公开(公告)号：US20150030885A1

公开(公告)日：2015-01-29

申请号：US14340675

申请日：2014-07-25

Applicant: SILCOTEK CORP.

Inventor： David A. SMITH

IPC: C23C16/02 ,  C23C16/46

CPC classification number: C23C16/0218 ,  B05D1/60 ,  B05D5/08 ,  C23C16/0272 ,  C23C16/30 ,  C23C16/56

Abstract: A chemical vapor deposition process and article formed by a chemical vapor deposition process are disclosed. The process includes pretreating a substrate by exposing the substrate to an oxidative environment for a period of time, decomposing a material to form a layer on the substrate, and functionalizing one or both of the layer and the substrate. The pretreating pre-oxidizes the substrate.

Abstract translation: 公开了化学气相沉积工艺和通过化学气相沉积工艺形成的制品。 该方法包括通过将衬底暴露于氧化环境一段时间来预处理衬底，分解材料以在衬底上形成层，并使层和衬底中的一个或两个功能化。 预处理预氧化底物。