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    IMPRINT LITHOGRAPHY
    42.
    发明专利
    IMPRINT LITHOGRAPHY 审中-公开

    公开(公告)号：JP2006352121A

    公开(公告)日：2006-12-28

    申请号：JP2006161794

    申请日：2006-06-12

    Applicant: ASML NETHERLANDS BV

    Inventor： KRUIJT-STEGEMAN YVONNE W ,  KOLENSNYCHENKO ALEKSEY Y ,  LOOPSTRA ERIK ROELOF ,  DIJKSMAN JOHAN F ,  VAN SANTEN HELMAR ,  WUISTER SANDER F

    IPC: H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To make significant improvements in resolution and line edge roughness attainable from imprint lithography. SOLUTION: The lithographic device has an imprint template or a template holder configured to hold an imprint template, and a substrate table constituted to receive a substrate, the device further including walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding space. COPYRIGHT: (C)2007,JPO&INPIT

    Dual stage lithographic device and method of manufacturing the device
    43.
    发明专利
    Dual stage lithographic device and method of manufacturing the device 有权
    双级光刻设备及其制造方法

    公开(公告)号：JP2006332656A

    公开(公告)日：2006-12-07

    申请号：JP2006139902

    申请日：2006-05-19

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BRINK MARINUS AART VAN DEN ,  BENSCHOP JOZEF PETRUS HENRICUS ,  LOOPSTRA ERIK ROELOF

    IPC: H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device having a high throughput and that can transfer patterns with relatively small structures on substrates.
    SOLUTION: The invention relates to a dual stage lithographic device, in which two substrate stages are constructed to cooperate with each other to perform a joint sweep movement for guiding the lithographic device from a first condition, a condition in which an immersion liquid is confined between a first substrate carried by a first stage of the stages and a final element of the projection system in the device, to a second condition, a condition in which the liquid is confined between a second substrate carried by a second stage of the two stages and the final element, such that during the joint sweep movement, the liquid is confined to be substantially within the described space with respect to the final element.
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供具有高通量并可以在基板上以相对小的结构转移图案的光刻设备。 解决方案：本发明涉及一种双级光刻设备，其中两个基板台被构造成彼此配合以执行用于从第一状态引导光刻设备的关节扫掠运动，其中浸没液体 被限制在由第一级承载的第一衬底和装置中的投影系统的最终元件之间，第二条件是将液体限制在由第二级承载的第二衬底 两级和最终元件，使得在联合扫掠运动期间，液体被限制在相对于最终元件基本上在所描述的空间内。 版权所有（C）2007，JPO＆INPIT

    Imprint lithography
    44.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2006191085A

    公开(公告)日：2006-07-20

    申请号：JP2005377244

    申请日：2005-12-28

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  LOOPSTRA ERIK ROELOF ,  VAN SANTEN HELMAR ,  KRUIJT-STEGEMAN YVONNE V

    IPC: H01L21/027 ,  B81C99/00

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography method in which resolution and superposition accuracy are improved.
    SOLUTION: The imprint lithography method comprises: a step for subjecting an imprintable medium on a substrate to a condition that the medium is at a first temperature which may subject the medium to a flowable state, where the imprintable medium comprises an imprint material selected from a group consisting of a crystalline material and a polycrystalline material; a step for pressing a template into the medium to form an imprint in the medium; a step for cooling the medium to a second temperature which may subject the medium to a substantially non-flowable state while the medium is brought into contact with the template 46; and a step for separating the medium from the template 46 in the substantially non-flowable state.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供其中提高分辨率和叠加精度的压印光刻方法。 压印光刻方法包括：将基材上的可压印介质经受介质处于可能使介质处于可流动状态的第一温度的条件的步骤，其中可压印介质包括压印材料 选自由结晶材料和多晶材料组成的组; 将模板压入介质以在介质中形成印记的步骤; 将介质冷却到第二温度的步骤，该第二温度可以在介质与模板46接触的同时使介质达到基本上不可流动的状态; 以及在基本上不可流动的状态下将培养基与模板46分离的步骤。 版权所有（C）2006，JPO＆NCIPI

    Lithographic device and method of manufacturing the same
    45.
    发明专利
    Lithographic device and method of manufacturing the same 有权
    光刻设备及其制造方法

    公开(公告)号：JP2006191062A

    公开(公告)日：2006-07-20

    申请号：JP2005375313

    申请日：2005-12-27

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： MARIA VAN DER WIJST MARC W ,  FRANKEN DOMINICUS JACOBUS PETR ,  LOOPSTRA ERIK ROELOF ,  RAVENSBERGEN MARIUS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70266 ,  G03F7/70825

