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公开(公告)号：JPH02253261A
公开(公告)日：1990-10-12
申请号：JP7399389
申请日：1989-03-28
Applicant: TOSOH CORP
Inventor： TODOKO MASAAKI , YAMAMOTO TAKASHI , KIYOTA TORU
IPC: G03F7/008 , G03F7/022 , H01L21/027
Abstract: PURPOSE:To provide a photoresist composition superior in developability, film enduring rate, and the like by using a combination of a binary copolymer of p- and o-hydroxystyrene derivatives as an alkali-soluble resin and a photosensitive agent. CONSTITUTION:The photoresist composition can be used comprises the photosensitive agent and a solvent and the alkali-soluble binary copolymer of p- and o-hydroxy styrene derivatives, such as hydroxystyrene or hydroxy-alpha- methylstyrene represented by general formula I, prepared from a mixture of a 60 - 40 p-isomer and a 40 - 60% o-isomer. When the p-isomer is below 40%, the alkali-solubility in an alkaline developing solution is lowered and development becomes difficult, and when it is over 60%, solubility is also lowered.
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公开(公告)号：JPH02242820A
公开(公告)日：1990-09-27
申请号：JP6217289
申请日：1989-03-16
Applicant: TOSOH CORP
Inventor： OSHIMA KENSHO , TAKAHASHI YOSUKE , SEKIMOTO KENICHI , KIYOTA TORU
IPC: C08G65/22 , G11B7/24 , G11B7/253 , G11B11/10 , G11B11/105
Abstract: PURPOSE:To provide a three-dimensional polymer composed of a specific recurring unit, having excellent transparency, heat-resistance, moisture-resistance and mechanical properties, exhibiting excellent optical uniformity and small birefringence and useful as an optical resin material for optical disk base. CONSTITUTION:The objective polymer is expressed by the recurring unit of formula I. The polymer can be produced by polymerizing and curing the compound of formula II.
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公开(公告)号：JPH02115216A
公开(公告)日：1990-04-27
申请号：JP26619988
申请日：1988-10-24
Applicant: TOSOH CORP
Inventor： SEKIMOTO KENICHI , OSHIMA KENSHO , TAKAHASHI YOSUKE , KIYOTA TORU
Abstract: PURPOSE:To obtain a resin composition for an optical material for optical disc bases excellent in transparency, heat resistance, humidity resistance and mechanical strengths and being optically homogeneous and lowly birefringent by curing an epoxy resin based on a compound having a specified polycyclic structure. CONSTITUTION:A resin composition for an optical material is produced by curing an epoxy resin based on a compound having a polycyclic structure of the formula (wherein n is 0 or 1). This resin composition is featured in that it is excellent in transparency, heat resistance, humidity resistance and mechanical strengths and is optically homogeneous and lowly birefringent. Examples of the compound of the above formula include 2,3-epoxybicyclo[2,2,1]heptane glycidyl ether and it compounds can be obtained by reacting the corresponding epoxy polycyclic alcohol with epichlorohydrin in the presence of NaOH.
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公开(公告)号：JPH02115205A
公开(公告)日：1990-04-27
申请号：JP26620088
申请日：1988-10-24
Applicant: TOSOH CORP
Inventor： SEKIMOTO KENICHI , OSHIMA KENSHO , TAKAHASHI YOSUKE , KIYOTA TORU
Abstract: PURPOSE:To prepare a resin compsn. for an optical material excellent in transparency and mechanical strengths, optically homogeneous with small birefringence, and improved in heat and moisture resistance, by compounding a polymer mainly comprising a (meth)acrylic acid ester of trihydroxytricyclodecane. CONSTITUTION:A polymer obtd. by thermal polymn. or pref. by ultraviolet- initiated photopolymerization of a (meth)acrylic acid ester of trihydroxytricyclodecane of the formula (wherein R1, R2 and R3 are each H or CH3) as a major component with, if necessary, another (meth)acrylic acid ester, an unsatd. dibasic acid and its deriv., an unsatd. aliph. acid and its deriv., etc., in the presence of a radical initiator is used to give a resin compsn. for an optical material useful for an audio disc, optical memory disc, etc.
