公开(公告)号：US20220283428A1

公开(公告)日：2022-09-08

申请号：US17635907

申请日：2020-08-05

Applicant: ASML Netherlands B.V. ,  IMEC v.z.w.

Inventor： Luc Roger Simonne HASPESLAGH ,  Veronique ROCHUS ,  Guilherme BRONODANI TORRI ,  Nitesh PANDEY ,  Sebastianus Adrianus GOORDEN

IPC: G02B26/08 ,  G02B7/18 ,  G03F7/20

Abstract: A micromirror array comprises a substrate, a plurality of minors for reflecting incident light and, for each mirror (20) of the plurality of minors, at least one piezoelectric actuator (21) for displacing the minor, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars (24) connecting the minor to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.

公开(公告)号：US20220172347A1

公开(公告)日：2022-06-02

申请号：US17608015

申请日：2020-04-02

Applicant: ASML Netherlands B.V.

Inventor： Teunis Willem TUKKER ,  Arie Jefrey DEN BOEF ,  Nitesh PANDEY ,  Marinus Petrus REIJNDERS ,  Ferry ZIJP

IPC: G06T7/00 ,  G02B5/30 ,  G02B27/42 ,  G02B27/28 ,  H04N5/225 ,  H04N5/232

Abstract: Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.

公开(公告)号：US20210364936A1

公开(公告)日：2021-11-25

申请号：US16963273

申请日：2018-12-20

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Duygu AKBULUT ,  Alessandro POLO ,  Sebastianus Adrianus GOORDEN

IPC: G03F9/00 ,  G03F7/20 ,  G01B9/02 ,  G01N29/06

Abstract: A sensor is disclosed, wherein a transducer generates acoustic waves, which are received by a lens assembly. The lens assembly transmits and directs at least a part of the acoustic waves to a target. The lens assembly then receives at least a part of acoustic waves, after interaction with the target. The sensor further comprises an optical detector that comprises at least one optically reflective member located at a surface of the lens assembly, which surface is arranged opposite to a surface of the lens assembly which faces a focal plane of the lens assembly, wherein the at least one optically reflective member is mechanically displaced in response to the acoustic waves, which are received and transmitted by the lens assembly.

公开(公告)号：US20210255553A1

公开(公告)日：2021-08-19

申请号：US17306670

申请日：2021-05-03

Applicant: ASML Netherlands B.V.

Inventor： Zili ZHOU ,  Nitesh PANDEY ,  Olger Victor ZWIER ,  Patrick WARNAAR ,  Maurits VAN DER SCHAAR ,  Elliott Gerard MC NAMARA ,  Arie Jeffrey DEN BOEF ,  Paul Christiaan HINNEN ,  Murat BOZKURT ,  Joost Jeroen OTTENS ,  Kaustuve BHATTACHARYYA ,  Michael KUBIS

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G03F9/00

Abstract: A method of measuring overlay uses a plurality of asymmetry measurements from locations (LOI) on a pair of sub-targets (1032, 1034) formed on a substrate (W). For each sub-target, the plurality of asymmetry measurements are fitted to at least one expected relationship (1502, 1504) between asymmetry and overlay, based on a known bias variation deigned into the sub-targets. Continuous bias variation in one example is provided by varying the pitch of top and bottom gratings (P1/P2). Bias variations between the sub-targets of the pair are equal and opposite (P2/P1). Overlay (OV) is calculated based on a relative shifht (xs) between the fitted relationships for the two sub-targets. The step of fitting asymmetry measurements to at least one expected relationship includes wholly or partially discounting measurements (1506, 1508, 1510) that deviate from the expected relationship and/or fall outside a particular segment of the fitted relationship.

公开(公告)号：US20190033725A1

公开(公告)日：2019-01-31

申请号：US16042302

申请日：2018-07-23

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Maxim PISARENCO ,  Alessandro POLO

IPC: G03F7/20 ,  G01N21/956 ,  G01N29/06

Abstract: A method and apparatus to measure overlay from images of metrology targets, images obtained using acoustic waves, for example images obtained using an acoustic microscope. The images of two targets are obtained, one image using acoustic waves and one image using optical waves, the edges of the images are determined and overlay between the two targets is obtained as the difference between the edges of the two images.

