公开(公告)号：US09678445B2

公开(公告)日：2017-06-13

申请号：US15233775

申请日：2016-08-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20 ,  H01L21/687 ,  C23C16/44

CPC classification number: G03F7/70716 ,  C23C16/44 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70975 ,  H01L21/6875 ,  Y10T29/49

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US20170090304A1

公开(公告)日：2017-03-30

申请号：US15297001

申请日：2016-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Menno Fien ,  Antonius Franciscus Johanne De Groot ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Martijn Houben ,  Jan Steven Christiaan Westerlaken ,  Jim Vincent Overkamp ,  Maarten Van Beijnum

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70733

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

公开(公告)号：US09429853B2

公开(公告)日：2016-08-30

申请号：US14664360

申请日：2015-03-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel Beckers ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

Abstract: A lithographic apparatus, including a movable table, a projection system configured to project a patterned radiation beam onto a substrate, and a liquid supply system configured to provide liquid to a space between a final element of the projection system and the table, the liquid supply system including an inlet configured to provide liquid to the space, the inlet including an array of inlet orifices located below a bottom surface of the final element and configured to provide an essentially horizontal flow of liquid therefrom, the array of inlet orifices extending along a side of an exposure field of the patterned radiation beam, and an extractor configured to remove liquid from the space, the extractor including a two dimensional array of outlet orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.

Abstract translation: 一种光刻设备，包括可移动台，配置成将图案化辐射束投影到基板上的投影系统以及被配置为向投影系统的最终元件和台之间的空间提供液体的液体供应系统，液体供应 系统，其包括被配置为向该空间提供液体的入口，入口包括位于最终元件的底表面下方的入口孔阵列，并被配置为从其提供基本上水平的液体流，沿着一侧延伸的入口孔阵列 所述图案化辐射束的曝光区域以及被配置为从所述空间移除液体的提取器，所述提取器包括至少部分地沿水平方向延伸的出口孔的二维阵列，通过所述出口孔可以从 空间。

公开(公告)号：US20160011522A1

公开(公告)日：2016-01-14

申请号：US14858885

申请日：2015-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Christian Gerardus Norbertus Hendricus Marie CLOIN ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michaël Christiaan Van Der Wekken

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

公开(公告)号：US20140300883A1

公开(公告)日：2014-10-09

申请号：US14273335

申请日：2014-05-08

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract translation: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。

公开(公告)号：US12204255B2

公开(公告)日：2025-01-21

申请号：US18300094

申请日：2023-04-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Marinus Jan Remie ,  Johannes Henricus Wilhelmus Jacobs ,  Thibault Simon Mathieu Laurent ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/00

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US12072635B2

公开(公告)日：2024-08-27

申请号：US17531953

申请日：2021-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Christian Gerardus Norbertus Hendricus Marie Cloin ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michael Christiaan Van Der Wekken

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

公开(公告)号：US12055862B2

公开(公告)日：2024-08-06

申请号：US17952067

申请日：2022-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LaFarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC: G03F7/20 ,  C23C16/44 ,  G03F7/00 ,  H01L21/687

CPC classification number: G03F7/70716 ,  C23C16/44 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70975 ,  H01L21/6875 ,  Y10T29/49

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US11609504B2

公开(公告)日：2023-03-21

申请号：US17119485

申请日：2020-12-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Catharinus Hubertus Mulkens ,  Nicolaas Ten Kate

IPC: G03F7/20 ,  G03B27/32

Abstract: A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.

公开(公告)号：US11454895B2

公开(公告)日：2022-09-27

申请号：US17313054

申请日：2021-05-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC: G03F7/20 ,  H01L21/687 ,  C23C16/44

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.