Abstract:
본 발명은 지방족 고리계 고경도저온공정형 가용성 폴리이미드 광배향막의 제조방법에 관한 것으로서, 보다 상세하게는 지방족 고리계 산이무수물을 적정 비율 이상 포함하는 산이무수물과 방향족 디아민을 적정비율 이상 포함하는 방향족 디아민류를 용액 중합함으로써 제조된 신규한 가용성폴리이미드 광배향막 및 그의 제조방법에 관한 것으로서 해당 조성물은 저온공정성, 우수한 내열성, 표면경도, 투명성 및 편광자외선에 액정의 배향성을 제공하는 특징을 가지고 있다. 본 발명의 신규 액정배향막용 가용성폴리이미드들로 제조된 박막은 표면 조도가 낮고, 전도성 유리(ITO glass)에 대한 인쇄성이 우수할 뿐만 아니라 내열성 및 투명성이 매우 우수하며, 이들로부터 제작된 액정 셀은 0.1∼1.0° 범위의 낮은 선경사각 및 상온에서 98% 이상의 우수한 전압보유율을 제공하는 특징이 있다. 가용성폴리이미드, 광배향막, 플라스틱기판용, 고경도, 저온공정성, 고내열성, 투명성, 전압보유율, 선경사각
Abstract:
A surface treatment method of organic insulator capable of improving transistor property and organic thin film transistor using the same are provided to improve crystal property of organic semiconductor by using hydrophobic material on organic insulation film. A hydrophobic surface treatment layer is formed by reacting thiol compound on a surface of an organic insulation film. In the organic insulation film, unsaturated bonding is generated on the surface. The organic insulation film is made of polyimide or polyimide copolymer having the unsaturated bonding and mass average molecular weight of 5000~1000000. A reaction of the thiol compound and the organic insulation thin film surface is generated by contacting an organic insulator surface on group saturated into the thiol compound.
Abstract:
The method of manufacturing the organic thin film transistor is provided to improve the durability of the organic passivation and the element reliability. The method of manufacturing the organic thin film transistor comprises as follows. A step is for forming the organic passivation at the upper part of the organic layer transistor element. A step is for forming the hydrophobicity self-assembled monolayer on the surface of organic passivation. The organic passivation has -OH and made of water soluble polymer manufactured from monomer more than the first class. The hydrophobicity self-assembled monolayer is made of the compound selected from below chemical formula 1[R-SiX3]. In the equation, R is straight-chain or the branched-chain alkyl group of the C1~C100 which is or not substituted for the fluorine element or X is independently selected from the alkoxy radical of the halogen atom or C1~C5.
Abstract:
A low-temperature soluble polyimide resin blend composition is provided to improve the overall characteristics of an organic thin film transistor, particularly field effect mobility, by using the composition as an interlayer dielectric having reduced surface tension. A polyimide resin blend composition for a gate dielectric film of an organic transistor comprises 1-99 wt% of a soluble polyimide resin represented by the following formula 1, and 1-99 wt% of a soluble polyimide resin represented by the following formula 2. In the formulae, the formula A is at least one tetravalent group essentially including a specific aliphatic cyclic tetravalent group; the formula B is at least one divalent group; l is a natural number of 1-300; the formula C is at least one divalent group essentially including a divalent aromatic group having a pendant alkyl group; and m is a natural number of 1-300.
Abstract:
A low-temperature soluble polyimide resin blend composition is provided to improve the overall characteristics of an organic thin film transistor, particularly field effect mobility, by using the composition as an interlayer dielectric having reduced surface tension. A polyimide resin blend composition for a gate dielectric film of an organic transistor comprises 1-99 wt% of a soluble polyimide resin represented by the following formula 1, and 1-99 wt% of a soluble polyimide resin represented by the following formula 2. In the formulae, the formula A is at least one tetravalent group essentially including a specific aliphatic cyclic tetravalent group; the formula B is at least one divalent group; l is a natural number of 1-300; the formula C is at least one divalent group essentially including a divalent aromatic group having a pendant alkyl group; and m is a natural number of 1-300.