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    Plasma formation device and plasma treatment device as well as plasma formation method and plasma treatment method
    42.
    发明专利
    Plasma formation device and plasma treatment device as well as plasma formation method and plasma treatment method 审中-公开
    等离子体形成装置和等离子体处理装置，如等离子体形成方法和等离子体处理方法

    公开(公告)号：JP2006277953A

    公开(公告)日：2006-10-12

    申请号：JP2005090160

    申请日：2005-03-25

    Applicant: Kurita Seisakusho:Kk ,  Sumitomo Osaka Cement Co Ltd ,  Toyohashi Univ Of Technology ,  住友大阪セメント株式会社 ,  国立大学法人豊橋技術科学大学 ,  株式会社栗田製作所

    Inventor： TAKIGAWA HIROSHI ,  SHIKI HAJIME ,  MOTOKI JUNPEI ,  OTSUKA TAKASHI ,  KINOSHITA NOBORU ,  NISHIMURA YOSHIMI

    IPC: H05H1/34 ,  B01J19/08 ,  H01L21/304

    Abstract: PROBLEM TO BE SOLVED: To provide a plasma treatment device and a treatment method for preventing damages by plasma on conductive/semi-conductive treated surface or a conductive/semi-conductive treated thin film by efficiently applying a plasma treatment on the surface or the thin film in an atmospheric pressure. SOLUTION: The plasma formation device 2 is composed of a plasma generation part 4 with a gliding arc electrode pair 18 with a distance between the electrodes becoming larger toward a working gas moving direction and an emission port 20 emitting plasma to the plasma generation part 4, with a tip of the electrode pair 18 located inside the emission port 20. The working gas 14 above or near an atmospheric pressure is to be supplied between the electrodes by a working gas supply means and arc 4a generated between the electrodes at impression of voltage produces gliding arc moving toward a wider opening of the electrodes to form plasma. The plasma formation device 2 radiates this plasma from the emission port 20. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种等离子体处理装置和处理方法，用于通过在表面上有效地施加等离子体处理来防止导电/半导电处理表面或导电/半导体处理的薄膜上的等离子体的损伤 或大气压下的薄膜。 解决方案：等离子体形成装置2由等离子体产生部分4组成，等离子体产生部分4具有滑动弧电极对18，电极之间的距离朝向工作气体移动方向变大，并且发射端口20将等离子体发射到等离子体产生 部分4，电极对18的尖端位于排放口20内部。大气压力以上或接近大气压力的工作气体14将通过工作气体供应装置在电极之间供应，并且在印模之间在电极之间产生电弧4a 的电压产生滑动弧朝向电极的较宽开口移动以形成等离子体。 等离子体形成装置2从排放口20辐射该等离子体。版权所有（C）2007，JPO＆INPIT

    Squeeze type filter press, filtering and squeezing method for filter press and hydraulic pressure control method for squeeze type filter press
    43.
    发明专利
    Squeeze type filter press, filtering and squeezing method for filter press and hydraulic pressure control method for squeeze type filter press 有权
    SQUEEZE型过滤器压滤机，过滤器和滤波器压缩方法及液压压力控制方法

    公开(公告)号：JP2005095871A

    公开(公告)日：2005-04-14

    申请号：JP2004237512

    申请日：2004-08-17

    Applicant: Kurita Mach Mfg Co Ltd ,  株式会社栗田機械製作所

    Inventor： TAKASHIMA ATSUSHI

    IPC: B01D25/12 ,  B01D25/19 ,  B30B9/06

    Abstract: PROBLEM TO BE SOLVED: To highly accurately control retightening in a squeezing process. SOLUTION: The squeeze type filter press comprises a tightening device provided with low pressure hydraulic units 12, 133 connected to a low pressure pump 14 for tightening filter plates in a frame closing process and filtration process, and high pressure hydraulic units 11, 123 connected to a high pressure pump 15 for tightening the filter plates in the filtration process and a squeezing process, a maximum hydraulic pressure set means 23 which sets the maximum hydraulic pressure of the tightening device in the filtration process and the squeezing process, a squeezing pressure detecting means 19 which detects a squeezing pressure in the squeezing process, and a control means which controls the maximum hydraulic pressure set in the squeezing process to a value higher than the maximum hydraulic pressure in the filtration process by computing the maximum hydraulic pressure based on the squeezing pressure detected by the squeezing pressure detecting means 19 by inputting it to the maximum hydraulic pressure set means 23. COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：在挤压过程中高精度地控制重新拧紧。 挤压式压滤机包括紧固装置，该紧固装置设置有在框架关闭过程和过滤过程中连接到用于紧固过滤板的低压泵14的低压液压单元12,133和高压液压单元11， 123连接到用于在过滤过程中紧固滤板的高压泵15和挤压过程，最大液压设定装置23，其设定过滤过程中的紧固装置的最大液压压力和挤压过程，挤压 压力检测装置19，其检测挤压过程中的挤压压力;以及控制装置，其通过基于以下步骤计算最大液压压力来将挤压过程中设定的最大液压控制为过滤过程中的最大液压压力 通过将挤压检测装置19输入到最大值来检测压缩压力 m液压设定装置23.版权所有（C）2005，JPO＆NCIPI

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