公开(公告)号：US20180321598A1

公开(公告)日：2018-11-08

申请号：US15954995

申请日：2018-04-17

Applicant: ASML Netherlands B.V.

Inventor： Jin LIAN ,  Nitesh PANDEY

IPC: G03F7/20

Abstract: Methods and apparatus for measuring a parameter of interest of a target structure formed on substrate are disclosed. In one arrangement, the target structure comprises a first sub-target and a second sub-target. The first sub-target comprises a first bias and the second sub-target comprises a second bias. The method comprises determining the parameter of interest using a detected or estimated reference property of radiation at a first wavelength scattered from the first sub-target and a detected or estimated reference property of radiation at a second wavelength scattered from the second sub-target. The first wavelength is different to the second wavelength.

公开(公告)号：US20180299794A1

公开(公告)日：2018-10-18

申请号：US15942423

申请日：2018-03-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh PANDEY ,  Jin LIAN ,  SAMEE UR-REHMAN ,  Martin Jacobus Johan JAK

IPC: G03F7/20 ,  G01B11/02

CPC classification number: G03F7/70633 ,  G01B11/02 ,  G03F7/70566 ,  G03F7/70575 ,  G03F7/70583 ,  G03F7/70616

Abstract: Methods and apparatuses for measuring a plurality of structures formed on a substrate are disclosed. In one arrangement, a method includes obtaining data from a first measurement process. The first measurement process including individually measuring each of the plurality of structures to measure a first property of the structure. A second measurement process is used to measure a second property of each of the plurality of structures. The second measurement process includes illuminating each structure with radiation having a radiation property that is individually selected for that structure using the measured first property for the structure.

公开(公告)号：US20180283853A1

公开(公告)日：2018-10-04

申请号：US15764661

申请日：2016-09-05

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY

IPC: G01B11/25 ,  G01B11/06 ,  G03F7/20

CPC classification number: G01B11/2513 ,  G01B11/0608 ,  G01B11/24 ,  G01B2210/56 ,  G03F7/70625 ,  G03F9/7034

Abstract: Measurement system comprising a radiation source configured to generate a measurement radiation beam, a polarizer and a grating to receive the measurement radiation beam and provide a polarized measurement radiation beam patterned by the grating, optics to form an image of the grating at a target location on a substrate. The image comprises a first part having a first polarization and a second part having a second polarization, detection optics to receive radiation from the target location of the substrate and form an image of the grating image at a second grating, and a detector to receive radiation transmitted through the second grating and produce a two output signal indicative of the intensity of the transmitted radiation for the first and second parts of the grating image respectively. Topography of the substrate can be determined from the signals.

公开(公告)号：US20180059552A1

公开(公告)日：2018-03-01

申请号：US15683126

申请日：2017-08-22

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY

IPC: G03F7/20 ,  G01J1/04

CPC classification number: G03F7/70633 ,  G01J1/0411 ,  G01J1/0488 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70625

Abstract: Metrology apparatus and methods are disclosed. In one arrangement, a metrology apparatus comprises an optical system that illuminates a structure with measurement radiation and detects the measurement radiation scattered by the structure. The optical system comprises an array of lenses that focusses the scattered measurement radiation onto a sensor. A dispersive element directs scattered measurement radiation in each of a plurality of non-overlapping wavelength bands exclusively onto a different respective lens of the array of lenses.

公开(公告)号：US20180031977A1

公开(公告)日：2018-02-01

申请号：US15660498

申请日：2017-07-26

Applicant: ASML Netherlands B.V.

Inventor： Sebastianus Adrianus GOORDEN ,  Nitesh PANDEY ,  Duygu AKBULUT ,  Teunis Willem TUKKER ,  Johannes Matheus Marie DE WIT

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/88

CPC classification number: G03F7/7015 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8822 ,  G01N2201/0631 ,  G02B6/262 ,  G02B6/4204 ,  G02B6/4296 ,  G03F7/70075 ,  G03F7/70583 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633

Abstract: Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes.