公开(公告)号：EP1708027A4

公开(公告)日：2008-12-03

申请号：EP05703585

申请日：2005-01-14

Applicant: JSR CORP

Inventor： KIMURA TORU ,  NISHIMURA YUKIO ,  UTAKA TOMOHIRO ,  NEMOTO HIROAKI ,  NAKAMURA ATSUSHI ,  CHIBA TAKASHI ,  NAKAGAWA HIROKI

IPC: G03F7/11 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

Abstract: An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of ±-position.

公开(公告)号：EP1806370A4

公开(公告)日：2008-07-23

申请号：EP05787854

申请日：2005-09-28

Applicant: JSR CORP

Inventor： CHIBA TAKASHI ,  KIMURA TORU ,  UTAKA TOMOHIRO ,  NAKAGAWA HIROKI ,  SAKAKIBARA HIROKAZU ,  DOUGAUCHI HIROSHI

IPC: C08F220/10 ,  G03F7/11 ,  H01L21/027

CPC classification number: G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

Abstract: Disclosed is an upper film-forming composition which enables to form a coating film on a photoresist without causing intermixing with the photoresist film and to maintain a stable coating film without dissolving into a medium used during immersion exposure. The upper film-forming composition is also capable to form an upper layer which enables to obtain a pattern shape that is not inferior to the one obtained by a process other than immersion exposure, namely a dry exposure and can be easily dissolved in an alkaline developer. Also disclosed is a copolymer containing a repeating unit having a group represented by the general formula (1) below, a repeating unit having a group represented by the general formula (2) below, at least one repeating unit (I) selected from repeating units having a carboxyl group, and a repeating unit (II) having a sulfo group, and having a weight average molecular weight of 2,000-100,000 determined by gel permeation chromatography. (1) (2) At least one of R

公开(公告)号：EP1757990A4

公开(公告)日：2011-04-27

申请号：EP05743737

申请日：2005-05-24

Applicant: JSR CORP

Inventor： SAKAKIBARA HIROKAZU ,  ABE TAKAYOSHI ,  CHIBA TAKASHI ,  KIMURA TORU

IPC: G03F7/40 ,  H01L21/027

CPC classification number: G03F7/40 ,  H01L21/0274

公开(公告)号：EP1736829A4

公开(公告)日：2011-01-05

申请号：EP05730408

申请日：2005-04-13

Applicant: JSR CORP

Inventor： NISHIMURA I ,  CHIBA TAKASHI ,  SHIMOKAWA TSUTOMU

IPC: G03F7/075 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0046 ,  G03F7/0045 ,  G03F7/0757

公开(公告)号：EP1757628A4

公开(公告)日：2008-04-30

申请号：EP05737180

申请日：2005-05-02

Applicant: JSR CORP

Inventor： NAKASHIMA HIROMITSU ,  UTAKA TOMOHIRO ,  CHIBA TAKASHI ,  YONEDA EIJI ,  NAKAMURA ATSUSHI

IPC: C08F220/28 ,  G03F7/004 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

CPC classification number: C08F220/28 ,  C08F220/18 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

Abstract: A radiation-sensitive resin composition that not only excels in fundamental properties as resist, such as sensitivity and resolution, but also with respect to both of line-and-space pattern and isolated space pattern, realizes extensive depth of focus (DOF) and is less in the line width change attributed to alteration of baking temperature, the limit line width free from any phenomenon of line pattern collapse of the radiation-sensitive resin composition being small. Further, there is provided a lactone copolymer being useful as a resin component of the radiation-sensitive resin composition. This lactone copolymer is represented by a copolymer of compound of the following formula (1-1), compound of the following formula (2-1) and compound of the following formula (3-1). This radiation-sensitive resin composition comprises the lactone copolymer (a) and radiation-sensitive acid generating agent (b).