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公开(公告)号：JPH0215267A
公开(公告)日：1990-01-18
申请号：JP16512988
申请日：1988-07-04
Applicant: TOSOH CORP
Inventor： TOTOKO MASAAKI , YAMAMOTO TAKASHI , NAGAOKA KEIKO , KIYOTA TORU
Abstract: PURPOSE:To obtain superior developability and film thickness retentivity by using a composition obtained by forming a resist composition composed of a soluble polymer specified in structure and a photosensitive agent. CONSTITUTION:The resist composition comprises the photosensitive agent and the polymer represented by formula I in which each of R1-R3 is H or 1-5C alkyl; and each of l, m, and n satisfies the expression 0.1
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Patent Agency Ranking
公开(公告)号：JPH01300248A
公开(公告)日：1989-12-04
申请号：JP13007388
申请日：1988-05-30
Applicant: TOSOH CORP
Inventor： YAMAMOTO TAKASHI , KIYOTA TORU , TODOKO MASAAKI , NAGAOKA KEIKO
Abstract: PURPOSE:To improve the sensitivity of the title composition at the time of use the composition for lithography, and the allowability of the composition against an alkaline development condition at the time of developing it by incorporating an alkali soluble resin having silyl ether group, a specified photosensitive agent and a compd. capable of generating an acid by irradiating active rays in the composition. CONSTITUTION:The composition is composed of the alkali-soluble resin having the silyl ether group, the photosensitive agent shown by formula I and the compd. capable of generating the acid by irradiating the active rays. In formula I, R1 is alkyl group, etc., R2 is alkyl, alkenyl or hydroxyalkyl group, etc. And, the alkali-soluble resin is released a SiO bond in the presence of the acid, and formed a hydroxyl group. As the result, the solubility of the resin for an alkaline aqueous solution increases. Thus, the composition has the high sensitivity for the lithography using a deep UV ray and an excimer laser as a light source, and the excellent allowability against the alkali development.
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公开(公告)号：JPH01293338A
公开(公告)日：1989-11-27
申请号：JP12392788
申请日：1988-05-23
Applicant: TOSOH CORP
Inventor： YAMAMOTO TAKASHI , KIYOTA TORU , TODOKO MASAAKI , NAGAOKA TSUNEKO
Abstract: PURPOSE:To improve transparency and the allowability of alkaline development by incorporating such a copolymer which contains two kinds of specific constitutional units in which the ratio of the respective constitutional units has a specific relation and a bisazide photosensitive agent added thereto at need into the above compsn. CONSTITUTION:This compsn. consists of the copolymer contg. the constitutional unit (I) expressed by the formula (I) and the constitutional unit (II) expressed by the formula II and the bisazide photosensitive agent added thereto at need. In the formula, n denotes 1-5 integer. This copolymer is obtd. by condensation reaction of, for example, polyvinyl phenol and halogenated epoxide such as epichlorohydrin. The ratio of the constitutional units (I) and (II) is preferably 0.1
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公开(公告)号：JPH01216346A
公开(公告)日：1989-08-30
申请号：JP4064888
申请日：1988-02-25
Applicant: TOSOH CORP
Inventor： TODOKO MASAAKI , KIYOTA TORU , YAMAMOTO TAKASHI , NAGAOKA KEIKO
Abstract: PURPOSE:To obtain a rectangular resist pattern having an excellent heat- resisting property, even at the time of exposing the title composition with light beams having a short-wavelength by combining to use a naphthoquinone-1,2- diazidosulfonate having a dicyclopentadiene derivative and an alkali soluble resin for the title composition. CONSTITUTION:The photosensitive component contg. one or more of the naphthoquinone-1,2-diazidosulfonyl compd. per one of a dicyclopentadiene compd. is incorporated in the alkali-soluble resin. The photosensitive component has the high heat-resisting property and makes difficult to occur the deformation of the resist pattern at the time of thermally treating the composition. And, the composition has a high transparency at a short wavelength region. Thus, the resist pattern with the good rectangularity is obtd., and the positive type photoresist composition having the excellent heat-resisting property is obtd.
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公开(公告)号：JPH01176401A
公开(公告)日：1989-07-12
申请号：JP33490587
申请日：1987-12-28
Applicant: TOSOH CORP
Inventor： TAKAHASHI YOSUKE , KIYOTA TORU
IPC: C08F116/38 , B01D71/38 , C08F16/38
Abstract: PURPOSE:To obtain an ultrafiltration membrane which reduces adsorption of a hydrophobic treatment object and has resistance to bacteria by utilizing polyvinyl formal resin having a specified repeated unit. CONSTITUTION:Dope is prepared by dissolving polyvinyl formal resin having the repeated unit shown in a formula I (n=600-950) in a solvent such as N- methyl-2-pyrrolidone. A polyester nonwoven fabric is uniformly spread with this dope and successively introduced into a coagulation bath filled with water, and a membrane is formed by a wet-type film formation method (phase conversion method). In such a way, a polyvinyl formal ultrafiltration membrane is obtained.
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公开(公告)号：JPH01126328A
公开(公告)日：1989-05-18
申请号：JP28302787
申请日：1987-11-11
Applicant: TOSOH CORP
Inventor： OSHIMA KENSHO , KIYOTA TORU
IPC: C08G65/40
Abstract: PURPOSE:To obtain the titled novel polymer outstanding in mechanical strength, durability, heat and moisture resistances and transparency, optically uniform, with small birefringence, by reaction, in the presence of a base, between a dihydroxy diphenylpropane and dihalogenotoluene. CONSTITUTION:A reaction is carried out in the presence of a base (pref. sodium hydroxide) between (A) 4,4'-dihydroxydiphenyl 2,2-propane and (B) an alpha,alpha- dihalogenotoluene of formula I (X is halogen) (e.g. alpha,alpha-dichlorotoluene) to obtain the objective polymer having recurring unit of formula II. Said reaction is pref. performed under a light-shielding condition to suppress the discoloration of the product.
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