石英ガラスの成形型及び成形方法

    公开(公告)号:JP2019038708A

    公开(公告)日:2019-03-14

    申请号:JP2017159943

    申请日:2017-08-23

    Abstract: 【課題】(1)成形型の応力緩和方法、(2)成形体のシール性、及び(3)成形体の寸法精度と面精度に関する課題を解決する、新たな石英ガラス用成形型及び石英ガラス成形体の製造方法を提供する。 【解決手段】底部及び側壁部を有し、石英ガラスを成形するための空間を有する成形型であって、前記成形型の底部及び側壁部は、外側から、それぞれC/Cコンポジットからなる第一層、カーボン製クッション材からなる第二層、及び黒鉛製成形断熱材からなる第三層を有し、前記第三層が前記石英ガラスを成形するための空間を形成する。底部及び側壁部を有し、石英ガラスを成形するための空間を有する上記成形型を用いて石英ガラスを成形する方法。 【選択図】図1

    High purity quartz glass wool, and method for producing the same
    45.
    发明专利
    High purity quartz glass wool, and method for producing the same 审中-公开
    高纯度玻璃纤维羊毛衫及其制造方法

    公开(公告)号:JP2014122127A

    公开(公告)日:2014-07-03

    申请号:JP2012278863

    申请日:2012-12-21

    Abstract: PROBLEM TO BE SOLVED: To provide a quartz glass wool having less than 0.1 ppm of concentration of impurities comprising at least Na, K, Ca, Al, Fe, and Mg.SOLUTION: There is provided a quartz glass wool comprising a quartz glass in which respective contents of Al, Ca, Na, K, Fe, and Mg are less than 0.1 ppm. There is also provided a method for producing a quartz glass wool comprising the quartz glass in which respective contents of Al, Ca, Na, K, Fe, and Mg are less than 0.1 ppm including the steps of: etching the surface of a rod of a synthetic quartz glass preform comprising the quartz glass in which respective contents of Al, Ca, Na, K, Fe, and Mg are less than 0.1 ppm with an acidic solution, by a thickness of 1 μm or more; and fusing the rod of the synthetic quartz glass preform with a surface being subjected to etching to produce the quartz glass wool by drawing.

    Abstract translation: 要解决的问题:提供一种具有至少含有Na,K,Ca,Al,Fe和Mg的杂质浓度小于0.1ppm的石英玻璃棉。解决方案:提供一种石英玻璃棉,其包含石英玻璃 Al,Ca,Na,K,Fe和Mg的各自含量小于0.1ppm。 还提供了一种石英玻璃棉的制造方法,所述石英玻璃棉包括Al,Ca,Na,K,Fe和Mg的各自含量小于0.1ppm的石英玻璃,包括以下步骤: 包含石灰玻璃的合成石英玻璃预制件,其中Al,Ca,Na,K,Fe和Mg的各自含量与酸性溶液小于0.1ppm,厚度为1μm以上; 并将合成石英玻璃预成型件的棒与经过蚀刻的表面熔合,通过拉伸制造石英玻璃棉。

    Fused quartz glass
    49.
    发明专利
    Fused quartz glass 审中-公开
    FUSED QUARTZ玻璃

    公开(公告)号:JP2009120436A

    公开(公告)日:2009-06-04

    申请号:JP2007295261

    申请日:2007-11-14

    CPC classification number: C03B19/01 C03B2201/03 Y02P40/57

    Abstract: PROBLEM TO BE SOLVED: To provide a fused quartz glass having a low dusting property which is suitable for use in a member for manufacturing a semiconductor, a member for manufacturing a liquid crystal and a member for manufacturing a MEMS (micro-electro-mechanical system) by using plasma etching at a low cost. SOLUTION: The fused quartz glass excellent in a low dusting property is made by using a natural silica in which the ratio of elements having corrosion resistance to a gaseous halide as the local concentration of a defective part due to foreign substances is less than 0.4 wt.% and preferably the concentration of both Zr and Al at a defective part due to foreign substances is less than 0.1 wt.%. The fused quartz glass of this kind is manufactured by flowing the melt to generate a shearing stress inside the melt in manufacturing the fused quartz glass and a minute defective part due to foreign substances observed by a schlieren method in the fused quartz glass of this kind has a length of 1.3 mm or more. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题:提供适用于半导体制造部件的粉尘特性低的熔融石英玻璃,制造液晶的部件和用于制造MEMS的部件(微电子 机械系统),通过以低成本使用等离子体蚀刻。 解决方案:通过使用其中具有耐腐蚀性的元素与卤化物的比例作为由于异物引起的缺陷部分的局部浓度的比例小于 0.4重量%,优选由于异物而在缺陷部分的Zr和Al的浓度小于0.1重量%。 这种熔融石英玻璃通过使熔体流动而在熔融石英玻璃的制造中在熔融物内部产生剪切应力,并且由于在这种熔融石英玻璃中由于schlieren法观察到的异物而产生的微小缺陷部分具有 长度为1.3mm以上。 版权所有(C)2009,JPO&INPIT

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