公开(公告)号：JP2007065488A

公开(公告)日：2007-03-15

申请号：JP2005253765

申请日：2005-09-01

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SAITO AKIO ,  GOTO HIROFUMI ,  CHIBA TAKASHI ,  HASHIGUCHI YUICHI

IPC: G03F7/038 ,  C08F212/14 ,  G03F7/004 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a cured film formable by low-temperature curing without harming the function of an organic semiconductor device, etc., and excellent in various properties such as resolution, electric insulation, thermal shock resistance and chemical resistance; and also to provide a method for producing the cured film, and a radiation sensitive resin composition capable of giving the cured film and suitable for an interlayer insulation film, a surface protective film, etc., of a semiconductor device.
SOLUTION: The radiation sensitive resin composition for forming an insulating film comprises an alkali-soluble resin (A) having a phenolic hydroxyl group, a radiation sensitive acid generator (B), a crosslinking agent (C), an adhesion assistant (D) and an organic solvent (E), and has a solid concentration of 7-25 mass%.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供通过低温固化形成的固化膜，而不损害有机半导体器件等的功能，并且具有优异的各种性能如分辨率，电绝缘性，耐热冲击性和耐化学性 ; 以及提供固化膜的制造方法以及能够赋予半导体装置的层间绝缘膜，表面保护膜等的固化膜的辐射敏感性树脂组合物。 解决方案：用于形成绝缘膜的辐射敏感性树脂组合物包括具有酚羟基的碱溶性树脂（A），辐射敏感性酸产生剂（B），交联剂（C），粘合助剂（ D）和有机溶剂（E），固体成分浓度为7〜25质量％。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006267521A

公开(公告)日：2006-10-05

申请号：JP2005085133

申请日：2005-03-24

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： UKO TOMOHIRO ,  CHIBA TAKASHI ,  KIMURA TORU ,  NAKAGAWA DAIKI ,  DOKOCHI HIROSHI

IPC: G03F7/11 ,  G03F7/033 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an overlay film forming composition for liquid immersion from which a coating film having sufficient transmitting property at an exposure wavelength by KrF and ArF laser light, is formed on a photoresist without inducing intermixing with the photoresist film, and a stable coating film is maintained without elution in a liquid immersion medium in liquid immersion exposure. SOLUTION: The composition contains: a resin from which a film covering a photoresist film and stable in a liquid immersion medium is formed; and a solvent which dissolves the resin, wherein the resin contains at least one repeating unit selected from a group consisting of a repeating unit having a group expressed by a formula (1) at a side chain end, a repeating unit having a carboxyl group at a side chain end, and a repeating unit having a group expressed by a formula (2) at a side chain end, and the solvent contains a 7-10C monohydric alcohol. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于液浸的覆盖膜形成组合物，其中通过KrF和ArF激光在曝光波长处具有足够的透射特性的涂膜形成在光致抗蚀剂上而不引起与光致抗蚀剂膜的混合 并且在液浸曝光中在液浸介质中保持稳定的涂膜而不洗脱。 组合物包含：形成覆盖光致抗蚀剂膜并在液浸介质中稳定的膜的树脂; 和溶解树脂的溶剂，其中所述树脂含有至少一种选自由侧链侧由式（1）表示的基团的重复单元，具有羧基的重复单元的重复单元 侧链端和在侧链端具有式（2）表示的基团的重复单元，溶剂含有7〜10元一元醇。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005029742A

公开(公告)日：2005-02-03

申请号：JP2003273289

申请日：2003-07-11

Applicant: Jsr Corp ,  Jsr株式会社 ,  Semiconductor Leading Edge Technologies Inc ,  株式会社半導体先端テクノロジーズ

Inventor： CHIBA TAKASHI ,  SHIMOKAWA TSUTOMU ,  HAYASHI AKIHIRO ,  ITANI TOSHIRO ,  MITSUYOSHI YASURO ,  FURUKAWA TAKAMITSU

IPC: G03F7/075 ,  C08G77/24 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new polysiloxane that has high transparency to the radial rays of ≤200 nm wavelength, high resolution and excellent coating properties and is useful as a resin component for resists and bears a fluorine-containing norbornane skeleton and provide a radiation-sensitive resin composition including the same.
SOLUTION: The polysiloxane comprises at least one of structural unit selected from a structural unit represented by formula (I) and a structural unit represented by formula (II) and at least one of structural unit selected from a structural unit represented by formula (III) and a structural unit represented by formula (IV) [wherein X
1 and X
2 are each H, a monovalent (halogenated) hydrocarbon, a halogen atom, or an amino; B is H or F; n and m are each 0 or 1, p is an integer of 1-10]. The radiation-sensitive resin composition includes the polysiloxane and the radiation-sensitive acid generator.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供对波长≤200nm的径向射线具有高透明度的高聚物，高分辨率和优异的涂布性能，并且可用作抗蚀剂和承载含氟降冰片烷骨架的树脂组分 并提供包含其的辐射敏感性树脂组合物。 解决方案：聚硅氧烷包括选自由式（I）表示的结构单元和由式（II）表示的结构单元的结构单元中的至少一种和选自由式 （III）和由式（IV）表示的结构单元[其中X 1 和X 2 分别为H，一价（卤代）烃，卤素原子或 氨基; B为H或F; n和m各自为0或1，p为1-10的整数]。 辐射敏感性树脂组合物包括聚硅氧烷和辐射敏感性酸发生剂。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005029540A

公开(公告)日：2005-02-03

申请号：JP2003273405

申请日：2003-07-11

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： CHIBA TAKASHI

IPC: C07C33/42 ,  C07C29/58

Abstract: PROBLEM TO BE SOLVED: To provide a new fluorine-containing unsaturated alcohol useful e.g. as a synthetic raw material for a polysiloxane having a fluorine-containing norbornane skeleton and suitable e.g. as a resin component of a resist having high transparency to the radiation of ≤193 nm wavelength and excellent resolution, sensitivity, developability, dry-etching resistance, etc., and enabling easy control of the solubility to an alkaline developing liquid and provide a method for the production of the alcohol. SOLUTION: The fluorine-containing unsaturated alcohol is expressed by formula (1) (x is an integer of 0-5; and y is an integer of 1-3). The fluorine-containing unsaturated alcohol is produced by the dehydrofluorination reaction of a fluorinated alcohol expressed by formula (i). COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种新的含氟不饱和醇， 作为具有含氟降冰片烷骨架的聚硅氧烷的合成原料， 作为具有对波长≤193nm的辐射具有高透明度的抗蚀剂的树脂组分，并且具有优异的分辨率，灵敏度，显影性，耐干蚀刻性等，并且能够容易地控制对碱性显影液的溶解度并提供方法 用于生产酒精。 解决方案：含氟不饱和醇由式（1）表示（x为0-5的整数，y为1-3的整数）。 通过由式（i）表示的氟化醇的脱氟化氢反应制备含氟不饱和醇。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2001013687A

公开(公告)日：2001-01-19

申请号：JP2000122919

申请日：2000-04-24

Applicant: JSR CORP

Inventor： CHIBA TAKASHI ,  NUMATA ATSUSHI

IPC: G03F7/039 ,  C08K5/00 ,  C08K5/17 ,  C08L25/18 ,  C08L33/04 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition capable of forming a rectangular pattern free from a roundish head shape in micro-fabrication in a small film thickness by incorporating a copolymer containing specified repeating units, a radiation sensitive acid generating agent and a specified compound. SOLUTION: The radiation sensitive resin composition contains a copolymer containing repeating units of formulae I and II and/or a copolymer containing repeating units of formulae I and III, a radiation sensitive acid generating agent and a compound of formula IV. In the formulae I-III, R1, R2 and R8 are each H or methyl, R3 is t-butyl or the like and R9 is a 4-10C tertiary alkyl. In the formula IV, R10-R13 are each a 1-16C linear, branched or cyclic alky, 2-16C linear, branched or cyclic alkenyl or the like and R14 is a 5-16C monovalent hydrocarbon, 2-16C acyl or the like.