APAPRATUS FOR TREATING LIQUIDS
    31.
    发明专利

    公开(公告)号:PL310528A1

    公开(公告)日:1995-12-27

    申请号:PL31052894

    申请日:1994-03-04

    Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

    FLUID TREATMENT SYSTEM AND PROCESS
    32.
    发明专利

    公开(公告)号:HU9502580D0

    公开(公告)日:1995-10-30

    申请号:HU9502580

    申请日:1994-03-04

    Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

    33.
    发明专利
    未知

    公开(公告)号:PT1094035E

    公开(公告)日:2003-12-31

    申请号:PT01100934

    申请日:1994-03-04

    Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

    34.
    发明专利
    未知

    公开(公告)号:NO20020632D0

    公开(公告)日:2002-02-08

    申请号:NO20020632

    申请日:2002-02-08

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR

    公开(公告)号:CA2381307A1

    公开(公告)日:2001-02-22

    申请号:CA2381307

    申请日:2000-08-11

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiati on source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatmen t device comprise the cleaning apparatus is also described.

    Radiation module, its application and method for self-cleaning

    公开(公告)号:AU706058B2

    公开(公告)日:1999-06-10

    申请号:AU3647495

    申请日:1995-10-17

    Abstract: A method of cleaning fouling materials from a radiation module, the method comprising the steps of: (i) immersing at least a portion of the radiation module in a fluid; and (ii) subjecting the radiation module to vibration at a frequency sufficient to substantially inhibit fouling materials adhering to the at least one radiation source. A radiation module for use in a fluid treatment system comprising: a support member for mounting the module in the fluid treatment system; at least one radiation assembly extending from the support member; and a vibration generator associated with the at least one radiation assembly. The radiation module is self-cleaning and can take the form of a radiation source module or a radiation sensor module. Incorporation of the radiation source module in a fluid treatment system is also described.

    UV FLUID TREATMENT DEVICE AND METHOD

    公开(公告)号:HUT77069A

    公开(公告)日:1998-03-02

    申请号:HU9702313

    申请日:1995-10-17

    Abstract: A fluid treatment device comprising a housing for receiving a flow of fluid, the housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, and at least one radiation source module disposed in the fluid treatment zone, the at least one radiation source module comprising a radiation source sealably connected to a leg, the leg sealably mounted to the housing, the radiation source being disposed substantially parallel to the flow of fluid. A method of treating a fluid in a housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, the fluid treatment zone having at least one radiation source disposed therein is also described. The method comprises the steps of: (i) providing a flow of the fluid to the fluid inlet; (ii) feeding the flow of fluid from the fluid inlet to the fluid treatment zone in a manner substantially parallel to the at least one radiation source; (iii) irradiating the flow of fluid in the fluid treatment zone; and (iv) feeding the flow of fluid to the fluid outlet. During the method, the flow of fluid through the fluid inlet, the fluid outlet and the fluid treatment zone is substantially collinear. The fluid treatment device and method are ideally suited (but not limited) to inactivate microorganisms present in water.

    38.
    发明专利
    未知

    公开(公告)号:AT162956T

    公开(公告)日:1998-02-15

    申请号:AT94908240

    申请日:1994-03-04

    Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

    GRAVITY FED FLUID TREATMENT SYSTEM USING IRRADIATION: FLUID CONFINED TO PREDEFINED MAXIMUM DISTANCE FROM RADIATION SOURCE

    公开(公告)号:NZ262088A

    公开(公告)日:1997-12-19

    申请号:NZ26208894

    申请日:1994-03-04

    Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

    PROCESS AND SYSTEM FOR FLUID TREATMENT, RADIATION UNIT AND RADIATION SENSOR FOR EXECUTING THE SYSTEM, AND CLEANING UNIT AND PROCESS FOR CLEANING OF THE RADIATION UNIT

    公开(公告)号:HUT76196A

    公开(公告)日:1997-07-28

    申请号:HU9502580

    申请日:1994-03-04

    Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

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