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    Imprint lithography
    2.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2008098633A

    公开(公告)日：2008-04-24

    申请号：JP2007252991

    申请日：2007-09-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KRUIJT-STEGEMAN YVONNE W ,  DIJKSMAN JOHAN F ,  WUISTER SANDER F ,  SCHRAM IVAR

    IPC: H01L21/027 ,  B29C59/02 ,  G03F7/20

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography device which prevents increase in the time required to form a thin continuous layer of an imprintable material, requirement for the time for releasing of gas between an imprint template and a substrate, and formation of air bubbles being sealed with the gas sandwiched between the template and the substrate, etc. SOLUTION: In one embodiment, this imprint lithography device includes a support structure that supports an imprint template, having a neutral surface substantially dividing the imprint template into two pieces, and an actuator which is, when the imprint template is supported by the supporting structure, positioned at a certain position so that the actuator is positioned between the support structure and a side part of the imprint template. The actuator is brought into contact with the imprint template at a place displaced from the neutral surface of the imprint template. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供一种压印光刻装置，其防止形成可压印材料的薄连续层所需的时间的增加，需要在压印模板和基板之间释放气体的时间和形成 的气泡被夹在模板和基板之间的气体等密封。解决方案：在一个实施例中，该压印光刻装置包括支撑结构，其支撑压印模板，具有基本上划分印模板的中性表面 以及致动器，当压印模板由支撑结构支撑时，致动器定位在特定位置，使得致动器位于支撑结构和压印模板的侧部之间。 致动器在与压印模板的中性表面偏移的位置与压印模板接触。 版权所有（C）2008，JPO＆INPIT

    IMPRINT LITHOGRAPHY
    3.
    发明专利
    IMPRINT LITHOGRAPHY 审中-公开

    公开(公告)号：JP2006352121A

    公开(公告)日：2006-12-28

    申请号：JP2006161794

    申请日：2006-06-12

    Applicant: ASML NETHERLANDS BV

    Inventor： KRUIJT-STEGEMAN YVONNE W ,  KOLENSNYCHENKO ALEKSEY Y ,  LOOPSTRA ERIK ROELOF ,  DIJKSMAN JOHAN F ,  VAN SANTEN HELMAR ,  WUISTER SANDER F

    IPC: H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To make significant improvements in resolution and line edge roughness attainable from imprint lithography. SOLUTION: The lithographic device has an imprint template or a template holder configured to hold an imprint template, and a substrate table constituted to receive a substrate, the device further including walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding space. COPYRIGHT: (C)2007,JPO&INPIT

    Imprint lithography
    5.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2008068611A

    公开(公告)日：2008-03-27

    申请号：JP2007164950

    申请日：2007-06-22

    Applicant: Asml Netherlands Bv ,  Koninkl Philips Electronics Nv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ

    Inventor： VERSCHUUREN MARCUS ANTONIUS ,  WUISTER SANDER F

    IPC: B29C59/02 ,  B29C33/38 ,  B29K83/00 ,  G11B5/84 ,  H01L21/027

    CPC classification number: B29C33/60 ,  B29C33/3857 ,  B29C33/40 ,  B29K2083/00 ,  B29L2031/756 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To provide an imprint template made of a substrate and a hardened inorganic sol-gel for carrying a pattern.
    SOLUTION: A method of forming the imprint template comprises the steps of coating a front surface with a pattern of a master imprint template with a curable material, curing the curable material, thereby forming a second imprint template having a front surface with a pattern reverse of the front surface with the pattern of the master imprint template, removing the second imprint template from the master imprint template, coating the substrate with the inorganic sol-gel, imprinting the inorganic sol-gel with the second imprint template, curing the inorganic sol-gel, and removing the second imprint template from the cured inorganic sol-gel so that the inorganic sol-gel forms a third imprint temperature having a front surface with a pattern corresponding to the front surface with the pattern of the master imprint template.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供由基底和用于承载图案的硬化的无机溶胶 - 凝胶制成的印模模板。 形成压印模板的方法包括以下步骤：用可固化材料涂覆具有母版印模板图案的前表面，固化可固化材料，从而形成具有前表面的第二印模模板 使用主印模模板的图案反向前表面，从主印模模板中移除第二印模模板，用无机溶胶 - 凝胶涂覆基板，用第二印模模板印刷无机溶胶 - 凝胶，固化 无机溶胶 - 凝胶，并且从固化的无机溶胶 - 凝胶中除去第二印迹模板，使得无机溶胶 - 凝胶形成第三压印温度，其具有与主印模板的图案相对应的具有与前表面对应的图案的正面 。 版权所有（C）2008，JPO＆INPIT

    Imprint lithography
    6.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2011176341A

