. contains a copolymer contg. repeating units of formula I and repeating units of formula II, a radiation sensitive acid generating agent and a basic compd. having a hydroxyl group. In the formula I, R1 is H or methyl. In the formula II, R2 is H or methyl and R3 is t-butyl or the like. The content of the repeating units of the formula I in the copolymer is preferably 10-90 wt.% of the entire repeating units and the content of the repeating units of the formula II is preferably 1-70 wt.% of the entire repeating units. A rectangular pattern almost free from trailing can be formed even on a basic substrate.

公开(公告)号：JP2010270333A

公开(公告)日：2010-12-02

申请号：JP2010130591

申请日：2010-06-08

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  CHIBA TAKASHI

IPC: C08F20/28 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which does not cause pattern sidewall swelling, pattern collapse, etc., in a development process, and to provide a (meth)acrylic acid polymer usable in the composition. SOLUTION: The (meth)acrylic acid polymer is controlled in its solubility in an alkaline solution by the action of an acid and has a specific structure having repeating units each having an ether group. Furthermore, the polymer optionally contains repeating units each having, at the side chain, an alcoholic hydroxyl group having a fluorine atom or having a fluoromethyl group at least at the α position and/or repeating units having a lactone ring at its side chain. The radiation-sensitive resin composition includes the (meth)acrylic acid polymer. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供在显影过程中不引起图案侧壁膨胀，图案塌陷等的辐射敏感性树脂组合物，并提供可用于组合物中的（甲基）丙烯酸聚合物。 解决方案：（甲基）丙烯酸聚合物通过酸的作用控制其在碱性溶液中的溶解度，并具有具有各自具有醚基的重复单元的具体结构。 此外，聚合物任选含有在侧链具有至少在α位具有氟原子的醇性羟基或具有氟甲基的侧链和/或其侧链具有内酯环的重复单元的重复单元。 辐射敏感性树脂组合物包含（甲基）丙烯酸聚合物。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010211226A

公开(公告)日：2010-09-24

申请号：JP2010101351

申请日：2010-04-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KIMURA TORU ,  NISHIMURA YUKIO ,  UKO TOMOHIRO ,  NEMOTO HIROAKI ,  NAKAMURA ATSUSHI ,  CHIBA TAKASHI ,  NAKAGAWA DAIKI

IPC: G03F7/11 ,  G03F7/20 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

Abstract: PROBLEM TO BE SOLVED: To realize satisfactory transmittance for exposure light of 248 nm (KrF) and 193 nm (ArF) wavelength, to realize the formation of a film on a photoresist, without intermixing with a photoresist film, to maintain a stable film without dissolution in water during liquid immersion photoexposure, and to form an upper layer film which is readily soluble in an alkali developer.
SOLUTION: A composition to be coated on the photoresist film, when a liquid immersion photoexposure unit is used in which irradiation exposure is carried out, with water interposed between a lens and the photoresist film, comprises a resin which forms a stable film, without dissolution in water during irradiation exposure and is soluble in a subsequent developer using an alkaline aqueous solution; and a solvent containing a monohydric alcohol of a C6 or fewer. In particular, the resin contains a resin component having an alcoholic hydroxyl group on its side chain and containing a fluoroalkyl group on at least its α position.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了实现248nm（KrF）和193nm（ArF）波长的曝光光的令人满意的透射率，为了实现在光致抗蚀剂上形成膜而不与光致抗蚀剂膜混合，以保持 在液浸光曝光期间不溶于水的稳定膜，并形成易溶于碱显影剂的上层膜。 解决方案：当使用在透镜和光致抗蚀剂膜之间的水进行照射曝光的液浸光曝光单元时，要涂覆在光致抗蚀剂膜上的组合物包括形成稳定膜的树脂 ，在照射暴露时不溶于水，并且可溶于使用碱性水溶液的后续显影剂中; 和含有C6以下的一元醇的溶剂。 特别地，树脂在其侧链含有具有醇羟基的树脂成分，至少在其α位含有氟代烷基。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009246137A

公开(公告)日：2009-10-22

申请号：JP2008090852

申请日：2008-03-31

Applicant: Jm Energy Corp ,  Jmエナジー株式会社 ,  Jsr Corp ,  Jsr株式会社

Inventor： MOGI TAKESHI ,  KITAGUCHI HIRONORI ,  SUZUKI HIROSHI ,  ITO KAZUTOSHI ,  CHIBA TAKASHI ,  TOYOMASU YUKA ,  MARUMO CHIAKI

IPC: H01G11/22 ,  H01G11/06 ,  H01G11/28 ,  H01G11/30 ,  H01G11/38 ,  H01G11/42 ,  H01G11/50 ,  H01G11/66 ,  H01G11/70 ,  H01G11/86

