FLUID TREATMENT SYSTEM
    31.
    发明专利

    公开(公告)号:CA2668588A1

    公开(公告)日:2008-05-15

    申请号:CA2668588

    申请日:2007-11-06

    Abstract: In one of its aspects, the present invention relates to a fluid treatment system comprising: an inlet; an outlet; a fluid treatment zone disposed bet ween the inlet and the outlet. The fluid treatment zone: (i) comprises a fir st wall surface and a second wall surface opposed to the first wall surface, and (ii) having disposed therein at least one array of rows of radiation so urce assemblies. Each radiation source assembly has a longitudinal axis tran sverse to a direction of fluid flow through the fluid treatment zone and eac h of the first wall surface and the second wall surface comprises a first fl uid deflector element and a second fluid deflector element. The first fliud deflector element projecting into the fluid treatment zone to a greater exte nt than the second fluid deflector element.

    FLUID TREATMENT SYSTEM
    32.
    发明专利

    公开(公告)号:CA2660719A1

    公开(公告)日:2008-02-21

    申请号:CA2660719

    申请日:2007-08-17

    Abstract: There is described a fluid treatment system. The fluid treatment system c omprises: an open channel for receiving a flow of fluid and a fluid treatmen t zone. The fluid treatment zone comprising a plurality of elongate radiatio n source assemblies orientated such that: (i) a longitudinal axis of each ra diation source assembly is transverse to a direction of fluid flow through t he fluid treatment zone, and (ii) an end of each radiation source assembly i s disposed above a predetermined maximum height of fluid flow in the open ch annel. A first baffle plate is disposed upstream of the fluid treatment zone . The first baffle plate is positioned such that a distal end thereof is bel ow the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an are a in which a cleaning system for the radiation source assemblies can be "par ked" when not in use. In the so- called "parked" position, the cleaning syst em may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.

    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR

    公开(公告)号:CA2381307C

    公开(公告)日:2007-10-30

    申请号:CA2381307

    申请日:2000-08-11

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiati on source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatmen t device comprise the cleaning apparatus is also described.

    34.
    发明专利
    未知

    公开(公告)号:DE60019306T2

    公开(公告)日:2006-03-09

    申请号:DE60019306

    申请日:2000-08-11

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    35.
    发明专利
    未知

    公开(公告)号:AT292603T

    公开(公告)日:2005-04-15

    申请号:AT00952819

    申请日:2000-08-11

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    Fluid treatment system comprising an helical array of reactors

    公开(公告)号:AU2002333096A1

    公开(公告)日:2003-04-01

    申请号:AU2002333096

    申请日:2002-09-20

    Abstract: There is described a fluid treatment system comprising an array of independent fluid treatment reactors. The reactors are arranged in a manner whereby a flow of fluid may be passed through the array in a substantially helical direction. The fluid treatment system is capable of treating large volumes of fluid (e.g., water) while requiring a relatively small foot print. In essence, the present fluid treatment system concentrates a relatively large number of radiation sources in a relatively small amount of space resulting in the ability to treat large volumes of fluid (e.g., water).

    37.
    发明专利
    未知

    公开(公告)号:NO20020632L

    公开(公告)日:2002-02-08

    申请号:NO20020632

    申请日:2002-02-08

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

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