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    DISPLACEMENT MEASUREMENT SYSTEMS LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    2.
    发明公开
    DISPLACEMENT MEASUREMENT SYSTEMS LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    位移测量系统平台设备和设备制造方法

    公开(公告)号：KR20070095805A

    公开(公告)日：2007-10-01

    申请号：KR20070027566

    申请日：2007-03-21

    Applicant: ASML NETHERLANDS BV

    Inventor： KLAVER RENATUS GERARDUS ,  LOOPSTRA ERIK ROELOF ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: G01B11/02 ,  G01B9/02 ,  G03F7/20

    CPC classification number: G01D5/38 ,  G03F7/70775

    Abstract: A displacement measuring system, a lithography device, and a manufacturing method thereof are provided to reduce sensitivity against an error and to decrease an installation space thereof. A displacement measuring system comprises first and second diffraction lattices, a sensor(216), and at least one linear polarizer(217,218). The first diffraction lattice is used to divide a first beam of inputted radiation into first positive and negative diffraction radiation beams(212,213). The first positive and negative diffraction radiation beams are diffracted more by the second diffraction lattice. The sensor is used to decide a relative displacement between the first and second diffraction lattices from a decision of a phase difference between a first component of the second beam deduced from the first positive diffraction radiation beam, and a second component of the second beam deduced from the first negative diffraction radiation beam. The linear polarizer is formed to diffract the first and second components of the second beam linearly and to position and cross the first and second components mutually. A lithography device is used to detect the displacement of the first component thereof against the second component thereof.

    Abstract translation: 提供了位移测量系统，光刻设备及其制造方法，以降低对错误的灵敏度并减小其安装空间。 位移测量系统包括第一和第二衍射栅格，传感器（216）和至少一个线性偏振器（217,218）。 第一衍射栅格用于将第一射入的辐射束分成第一正和负衍射辐射束（212,213）。 第一正和负衍射辐射束被第二衍射晶格衍射更多。 该传感器用于根据从第一正衍射辐射束推断的第二光束的第一分量与从第一正衍射辐射束推导出的第二光束的第二分量之间的相位差的判定来确定第一和第二衍射光栅之间的相对位移 第一个负衍射辐射束。 线性偏振器被形成为线性地衍射第二光束的第一和第二分量并相互定位和交叉第一和第二分量。 光刻装置用于检测其第一部件相对于其第二部件的位移。

    Lithographic apparatus and method for compensating for effect of disturbance on projection system of lithographic apparatus
    9.
    发明专利
    Lithographic apparatus and method for compensating for effect of disturbance on projection system of lithographic apparatus 有权
    用于补偿影像设备投影系统影响的平面设备和方法

    公开(公告)号：JP2010141321A

    公开(公告)日：2010-06-24

    申请号：JP2009276028

    申请日：2009-12-04

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK ROELOF ,  WIJCKMANS MAURICE WILLEM JOZEF ETIENNE ,  TOUSAIN ROBERTUS LEONARDUS ,  KOEVOETS ADRIANUS HENDRIK

    IPC: H01L21/027

    CPC classification number: G03F7/709 ,  G03F7/70525 ,  G03F7/70758 ,  G03F7/70766

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which decreases disturbance of a projection system due to the scanning power of a movable object.
    SOLUTION: The lithographic apparatus includes: an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table WT constructed to hold a substrate; a projection system PS configured to project the patterned radiation beam onto a target portion of the substrate; an active air mount AM supporting the projection system PS and including at least one actuator; and a feed-forward device FD configured to provide a feed-forward signal to the at least one actuator on the basis of a set-point signal of a movable object, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system PS due to movement of the movable object.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种降低由于可移动物体的扫描力引起的投影系统干扰的光刻设备。 解决方案：光刻设备包括：被配置为调节辐射束的照明系统; 图案形成装置支撑件，其被构造成支撑能够在其横截面中赋予辐射束图案以形成图案化辐射束的图案形成装置; 构造成保持衬底的衬底台WT; 投影系统PS被配置为将图案化的辐射束投影到基板的目标部分上; 支撑投影系统PS并且包括至少一个致动器的主动气垫AM; 以及前馈装置FD，其被配置为基于可移动对象的设定点信号向所述至少一个致动器提供前馈信号，其中所述前馈信号被设计为减小对所述可移动物体的干扰效应 投影系统PS由于可移动物体的移动。 版权所有（C）2010，JPO＆INPIT

    Radiation source, lithographic apparatus, and device manufacturing method
    10.
    发明专利
    Radiation source, lithographic apparatus, and device manufacturing method 有权
    辐射源，光刻设备和器件制造方法

    公开(公告)号：JP2010062560A

    公开(公告)日：2010-03-18

    申请号：JP2009197591

    申请日：2009-08-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK ROELOF ,  SWINKELS GERARDUS HUBERTUS PETRUS MARIA

    IPC: H01L21/027 ,  H05G2/00

    CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G21K1/06 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

    Abstract: PROBLEM TO BE SOLVED: To reduce damage caused by contamination particles.
    SOLUTION: A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes: a chamber in which a plasma is generated during usage; and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material emitted to that surface from the plasma during usage.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：减少污染颗粒造成的损坏。 解决方案：辐射源被配置为产生极紫外辐射。 辐射源包括：在使用期间产生等离子体的室; 以及蒸发表面，其构造成蒸发作为副产物形成的材料，并从其发射到蒸发表面。 在光刻设备的等离子体辐射源中除去或从等离子体辐射源中除去副产物的方法包括在使用期间从等离子体中蒸发发射到该表面的材料。 版权所有（C）2010，JPO＆INPIT

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