Abstract: PROBLEM TO BE SOLVED: To provide a lithium-ion capacitor that is industrially advantageously produced and achieves high-energy density, high power, low resistance, and high reliability.
SOLUTION: The lithium-ion capacitor is configured as follows. A positive electrode and a negative electrode include a current-collecting material having through-holes, respectively. The positive electrode includes a material capable of reversibly carrying lithium-ions and/or anions as a positive-electrode active material with the material bound by a binder. The negative electrode includes a material capable of reversibly carrying lithium-ions as a negative-electrode active material. Lithium-ions are electrochemically carried by the positive electrode and/or the negative electrode. The binder is a particulate binder having a particle size of 0.1-0.4 μm and includes a composition comprising 5-20 mass% of a fluorine-containing polymer and a polymer that has a structural unit derived from CH
2 =CR
1 COOR
2 (R
1 represents a hydrogen atom or a methyl group and R
2 represents a 1-18C alkyl group or a 1-18C cycloalkyl group).
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在工业上有利地生产并实现高能量密度，高功率，低电阻和高可靠性的锂离子电容器。

解决方案：锂离子电容器配置如下。 正极和负极分别包括具有通孔的集电材料。 正极包括能够可逆地携带作为正极活性物质的锂离子和/或阴离子的材料，其中材料被粘合剂结合。 负极包括能够可逆地携带锂离子作为负极活性物质的材料。 锂离子由正极和/或负极电化学承载。 粘合剂是粒径为0.1-0.4μm的颗粒状粘合剂，包括含有5-20质量％的含氟聚合物和具有衍生自CH 2 SB的结构单元的聚合物的组合物， = CR 1 COOR 2 （R 1 表示氢原子或甲基，R 2表示1 -18C烷基或1-18C环烷基）。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008222937A

公开(公告)日：2008-09-25

申请号：JP2007065919

申请日：2007-03-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ASANO SHIGETO ,  CHIBA TAKASHI ,  SAITO AKIO

IPC: C08G73/10 ,  G03F7/037 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of being coated to be a high thickness membrane and alkali developed, having high resolution and small residual stress after curing and preparing cured products excellent in various characteristics such as solvent resistance, impact resistance, close adhesiveness and the like. SOLUTION: A polymer constituting the resin composition comprises a repeating unit having a structure expressed by general formula (1) (wherein R 1 expresses a 4-valent alicyclic hydrocarbon group or a 4-valent alkyl alicyclic hydrocarbon group having a 1-4C alkyl group; A expresses a predetermined 2-valent group) and a repeating unit having a structure expressed by general formula (2) (wherein R 1 expresses the same meaning as that in the general formula (1); B expresses a 2-valent group having a hydroxyl group). COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 解决问题的方案：提供一种能够被涂覆成为高浓度膜和碱显影的感光性树脂组合物，其固化后的分辨率高，残留应力小，并且可以制备各种特性如耐溶剂性优异的固化物， 耐冲击性，密合性等。 ＆lt; P＆gt;解决方案：构成树脂组合物的聚合物包含具有由通式（1）表示的结构的重复单元（其中R 1 表示4价脂环族烃基或4价烷基 具有1-4C烷基的脂环烃基; A表示预定的2价基团）和具有由通式（2）表示的结构的重复单元（其中R 1 表示与 在通式（1）中; B表示具有羟基的2价基团）。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008106110A

公开(公告)日：2008-05-08

申请号：JP2006289010

申请日：2006-10-24

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ASANO SHIGETO ,  CHIBA TAKASHI ,  SAITO AKIO

IPC: C08G73/10 ,  G02B5/20 ,  G03F7/038 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition obtaining a cured material capable of performing an alkali development, having a high resolution and a small residual stress after its curing, and excellent in various characteristics.
SOLUTION: This photosensitive resin is a polymer having a recurring unit expressed by general formula (1) and a recurring unit expressed by general formula (2) [in the general formulae (1), (2), R
1 is an alkylene or the like; A is general formula (3); B is a divalent group having hydroxy; and in the general formula (3), R
2 s are each independently an alkyl or the like; (m) is 1 to 10 integer; and (n) is 1 to 30 integer].
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 解决的问题：提供一种获得能够进行碱显影的固化物的感光性树脂组合物，其固化后的分辨率高，残留应力小，各种特性优异。 该光敏树脂是具有由通式（1）表示的重复单元的聚合物和由通式（2）表示的重复单元[通式（1），（2），R 1 是亚烷基等; A是通式（3）; B是具有羟基的二价基团; 在通式（3）中，R“2”各自独立地为烷基等; （m）为1〜10个整数; 和（n）为1〜30个整数]。 版权所有（C）2008，JPO＆INPIT