    Abstract: PROBLEM TO BE SOLVED: To provide a device and a method for improving the level of correction that can be achieved with a transmissive deformable lens element in a lithographic device. SOLUTION: The lithographic device has: a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate; and a deformable lens actuator configured to transmit, at a plurality of sub-regions on the deformable lens element independently, a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种用于提高可以通过光刻设备中的透射性可变形透镜元件实现的校正水平的装置和方法。 解决方案：光刻设备具有：可变形透镜元件，图案化的辐射束通过该可变形透镜元件布置成在到达基板之前通过; 以及可变形透镜致动器，其被配置为在所述可变形透镜元件上的多个子区域独立地传送基本上平行于所述投影系统的光轴的力的组合和围绕基本上垂直于所述光学器件的轴线的局部扭矩 轴。 版权所有（C）2006，JPO＆NCIPI

    Lithographic apparatus and device manufacturing method
    46.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2006179908A

    公开(公告)日：2006-07-06

    申请号：JP2005364267

    申请日：2005-12-19

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： MOORS JOHANNES HUBERTUS J ,  HAM ERIK LEONARDUS ,  HEERENS GERT-JAN ,  LIEBREGTS PAULUS MARTINUS MARI ,  LOOPSTRA ERIK ROELOF ,  WERIJ HENRI GERARD C

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70933 ,  G03F7/70908

    Abstract: PROBLEM TO BE SOLVED: To reduce stain particles of a surface, when the surface of a reticle or a mask is exposed to the air of the optics compartment of a lithographic apparatus. SOLUTION: The lithographic apparatus includes an optics compartment that contains the patterned surface of a patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to a substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection; a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment, and to create a region adjacent to the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：当掩模版或掩模的表面暴露于光刻设备的光学隔室的空气时，为了减少表面的污渍颗粒。 解决方案：光刻设备包括光学隔室，其包含图案形成装置和光学元件的图案化表面，以及通过连接器连接到光学隔室的衬底隔间，该连接被布置成将图案化的辐射束从 光学元件。 该设备还包括第一冲洗气体入口，布置成将第一冲洗气体供应到连接中; 邻近所述图案化表面的第二冲洗气体入口并且布置成将第二冲洗气体供应到所述光学隔室中，并且产生与所述图案化表面相邻的区域，在所述区域中所述第二冲洗气体沿着与正常和远离的部件的方向一起流动 并且布置成泵送来自光学隔室的冲洗气体的气泵。 版权所有（C）2006，JPO＆NCIPI

    Lithography apparatus and method for manufacturing device
    50.
    发明专利
    Lithography apparatus and method for manufacturing device 有权
    LITHOGRAPHY设备和制造设备的方法

    公开(公告)号：JP2005045223A

    公开(公告)日：2005-02-17

    申请号：JP2004187276

    申请日：2004-06-25

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： COX HENRIKUS HERMAN MARIE ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  KOLESNYCHENKO ALEKSEY YURIEVIC ,  LOOPSTRA ERIK ROELOF ,  VAN SANTEN HELMAR

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/709 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an effective seal for sealing liquid in a space between a definitive element of a projection system and the surface of a substrate by immersing the substrate in a liquid having a comparatively large index of refraction in a lithography projection apparatus.
    SOLUTION: A seal member 4 is arranged between the definitive element of a projection system PL and the surface of a substrate W, thereby a space 2 is defined. A liquid seal is formed between the seal member 4 and the surface of the substrate W, thereby the liquid is prevented from leaking from the space 2. The seal member 4 has a liquid injection port 6 and a liquid discharge port 8 on the surface thereof facing the substrate. The discharge port 8 is arranged inside the injection port 6 in the radial direction with respect to the optical axis of the projection system. The flow of the liquid from the injection port to the discharge port forms a liquid seal.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：为了提供有效的密封，用于通过将基板浸入具有较大折射率的液体中的光刻技术中，将投影系统的确定元件和基板的表面之间的空间中的液体密封 投影装置。 解决方案：密封构件4布置在投影系统PL的确定元件和基板W的表面之间，从而限定空间2。 在密封构件4与基板W的表面之间形成液体密封，从而防止液体从空间2泄漏。密封构件4在其表面上具有液体注入口6和排液口8 面对基板。 排出口8相对于投影系统的光轴在径向上配置在喷射口6的内部。 液体从注射口流到排出口形成液体密封。 版权所有（C）2005，JPO＆NCIPI

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