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公开(公告)号：GB8902379D0
公开(公告)日：1989-03-22
申请号：GB8902379
申请日：1989-02-03
Applicant: HOLTRONIC TECHNOLOGIES LTD
IPC: G03F1/00 , G03F7/20 , G03H1/22 , H01L21/027 , H01L21/30
Abstract: Apparatus for the manufacture of integrated circuits using holographic techniques in which a holographic image formed on a first recording medium provided on a glass slab is replayed by being scanned in order to reproduce an image of the holographic image on a second recording medium provided on a silicon slice. The replay source provides a a collimated narrow circular beam or elongated beam which passes normally through a face of the prism, through an index matching liquid located between the prism and the glass slab before being totally internally reflected at the other surface of the glass slab. The collimated replay beam provides control over the effective numerical aperture thus preventing wide angle radiation from degrading the quality of the printed image.
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公开(公告)号：GB2201010A
公开(公告)日：1988-08-17
申请号：GB8802839
申请日：1988-02-08
Applicant: HOLTRONIC TECHNOLOGIES LTD
Inventor： PHILLIPS NICHOLAS JOHN
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公开(公告)号：DE69029777D1
公开(公告)日：1997-03-06
申请号：DE69029777
申请日：1990-09-21
Applicant: HOLTRONIC TECHNOLOGIES LTD
Inventor： DANDLIKER RENE , BROOK JOHN EDWARD , HAMIDI MASSOUD
IPC: G01B9/021 , G01N21/88 , G01N21/956 , G02B7/28 , G03F7/20 , G03F9/00 , G03H1/00 , H01L21/027 , G03H1/20 , G03F7/207
Abstract: Apparatus for and a method of optical inspection in a total internal reflection holographic imaging system. Multi wavelength laser beams are directed onto a prism supporting a first substrate containing pre-recorded hologram which is to be imaged onto a recording medium of a second substrate, the multi wavelength beams being normal to both substrates. The distance between the two substrates is measured by interferometric techniques. Actuators are provided for adjusting the distance between the two substrates, these actuators being energized to cause minute adjustments of the spacing during a scanning operation whereby the imaging of the pre-recorded hologram is ensured at the correct focus throughout the scanning operation.
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公开(公告)号：GB9511760D0
公开(公告)日：1995-08-02
申请号：GB9511760
申请日：1995-06-06
Applicant: HOLTRONIC TECHNOLOGIES LTD
Abstract: A method and apparatus are disclosed for characterising a one or more layer thin film system on a substrate, in particular in respect of layer thickness and refractive index, and for measuring the distance between two surfaces, wherein at least one of the surfaces comprises a one- or multi-layer system, taking into account, and allowing rectification of, the phase contribution from the thin film stack, by interferometry, in particular by white-light channelled spectrum interferometry or multi-wavelength interferometry.
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公开(公告)号：GB9419086D0
公开(公告)日：1994-11-09
申请号：GB9419086
申请日：1994-09-22
Applicant: HOLTRONIC TECHNOLOGIES LTD
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Patent Agency Ranking
公开(公告)号：GB2272535A
公开(公告)日：1994-05-18
申请号：GB9304716
申请日：1993-03-08
Applicant: HOLTRONIC TECHNOLOGIES LTD
Inventor： OMAR BASIL ARTHUR
Abstract: A method for forming alignment marks and a total internal reflection hologram in a holographic recording layer (14) for a lithographic process such that the alignment marks are readily detectable by an alignment system, including defining alignment marks (10) in a mask (11), said mask also defining the pattern (12) to be reconstructed from said TIR hologram, locating said holographic recording layer and said mask in a TIR hologram recording system, forming a TIR hologram of the mask pattern in the holographic recording layer and transferring the alignment marks in the mask into the holographic recording layer by illuminating the mask with an object beam (18); wherein the features of the alignment marks in the mask are of sufficient size that the alignment marks recorded in the holographic recording layer are well-defined regions of different refractive index and/or layer thickness.
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公开(公告)号：GB2256475A
公开(公告)日：1992-12-09
申请号：GB9108760
申请日：1991-04-24
Applicant: HOLTRONIC TECHNOLOGIES LTD
Inventor： OMAR BASIL ARTHUR , HAMIDI MASSOUD
IPC: G01B11/14
Abstract: A method of measuring small distances between two parallel or near-parallel semi-reflecting surfaces includes the steps of: positioning one of said surfaces in juxtaposition to a surface of a prism 3, directing an incident beam of coherent radiation 1 having a spherical wavefront onto said surfaces, whose distance therebetween is to be measured, and analyzing the interference pattern produced by the reflection of said incident beam of radiation onto said surfaces by means of a phase shifting technique, thereby obtaining a measurement of the distance of separation therebetween. An apparatus for carrying out the method is also disclosed. The invention is particularly applicable to measuring focus by optical means in T.I.R. holographic systems which employ a prism.
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48.发明专利
公开(公告)号：GB2249387A
公开(公告)日：1992-05-06
申请号：GB9022154
申请日：1990-10-11
Applicant: HOLTRONIC TECHNOLOGIES LTD
Inventor： CLUBE FRANCIS STACE MURRAY
IPC: G03F1/08 , G03F9/00 , G03H1/00 , H01L21/027
Abstract: Apparatus for transverse position measurement in a proximity lithographic system including a prism (10) having a glass plate (14) index matched beneath the prism on which a T.I.R. hologram (13) is pre-recorded. A laser source (12) provides a replay beam. A silicon wafer (16) is situated below the hologram and parallel therewith. A second laser source (17) produces through optics (18) a beam with gaussian intensity profile to generate a collimated strip of light (19) at the hologram plane. Elemental grating structures (20) are provided at different locations over the surface of the wafer. Detectors (22, 24) collect parts of the lightfield resulting from the interaction of the laser beam with the grating structures. A piezo device (26) operated from a micro-processor (28) moves the silicon wafer in small increments in a direction substantially parallel to the hologram following measurements made by the two detectors which are processed by the microprocessor processor to produce an alignment signal for the piezo device. Each grating structure on the wafer comprises a crossed grating (comprising a two-dimensional arrangement of grating components). The geometry is such that light reflected from the grating structures (20) bypasses the hologram (13) on its passage to the detectors (22, 24).
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公开(公告)号：GB2215484B
公开(公告)日：1992-05-06
申请号：GB8902379
申请日：1989-02-03
Applicant: HOLTRONIC TECHNOLOGIES LTD
Inventor： PHILLIPS NICHOLAS JOHN
IPC: G03F1/00 , G03F7/20 , G03H1/22 , H01L21/027 , H01L21/30
Abstract: Apparatus for the manufacture of integrated circuits using holographic techniques in which a holographic image formed on a first recording medium provided on a glass slab is replayed by being scanned in order to reproduce an image of the holographic image on a second recording medium provided on a silicon slice. The replay source provides a a collimated narrow circular beam or elongated beam which passes normally through a face of the prism, through an index matching liquid located between the prism and the glass slab before being totally internally reflected at the other surface of the glass slab. The collimated replay beam provides control over the effective numerical aperture thus preventing wide angle radiation from degrading the quality of the printed image.
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公开(公告)号：GB9108760D0
公开(公告)日：1991-06-12
申请号：GB9108760
申请日：1991-04-24
Applicant: HOLTRONIC TECHNOLOGIES LTD
IPC: G01B11/14
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