Abstract:
PROBLEM TO BE SOLVED: To provide a quartz glass wool having less than 0.1 ppm of concentration of impurities comprising at least Na, K, Ca, Al, Fe, and Mg.SOLUTION: There is provided a quartz glass wool comprising a quartz glass in which respective contents of Al, Ca, Na, K, Fe, and Mg are less than 0.1 ppm. There is also provided a method for producing a quartz glass wool comprising the quartz glass in which respective contents of Al, Ca, Na, K, Fe, and Mg are less than 0.1 ppm including the steps of: etching the surface of a rod of a synthetic quartz glass preform comprising the quartz glass in which respective contents of Al, Ca, Na, K, Fe, and Mg are less than 0.1 ppm with an acidic solution, by a thickness of 1 μm or more; and fusing the rod of the synthetic quartz glass preform with a surface being subjected to etching to produce the quartz glass wool by drawing.
Abstract:
PROBLEM TO BE SOLVED: To provide a fused quartz glass having a low dusting property which is suitable for use in a member for manufacturing a semiconductor, a member for manufacturing a liquid crystal and a member for manufacturing a MEMS (micro-electro-mechanical system) by using plasma etching at a low cost. SOLUTION: The fused quartz glass excellent in a low dusting property is made by using a natural silica in which the ratio of elements having corrosion resistance to a gaseous halide as the local concentration of a defective part due to foreign substances is less than 0.4 wt.% and preferably the concentration of both Zr and Al at a defective part due to foreign substances is less than 0.1 wt.%. The fused quartz glass of this kind is manufactured by flowing the melt to generate a shearing stress inside the melt in manufacturing the fused quartz glass and a minute defective part due to foreign substances observed by a schlieren method in the fused quartz glass of this kind has a length of 1.3 mm or more. COPYRIGHT: (C)2009,JPO&INPIT