公开(公告)号：EP4004647A1

公开(公告)日：2022-06-01

申请号：EP20743705.4

申请日：2020-07-24

Applicant: ASML Netherlands B.V.

Inventor： JANSSEN, Paul ,  BIRON, Maxime ,  DONMEZ NOYAN, Inci ,  FERRE LLIN, Lourdes ,  GIESBERS, Adrianus, Johannes, Maria ,  KLOOTWIJK, Johan, Hendrik ,  KUNTZEL, Jan, Hendrik, Willem ,  NOTENBOOM, Arnoud, Willem ,  ROLLIER, Anne-Sophie ,  VAN DER WOORD, Ties, Wouter ,  VAN ZWOL, Pieter-Jan

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

公开(公告)号：EP3811151A1

公开(公告)日：2021-04-28

申请号：EP19728916.8

申请日：2019-05-29

Applicant: ASML Netherlands B.V.

Inventor： NASALEVICH, Maxim, Aleksandrovich ,  KLEIN, Alexander, Ludwig ,  KURGANOVA, Evgenia ,  NOTENBOOM, Arnoud, Willem ,  VAN ZWOL, Pieter-Jan ,  VLES, David, Ferdinand

IPC: G03F1/62 ,  G03F1/22 ,  G03F7/20

公开(公告)号：EP3788442A1

公开(公告)日：2021-03-10

申请号：EP19716199.5

申请日：2019-04-12

Applicant: ASML Netherlands B.V.

Inventor： DE GRAAF, Dennis ,  BEAUDRY, Richard ,  BIRON, Maxime ,  JANSSEN, Paul ,  KATER, Thijs ,  KORNELSEN, Kevin ,  KUIJKEN, Michael, Alfred, Josephus ,  KUNTZEL, Jan, Hendrik, Willem ,  MARTEL, Stephane ,  NASALEVICH, Maxim, Aleksandrovich ,  SALMASO, Guido ,  VAN ZWOL, Pieter-Jan

IPC: G03F1/62 ,  G03F7/20

公开(公告)号：EP3640734A1

公开(公告)日：2020-04-22

申请号：EP18200620.5

申请日：2018-10-16

Applicant: ASML Netherlands B.V.

Inventor： VAN DE KERKHOF, Marcus Adrianus ,  VAN ZWOL, Pieter-Jan ,  DE WINTER, Laurentius Cornelius

IPC: G03F7/20 ,  G02B5/02

Abstract: A first diffusor configured to receive and transmit radiation comprises a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation comprises: a first layer and a second layer. The first layer is formed from a first material, the first layer comprising a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also comprises a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusor first and second diffusors may be configured to receive and transmit EUV radiation.

公开(公告)号：EP3391140A1

公开(公告)日：2018-10-24

申请号：EP16805144.9

申请日：2016-12-02

Applicant: ASML Netherlands B.V.

Inventor： BROUNS, Derk Servatius Gertruda ,  JANSSEN, Paul ,  KAMALI, Mohammad Reza ,  PÉTER, Mária ,  VAN DER ZANDE, Willem Joan ,  VAN ZWOL, Pieter-Jan ,  VLES, David Ferdinand ,  VOORTHUIJZEN, Willem-Pieter

IPC: G03F1/64 ,  G03F1/66

CPC classification number: G03F1/64 ,  G03F1/66 ,  G03F7/70741 ,  G03F7/70983

Abstract: A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patterning device (MA) for EUV lithography; wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.

公开(公告)号：EP3365730A2

公开(公告)日：2018-08-29

申请号：EP16788043.4

申请日：2016-10-11

Applicant: ASML Netherlands B.V.

Inventor： PÉTER, Mária ,  ABEGG, Erik Achilles ,  GIESBERS, Adrianus Johannes Maria ,  KLOOTWIJK, Johan Hendrik ,  NASALEVICH, Maxim Aleksandrovich ,  VAN DEN EINDEN, Wilhelmus Theodorus Anthonius Johannes ,  VAN DER ZANDE, Willem Joan ,  VAN ZWOL, Pieter-Jan ,  VERMEULEN, Johannes Petrus Martinus Bernardus ,  VLES, David, Ferdinand ,  VOORTHUIJZEN, Willem-Pieter

IPC: G03F7/20 ,  B01D67/00 ,  G03F1/62 ,  G21K1/06

CPC classification number: G03F7/70958 ,  G03F1/62 ,  G03F7/70983 ,  G21K2201/067

Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer on a planar surface of a substrate. The substrate comprises a first substrate portion and a second substrate portion. The method further comprises removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.