    公开(公告)日：2011-09-08

    申请号：JP2011087052

    申请日：2011-04-11

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： WUISTER SANDER F ,  DIJKSMAN JOHAN F ,  KRUIJT-STEGEMAN YVONNE W

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/11 ,  G03F7/201

    Abstract: PROBLEM TO BE SOLVED: To suppress the evaporation of part of a medium to be imprinted from a substrate before the medium to be imprinted is imprinted by a template in imprint lithography. SOLUTION: A lithographic apparatus includes: a template set holder 401 to hold a plurality of imprint templates 400; and a substrate holder to hold a substrate 403. The imprint templates 400 and the template set holder 401 are covered with a liquid layer of a silicon rich monomer by spin coating, and the template set holder 401 is arranged under the substrate holder. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：在压印光刻之前，通过模板压印待印制的介质之前，抑制要从基板上印刷的介质的一部分的蒸发。 解决方案：光刻设备包括：用于保持多个印迹模板400的模板组固定器401; 以及用于保持衬底403的衬底保持器。通过旋涂，压印模板400和模板组保持器401被富硅单体的液体层覆盖，并且模板组保持器401布置在衬底保持器下方。 版权所有（C）2011，JPO＆INPIT

    Imprint lithography
    7.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2008042187A

    公开(公告)日：2008-02-21

    申请号：JP2007182903

    申请日：2007-07-12

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SCHRAM IVAR ,  DIJKSMAN JOHAN F ,  WUISTER SANDER F ,  KRUIJT-STEGEMAN YVONNE W ,  LAMMERS JEROEN HERMAN

    IPC: H01L21/027 ,  B41J2/01 ,  B82B3/00

    CPC classification number: B05D5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To provide an improved imprint lithography method and equipment capable of eliminating or reducing variation in physical property of an imprintable medium, etc. SOLUTION: A method of depositing the imprintable medium onto a target area of a substrate for the imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate, and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够消除或减少可压印介质的物理性能的改进的压印光刻方法和设备等。解决方案：一种将可压印介质沉积到目标区域上的方法 公开了一种用于压印光刻的衬底。 该方法包括移动基板，包括喷嘴的打印头，以在横过目标区域的第一方向上相对于另一方弹出可压印介质，同时将可压印介质的第一系列液滴喷射到基板上 并且相对于另一个在第二相对方向上跨过目标区域移动基板，打印头或两者，同时在第一系列液滴上或与液滴相邻的基板上喷射可压印介质的第二系列液滴 。 版权所有（C）2008，JPO＆INPIT

    Imprint lithography
    8.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2007173806A

    公开(公告)日：2007-07-05

    申请号：JP2006336452

    申请日：2006-12-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： WUISTER SANDER F ,  DIJKSMAN JOHAN F ,  KRUIJT-STEGEMAN YVONNE W

    IPC: H01L21/027

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/11 ,  G03F7/201

    Abstract: PROBLEM TO BE SOLVED: To prevent a part of imprintable medium from evaporating from a substrate before the imprint is carried out by a template when the template is pressed into the imprintable medium on the substrate in imprint lithography. SOLUTION: A lithography device has a template holder 41 configured so that a plurality of templates 40 for the imprints may be held, and a substrate holder 43 configured so that a substrate 42 may be held. The template holder 41 is arranged under the substrate holder 43. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：在压印光刻中将模板压入基板上的可压印介质中时，通过模板执行压印之前，防止可压印介质的一部分从基板蒸发。 解决方案：光刻设备具有模板保持器41，其被配置为使得可以保持用于印记的多个模板40以及被构造成可以保持基板42的基板保持件43。 模板支架41设置在基板支架43下方。版权所有（C）2007，JPO＆INPIT

    Imprint lithography
    9.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2007313880A

    公开(公告)日：2007-12-06

    申请号：JP2007075810

    申请日：2007-03-23

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： WUISTER SANDER F ,  DIJKSMAN JOHAN F ,  KRUIJT-STEGEMAN YVONNE W ,  SCHRAM IVAR

    IPC: B29C59/02 ,  B29C33/38 ,  H01L21/027

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0017

    Abstract: PROBLEM TO BE SOLVED: To disclose a method of forming a substantial replica of a first imprint template having a first pattern.
    SOLUTION: A second imprint template having a second pattern substantially reverse to the first pattern is made by filling a recess of the first imprint template with a first material and removing the first material from the first imprint template. A third imprint template having a pattern of a substantial replica of the first pattern is made by filling a recess of the second pattern with a photo-curable medium, curing the photo-curable medium by irradiation and removing the cured medium from the second imprint template.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：公开形成具有第一图案的第一印模模板的实质复制品的方法。 解决方案：通过用第一材料填充第一印模模板的凹部并从第一印模模板中移除第一材料，制成具有与第一图案基本相反的第二图案的第二印模模板。 通过用光固化介质填充第二图案的凹部，通过照射固化光固化介质并从第二印模模板中除去固化介质来制作具有第一图案的实质复制图案的第三印模模板 。 版权所有（C）2008，JPO＆INPIT

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