公开(公告)号：EP1213259A3

公开(公告)日：2004-06-16

申请号：EP01128161.5

申请日：2001-11-27

Applicant: MICROSCAN SYSTEMS INCORPORATED ,  XEROX CORPORATION

Inventor： Zosel, Andrew J. ,  Gulvin, Peter M. ,  Chen, Jingkuang ,  Kubby, Joel A. ,  Lin, Chuang-Chia ,  Tran, Alex T.

IPC: B81B3/00

CPC classification number: B81C1/00666 ,  B81B2203/058 ,  B81C2201/014 ,  B81C2201/0164 ,  B81C2201/056 ,  G02B26/0833

Abstract: The present invention provides a micromechanical or microoptomechanical structure. The structure is produced by a process comprising defining a structure on a single crystal silicon layer separated by an insulator layer from a substrate layer; depositing and etching a polysilicon layer on the single crystal silicon layer, with remaining polysilcon forming mechanical or optical elements of the structure; exposing a selected area of the single crystal silicon layer; and releasing the formed structure.

公开(公告)号：EP1316835A2

公开(公告)日：2003-06-04

申请号：EP02258177.1

申请日：2002-11-27

Applicant: MICROSCAN SYSTEMS INCORPORATED

Inventor： Scharf, Bruce R. ,  Daiber, Troy D.

IPC: G02B27/44 ,  G02B26/08 ,  G02B5/18 ,  B81B3/00

CPC classification number: G02B26/0816 ,  G02B5/18 ,  G02B6/352 ,  G02B6/358 ,  G02B6/3584 ,  G02B26/0808

Abstract: The present application discloses a micro-opto-electromechanical apparatus comprising a silicon wafer comprising a plurality of layers, a reflector formed in one of the plurality of layers, and a pattern on the reflector to focus or collimate an incident beam of radiation into a reflected beam.

Abstract translation: 本申请公开了一种微光学机电装置，其包括包括多个层的硅晶片，形成在多个层中的一个层中的反射器，以及反射器上的图案，以将入射入射的光束聚焦或准直成反射 光束。